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Extract from the Register of European Patents

EP About this file: EP2170021

EP2170021 - Source module, radiation source and lithographic apparatus [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  09.09.2016
Database last updated on 23.04.2024
Most recent event   Tooltip17.08.2018Lapse of the patent in a contracting state
New state(s): BG		published on 19.09.2018  [2018/38]
Applicant(s)For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
[N/P]
Former [2015/45]For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
Former [2010/13]For all designated states
ASML Netherlands B.V.
Corporate IP De Run 6501
5504 DR Veldhoven / NL
Inventor(s)01 / Labetski, Dzmitry
Generaal van Dedemlaan 142
5623 GJ Eindhoven / NL
02 / Banine, Vadim
Nierslaan 2
5704 NK Helmond / NL
03 / Loopstra, Erik
Lakenstraat 32-34
5613 ES Eindhoven / NL
04 / Moors, Roel
Dierdonklaan 56
5709 MT Helmond / NL
05 / Swinkels, Gerardus
Generaal Coenderslaan 27
5623 LT Eindhoven / NL
 [2010/13]
Representative(s)Slenders, Petrus Johannes Waltherus, et al
ASML Netherlands B.V.
Corporate Intellectual Property
De Run 6501
P.O. Box 324
5500 AH Veldhoven / NL
[N/P]
Former [2012/52]Slenders, Petrus J. W., et al
ASML Netherlands B.V.
Corporate Intellectual Property
P.O. Box 324
5500 AH Veldhoven / NL
Former [2010/13]Slenders, Petrus J. W.
ASML Netherlands B.V De Run 6501
NL-5504 DR Veldhoven / NL
Application number, filing date09169681.508.09.2009
[2010/13]
Priority number, dateUS20080136686P25.09.2008         Original published format: US 136686 P
US20080193704P17.12.2008         Original published format: US 193704 P
[2010/13]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP2170021
Date:31.03.2010
Language:EN
[2010/13]
Type: A3 Search report 
No.:EP2170021
Date:28.04.2010
[2010/17]
Type: B1 Patent specification 
No.:EP2170021
Date:04.11.2015
Language:EN
[2015/45]
Search report(s)(Supplementary) European search report - dispatched on:EP25.03.2010
ClassificationIPC:H05G2/00
[2010/13]
CPC:
H05G2/001 (EP,US); H05G2/003 (EP,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   SM,   TR [2015/45]
Former [2010/13]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  SE,  SI,  SK,  SM,  TR 
TitleGerman:Quellenmodul, Strahlungsquelle und Lithografievorrichtung[2010/13]
English:Source module, radiation source and lithographic apparatus[2010/13]
French:Module source, source de radiation et appareil lithographique[2010/13]
Examination procedure14.10.2010Examination requested  [2010/47]
12.11.2010Despatch of a communication from the examining division (Time limit: M04)
01.03.2011Reply to a communication from the examining division
20.06.2011Despatch of a communication from the examining division (Time limit: M04)
18.10.2011Reply to a communication from the examining division
05.03.2012Despatch of a communication from the examining division (Time limit: M06)
04.09.2012Reply to a communication from the examining division
13.06.2013Despatch of a communication from the examining division (Time limit: M06)
06.12.2013Reply to a communication from the examining division
09.04.2015Communication of intention to grant the patent
04.08.2015Fee for grant paid
04.08.2015Fee for publishing/printing paid
04.08.2015Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  12.11.2010
Opposition(s)05.08.2016No opposition filed within time limit [2016/41]
Fees paidRenewal fee
22.09.2011Renewal fee patent year 03
20.09.2012Renewal fee patent year 04
20.09.2013Renewal fee patent year 05
26.09.2014Renewal fee patent year 06
25.09.2015Renewal fee patent year 07
Opt-out from the exclusive  Tooltip
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU08.09.2009
AT04.11.2015
BE04.11.2015
BG04.11.2015
CY04.11.2015
CZ04.11.2015
DK04.11.2015
EE04.11.2015
ES04.11.2015
FI04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
LV04.11.2015
MC04.11.2015
MK04.11.2015
NL04.11.2015
PL04.11.2015
RO04.11.2015
SE04.11.2015
SI04.11.2015
SK04.11.2015
SM04.11.2015
TR04.11.2015
NO04.02.2016
GR05.02.2016
IS04.03.2016
PT04.03.2016
[2018/38]
Former [2018/33]HU08.09.2009
AT04.11.2015
BE04.11.2015
CY04.11.2015
CZ04.11.2015
DK04.11.2015
EE04.11.2015
ES04.11.2015
FI04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
LV04.11.2015
MC04.11.2015
MK04.11.2015
NL04.11.2015
PL04.11.2015
RO04.11.2015
SE04.11.2015
SI04.11.2015
SK04.11.2015
SM04.11.2015
TR04.11.2015
NO04.02.2016
GR05.02.2016
IS04.03.2016
PT04.03.2016
Former [2018/29]HU08.09.2009
AT04.11.2015
BE04.11.2015
CY04.11.2015
CZ04.11.2015
DK04.11.2015
EE04.11.2015
ES04.11.2015
FI04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
LV04.11.2015
MC04.11.2015
MK04.11.2015
NL04.11.2015
PL04.11.2015
RO04.11.2015
SE04.11.2015
SI04.11.2015
SK04.11.2015
SM04.11.2015
TR04.11.2015
NO04.02.2016
GR05.02.2016
IS04.03.2016
PT04.03.2016
Former [2018/28]HU08.09.2009
AT04.11.2015
BE04.11.2015
CY04.11.2015
CZ04.11.2015
DK04.11.2015
EE04.11.2015
ES04.11.2015
FI04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
LV04.11.2015
MC04.11.2015
MK04.11.2015
NL04.11.2015
PL04.11.2015
RO04.11.2015
SE04.11.2015
SI04.11.2015
SK04.11.2015
SM04.11.2015
NO04.02.2016
GR05.02.2016
IS04.03.2016
PT04.03.2016
Former [2017/31]AT04.11.2015
BE04.11.2015
CZ04.11.2015
DK04.11.2015
EE04.11.2015
ES04.11.2015
FI04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
LV04.11.2015
MC04.11.2015
NL04.11.2015
PL04.11.2015
RO04.11.2015
SE04.11.2015
SI04.11.2015
SK04.11.2015
SM04.11.2015
NO04.02.2016
GR05.02.2016
IS04.03.2016
PT04.03.2016
Former [2017/03]AT04.11.2015
BE04.11.2015
CZ04.11.2015
DK04.11.2015
EE04.11.2015
ES04.11.2015
FI04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
LV04.11.2015
NL04.11.2015
PL04.11.2015
RO04.11.2015
SE04.11.2015
SI04.11.2015
SK04.11.2015
SM04.11.2015
NO04.02.2016
GR05.02.2016
IS04.03.2016
PT04.03.2016
Former [2016/49]AT04.11.2015
CZ04.11.2015
DK04.11.2015
EE04.11.2015
ES04.11.2015
FI04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
LV04.11.2015
NL04.11.2015
PL04.11.2015
RO04.11.2015
SE04.11.2015
SI04.11.2015
SK04.11.2015
SM04.11.2015
NO04.02.2016
GR05.02.2016
IS04.03.2016
PT04.03.2016
Former [2016/39]AT04.11.2015
CZ04.11.2015
DK04.11.2015
EE04.11.2015
ES04.11.2015
FI04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
LV04.11.2015
NL04.11.2015
PL04.11.2015
RO04.11.2015
SE04.11.2015
SK04.11.2015
SM04.11.2015
NO04.02.2016
GR05.02.2016
IS04.03.2016
PT04.03.2016
Former [2016/38]AT04.11.2015
CZ04.11.2015
EE04.11.2015
ES04.11.2015
FI04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
LV04.11.2015
NL04.11.2015
PL04.11.2015
RO04.11.2015
SE04.11.2015
SK04.11.2015
SM04.11.2015
NO04.02.2016
GR05.02.2016
IS04.03.2016
PT04.03.2016
Former [2016/36]AT04.11.2015
CZ04.11.2015
EE04.11.2015
ES04.11.2015
FI04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
LV04.11.2015
NL04.11.2015
PL04.11.2015
RO04.11.2015
SE04.11.2015
SK04.11.2015
NO04.02.2016
GR05.02.2016
IS04.03.2016
PT04.03.2016
Former [2016/34]AT04.11.2015
CZ04.11.2015
ES04.11.2015
FI04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
LV04.11.2015
NL04.11.2015
PL04.11.2015
SE04.11.2015
NO04.02.2016
GR05.02.2016
IS04.03.2016
PT04.03.2016
Former [2016/25]AT04.11.2015
ES04.11.2015
FI04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
LV04.11.2015
NL04.11.2015
PL04.11.2015
SE04.11.2015
NO04.02.2016
GR05.02.2016
IS04.03.2016
PT04.03.2016
Former [2016/24]AT04.11.2015
ES04.11.2015
FI04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
NL04.11.2015
PL04.11.2015
SE04.11.2015
NO04.02.2016
GR05.02.2016
IS04.03.2016
PT04.03.2016
Former [2016/23]ES04.11.2015
HR04.11.2015
IT04.11.2015
LT04.11.2015
NL04.11.2015
SE04.11.2015
NO04.02.2016
IS04.03.2016
Former [2016/22]ES04.11.2015
IT04.11.2015
LT04.11.2015
NL04.11.2015
NO04.02.2016
IS04.03.2016
Former [2016/21]ES04.11.2015
IT04.11.2015
LT04.11.2015
NO04.02.2016
Former [2016/20]ES04.11.2015
LT04.11.2015
Documents cited:Search[X]WO2006123270  (PHILIPS INTELLECTUAL PROPERTY [DE], et al) [X] 12,13,15 * abstract * * page 5, lines 18-21 * * page 6, lines 4-16 * * page 7, lines 6,7 ** figures 1,2 *;
 [X]WO2007005414  (CYMER INC [US], et al) [X] 1 * abstract * * page 8, lines 17-22 * * page 9, lines 10-15 * * figure 1 *;
 [X]EP1775755  (NIKON CORP [JP]) [X] 12,15 * paragraphs [0034] - [0041] - [0062] * * figures 3,5 *;
 [X]JP2007134166  (USHIO ELECTRIC INC) [X] 1,4,5,8,10 * abstract * * paragraphs [0006] , [0017] , [0019] * * figure 1 *;
 [X]US2008048133  (BYKANOV ALEXANDER N [US], et al) [X] 1,2,4,8,10,11,14 * abstract * * paragraphs [0022] , [0023] , [0028] - [0031] * * figures 1,2,4 *
ExaminationUS2006261290
 US2008179548
by applicantUS2008048133
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.