EP2153960 - Holder, method and device for producing wafers and use of the produced wafers [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 08.07.2016 Database last updated on 13.07.2024 | Most recent event Tooltip | 08.07.2016 | Application deemed to be withdrawn | published on 10.08.2016 [2016/32] | Applicant(s) | For all designated states Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. Hansastrasse 27 c 80686 München / DE | [2013/45] |
Former [2010/23] | For all designated states SCHOTT Solar AG Hattenbergstrasse 10 55122 Mainz / DE | ||
Former [2010/07] | For all designated states Wacker Schott Solar Gmbh Otto-Schott-Strasse 13 07745 Jena / DE | Inventor(s) | 01 /
Peip, Michael Muehlenweg 90 07751 Jena / DE | 02 /
Spehr, Till, Dr. Zum Feldlager 108 34128 Kassel / DE | 03 /
Lesche, Andreas Georg-Weerth-Strasse 18 07749 Jena / DE | [2010/07] | Representative(s) | Fritzsche, Thomas Fritzsche Patent Naupliastrasse 110 81545 München / DE | [N/P] |
Former [2010/07] | Fritzsche, Thomas Fritzsche Patent Naupliastrasse 110 81545 München / DE | Application number, filing date | 09010524.8 | 14.08.2009 | [2010/07] | Priority number, date | DE20081037652 | 14.08.2008 Original published format: DE102008037652 | [2010/07] | Filing language | DE | Procedural language | DE | Publication | Type: | A2 Application without search report | No.: | EP2153960 | Date: | 17.02.2010 | Language: | DE | [2010/07] | Type: | A3 Search report | No.: | EP2153960 | Date: | 25.01.2012 | Language: | DE | [2012/04] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 27.12.2011 | Classification | IPC: | B28D5/00 | [2010/07] | CPC: |
B28D5/0076 (EP);
B28D5/0082 (EP)
| Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR [2010/07] | Extension states | AL | Not yet paid | BA | Not yet paid | RS | Not yet paid | Title | German: | Träger, Verfahren und Vorrichtung zum Herstellen von Wafern sowie Verwendung der hergestelllten Wafer | [2010/07] | English: | Holder, method and device for producing wafers and use of the produced wafers | [2010/07] | French: | Support, procédé et dispositif de fabrication de tranches de silicium, ainsi que l'utilisation de la tranche de silicium fabriquée | [2010/07] | Examination procedure | 14.08.2009 | Examination requested [2010/07] | 25.07.2012 | Amendment by applicant (claims and/or description) | 01.03.2016 | Application deemed to be withdrawn, date of legal effect [2016/32] | 31.03.2016 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2016/32] | Fees paid | Renewal fee | 24.08.2011 | Renewal fee patent year 03 | 23.08.2012 | Renewal fee patent year 04 | 23.08.2013 | Renewal fee patent year 05 | 28.08.2014 | Renewal fee patent year 06 | Penalty fee | Additional fee for renewal fee | 31.08.2015 | 07   M06   Not yet paid |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]JP2004106360 (KOMATSU DENSHI KINZOKU KK) [X] 1-14 * abstract *; | [X]JPH09207126 (NIPPEI TOYAMA CORP) [X] 1-14 * abstract *; | [X]JPH0919921 (TOKYO SEIMITSU CO LTD) [X] 1-14 * abstract * | by applicant | DE69708168T | DE102005028112 |