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Extract from the Register of European Patents

EP About this file: EP2153960

EP2153960 - Holder, method and device for producing wafers and use of the produced wafers [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  08.07.2016
Database last updated on 13.07.2024
Most recent event   Tooltip08.07.2016Application deemed to be withdrawnpublished on 10.08.2016  [2016/32]
Applicant(s)For all designated states
Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V.
Hansastrasse 27 c
80686 München / DE
[2013/45]
Former [2010/23]For all designated states
SCHOTT Solar AG
Hattenbergstrasse 10
55122 Mainz / DE
Former [2010/07]For all designated states
Wacker Schott Solar Gmbh
Otto-Schott-Strasse 13
07745 Jena / DE
Inventor(s)01 / Peip, Michael
Muehlenweg 90
07751 Jena / DE
02 / Spehr, Till, Dr.
Zum Feldlager 108
34128 Kassel / DE
03 / Lesche, Andreas
Georg-Weerth-Strasse 18
07749 Jena / DE
 [2010/07]
Representative(s)Fritzsche, Thomas
Fritzsche Patent
Naupliastrasse 110
81545 München / DE
[N/P]
Former [2010/07]Fritzsche, Thomas
Fritzsche Patent Naupliastrasse 110
81545 München / DE
Application number, filing date09010524.814.08.2009
[2010/07]
Priority number, dateDE2008103765214.08.2008         Original published format: DE102008037652
[2010/07]
Filing languageDE
Procedural languageDE
PublicationType: A2 Application without search report 
No.:EP2153960
Date:17.02.2010
Language:DE
[2010/07]
Type: A3 Search report 
No.:EP2153960
Date:25.01.2012
Language:DE
[2012/04]
Search report(s)(Supplementary) European search report - dispatched on:EP27.12.2011
ClassificationIPC:B28D5/00
[2010/07]
CPC:
B28D5/0076 (EP); B28D5/0082 (EP)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   SM,   TR [2010/07]
Extension statesALNot yet paid
BANot yet paid
RSNot yet paid
TitleGerman:Träger, Verfahren und Vorrichtung zum Herstellen von Wafern sowie Verwendung der hergestelllten Wafer[2010/07]
English:Holder, method and device for producing wafers and use of the produced wafers[2010/07]
French:Support, procédé et dispositif de fabrication de tranches de silicium, ainsi que l'utilisation de la tranche de silicium fabriquée[2010/07]
Examination procedure14.08.2009Examination requested  [2010/07]
25.07.2012Amendment by applicant (claims and/or description)
01.03.2016Application deemed to be withdrawn, date of legal effect  [2016/32]
31.03.2016Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2016/32]
Fees paidRenewal fee
24.08.2011Renewal fee patent year 03
23.08.2012Renewal fee patent year 04
23.08.2013Renewal fee patent year 05
28.08.2014Renewal fee patent year 06
Penalty fee
Additional fee for renewal fee
31.08.201507   M06   Not yet paid
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Documents cited:Search[X]JP2004106360  (KOMATSU DENSHI KINZOKU KK) [X] 1-14 * abstract *;
 [X]JPH09207126  (NIPPEI TOYAMA CORP) [X] 1-14 * abstract *;
 [X]JPH0919921  (TOKYO SEIMITSU CO LTD) [X] 1-14 * abstract *
by applicantDE69708168T
 DE102005028112
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.