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Extract from the Register of European Patents

EP About this file: EP2216685

EP2216685 - Exposure apparatus and device manufacturing method [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  03.05.2013
Database last updated on 11.05.2024
Most recent event   Tooltip17.07.2015Lapse of the patent in a contracting state
New state(s): HU		published on 19.08.2015  [2015/34]
Applicant(s)For all designated states
Nikon Corporation
12-1, Yurakucho 1-chome
Chiyoda-ku
Tokyo 100-8331 / JP
[N/P]
Former [2010/32]For all designated states
Nikon Corporation
12-1, Yurakucho 1-chome Chiyoda-ku
Tokyo 100-8331 / JP
Inventor(s)01 / Ebihara, Akimitsu
c/o Nikon Corporation
2-3 Marunouchi 3-chome
Chiyoda-ku
Tokyo 100 8331 / JP
 [2012/26]
Former [2010/32]01 / Ebihara, Akimitsu
c/o Nikon Corporation 2-3 Marunouchi 3-chome Chiyoda-ku
Tokyo 100 8331 / JP
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[N/P]
Former [2012/26]HOFFMANN EITLE
Patent- und Rechtsanwälte
Arabellastraße 4
81925 München / DE
Former [2010/32]HOFFMANN EITLE
Patent- und Rechtsanwälte Arabellastrasse 4
81925 München / DE
Application number, filing date09015888.218.06.2004
[2010/32]
Priority number, dateJP2003017425919.06.2003         Original published format: JP 2003174259
[2010/32]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP2216685
Date:11.08.2010
Language:EN
[2010/32]
Type: A3 Search report 
No.:EP2216685
Date:10.11.2010
[2010/45]
Type: B1 Patent specification 
No.:EP2216685
Date:27.06.2012
Language:EN
[2012/26]
Search report(s)(Supplementary) European search report - dispatched on:EP13.10.2010
ClassificationIPC:G03F7/20
[2010/32]
CPC:
B82Y10/00 (EP,KR,US); H01L21/0274 (KR); G03F7/70333 (KR,US);
G03F7/2041 (KR); G03F7/70225 (US); G03F7/70275 (KR);
G03F7/70325 (EP,KR,US); G03F7/70341 (EP,KR,US); G03F7/70716 (EP,KR,US);
G03F7/70725 (KR,US); G03F7/70733 (EP,KR,US); G03F7/70758 (KR,US);
G03F7/70775 (KR); G03F7/70816 (EP,KR,US); Y10T29/49826 (EP,US) (-)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2010/32]
TitleGerman:Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung[2011/43]
English:Exposure apparatus and device manufacturing method[2010/32]
French:Appareil d'exposition et procédé de fabrication d'un dispositif[2011/43]
Former [2010/32]Belichtungsvorrichtung und Vorrichtungsherstellungsverfahren
Former [2010/32]Appareil d'exposition et procédé de fabrication du dispositif
Examination procedure10.05.2011Examination requested  [2011/25]
16.06.2011Despatch of communication that the application is deemed to be withdrawn, reason: reply to the Extended European Search Report/Written Opinion of the International Searching Authority/International Preliminary Examination Report/Supplementary international search report not received in time
16.08.2011Amendment by applicant (claims and/or description)
28.11.2011Communication of intention to grant the patent
16.03.2012Fee for grant paid
16.03.2012Fee for publishing/printing paid
Parent application(s)   TooltipEP04746097.7  / EP1635382
Divisional application(s)EP10185953.6  / EP2275869
EP10185992.4  / EP2278401
The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued (EP20040746097) is  25.04.2008
Opposition(s)28.03.2013No opposition filed within time limit [2013/23]
Request for further processing for:The application is deemed to be withdrawn due to failure to reply to the Extended European Search Report/Written Opinion of the International Searching Authority/International Preliminary Examination Report/Supplementary international search report/Supplementary European search report
16.08.2011Request for further processing filed
16.08.2011Full payment received (date of receipt of payment)
Request granted
05.09.2011Decision despatched
Fees paidRenewal fee
22.12.2009Renewal fee patent year 03
22.12.2009Renewal fee patent year 04
22.12.2009Renewal fee patent year 05
22.12.2009Renewal fee patent year 06
31.03.2010Renewal fee patent year 07
27.06.2011Renewal fee patent year 08
31.03.2012Renewal fee patent year 09
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU18.06.2004
AT27.06.2012
BE27.06.2012
CY27.06.2012
CZ27.06.2012
DK27.06.2012
EE27.06.2012
FI27.06.2012
MC27.06.2012
PL27.06.2012
RO27.06.2012
SE27.06.2012
SI27.06.2012
SK27.06.2012
TR27.06.2012
BG27.09.2012
GR28.09.2012
ES08.10.2012
PT29.10.2012
[2015/34]
Former [2015/32]AT27.06.2012
BE27.06.2012
CY27.06.2012
CZ27.06.2012
DK27.06.2012
EE27.06.2012
FI27.06.2012
MC27.06.2012
PL27.06.2012
RO27.06.2012
SE27.06.2012
SI27.06.2012
SK27.06.2012
TR27.06.2012
BG27.09.2012
GR28.09.2012
ES08.10.2012
PT29.10.2012
Former [2014/08]AT27.06.2012
BE27.06.2012
CY27.06.2012
CZ27.06.2012
DK27.06.2012
EE27.06.2012
FI27.06.2012
MC27.06.2012
PL27.06.2012
RO27.06.2012
SE27.06.2012
SI27.06.2012
SK27.06.2012
BG27.09.2012
GR28.09.2012
ES08.10.2012
PT29.10.2012
Former [2013/34]AT27.06.2012
BE27.06.2012
CY27.06.2012
CZ27.06.2012
DK27.06.2012
EE27.06.2012
FI27.06.2012
PL27.06.2012
RO27.06.2012
SE27.06.2012
SI27.06.2012
SK27.06.2012
BG27.09.2012
GR28.09.2012
ES08.10.2012
PT29.10.2012
Former [2013/22]AT27.06.2012
BE27.06.2012
CY27.06.2012
CZ27.06.2012
DK27.06.2012
EE27.06.2012
FI27.06.2012
PL27.06.2012
RO27.06.2012
SE27.06.2012
SI27.06.2012
SK27.06.2012
GR28.09.2012
ES08.10.2012
PT29.10.2012
Former [2013/21]AT27.06.2012
BE27.06.2012
CY27.06.2012
CZ27.06.2012
DK27.06.2012
EE27.06.2012
FI27.06.2012
PL27.06.2012
RO27.06.2012
SE27.06.2012
SI27.06.2012
SK27.06.2012
GR28.09.2012
PT29.10.2012
Former [2013/13]AT27.06.2012
BE27.06.2012
CY27.06.2012
CZ27.06.2012
EE27.06.2012
FI27.06.2012
PL27.06.2012
RO27.06.2012
SE27.06.2012
SI27.06.2012
SK27.06.2012
GR28.09.2012
PT29.10.2012
Former [2013/11]AT27.06.2012
BE27.06.2012
CY27.06.2012
CZ27.06.2012
EE27.06.2012
FI27.06.2012
PL27.06.2012
RO27.06.2012
SE27.06.2012
SI27.06.2012
SK27.06.2012
GR28.09.2012
Former [2013/10]AT27.06.2012
BE27.06.2012
CY27.06.2012
CZ27.06.2012
EE27.06.2012
FI27.06.2012
RO27.06.2012
SE27.06.2012
SI27.06.2012
SK27.06.2012
GR28.09.2012
Former [2013/09]AT27.06.2012
BE27.06.2012
EE27.06.2012
FI27.06.2012
SE27.06.2012
SI27.06.2012
GR28.09.2012
Former [2013/07]AT27.06.2012
BE27.06.2012
FI27.06.2012
SE27.06.2012
SI27.06.2012
GR28.09.2012
Former [2012/51]FI27.06.2012
SE27.06.2012
SI27.06.2012
GR28.09.2012
Former [2012/50]FI27.06.2012
SE27.06.2012
GR28.09.2012
Former [2012/48]FI27.06.2012
SE27.06.2012
Documents cited:Search[XP]EP1420300  (ASML NETHERLANDS BV [NL]) [XP] 1-36,39-42 * abstract * * figure 1 ** paragraphs [0001] , [0005] *;
 [E]WO2004090577  (NIPPON KOGAKU KK [JP], et al) [E] 1-36,39-42 * abstract * * figure 6A * * page 2, line 33 - line 34 * * page 14, line 14 - line 32 *
ExaminationEP1111471
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