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Extract from the Register of European Patents

EP About this file: EP2182412

EP2182412 - Radiation source and lithographic apparatus [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  30.11.2018
Database last updated on 07.10.2024
FormerGrant of patent is intended
Status updated on  26.02.2018
Most recent event   Tooltip30.11.2018Application deemed to be withdrawnpublished on 02.01.2019  [2019/01]
Applicant(s)For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
[2010/18]
Inventor(s)01 / Loopstra, Erik
Lakenstraat 32-34
5613 ES Eindhoven / NL
02 / Banine, Vadim
Nierslaan 2
5704 NK Helmond / NL
03 / Swinkels, Gerardus
Generaal Coenderslaan 27
5623 LT Eindhoven / NL
04 / Buurman, Erik
De Glazenmaker 62
5506 EP Veldhoven / NL
 [2010/18]
Representative(s)Slenders, Petrus Johannes Waltherus, et al
ASML Netherlands B.V.
Corporate Intellectual Property
De Run 6501
P.O. Box 324
5500 AH Veldhoven / NL
[N/P]
Former [2012/52]Slenders, Petrus J. W., et al
ASML Netherlands B.V.
Corporate Intellectual Property
P.O. Box 324
5500 AH Veldhoven / NL
Former [2010/18]Slenders, Petrus J. W.
ASML Netherlands B.V. De Run 6504
5504 DR Veldhoven / NL
Application number, filing date09171960.901.10.2009
[2010/18]
Priority number, dateUS20080111149P04.11.2008         Original published format: US 111149 P
US20090172637P24.04.2009         Original published format: US 172637 P
[2010/18]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP2182412
Date:05.05.2010
Language:EN
[2010/18]
Search report(s)(Supplementary) European search report - dispatched on:EP14.01.2010
ClassificationIPC:G03F7/20, H05G2/00
[2010/18]
CPC:
G03F7/70108 (EP,US); G03F7/70033 (EP,US); H05G2/003 (EP,US);
H05G2/008 (EP,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   SM,   TR [2010/18]
TitleGerman:Strahlungsquelle und lithografische Vorrichtung[2010/18]
English:Radiation source and lithographic apparatus[2010/18]
French:Source de radiation et appareil lithographique[2010/18]
Examination procedure28.10.2010Examination requested  [2010/49]
15.12.2010Despatch of a communication from the examining division (Time limit: M04)
19.04.2011Reply to a communication from the examining division
27.02.2018Communication of intention to grant the patent
10.07.2018Application deemed to be withdrawn, date of legal effect  [2019/01]
20.08.2018Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time  [2019/01]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  15.12.2010
Fees paidRenewal fee
20.10.2011Renewal fee patent year 03
23.10.2012Renewal fee patent year 04
24.10.2013Renewal fee patent year 05
23.10.2014Renewal fee patent year 06
26.10.2015Renewal fee patent year 07
21.10.2016Renewal fee patent year 08
25.10.2017Renewal fee patent year 09
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Documents cited:Search[X]US6285743  (KONDO HIROYUKI [JP], et al) [X] 1-6,12,13 * abstract * * column 5, lines 47-58 * * column 7, line 61 - column 8, line 14 * * column 8, line 63 - column 9, line 37 * * column 10, lines 18-51 * * column 11, lines 6-67 * * column 13, lines 33-42,61-67 *;
 [XA]EP1255163  (TRW INC [US]) [X] 1,4-6,12,13 * abstract * * paragraphs [0003] , [0004] , [0018] * [A] 2;
 [A]US6703625  (DOROS THEODORE G [US]) [A] 1,7-13 * abstract * * column 2, lines 27-30 * * column 3, line 11 - column 5, line 55 ** column 11, lines 24-58 *;
 [X]FR2860385  (CIT ALCATEL [FR]) [X] 1-13 * abstract * * page 5, line 26 - page 6, line 35 * * page 9, lines 1-19 * * page 10, line 28 - page 11, line 3 *;
 [XA]FR2871622  (COMMISSARIAT ENERGIE ATOMIQUE [FR], et al) [X] 1-6,12,13 * abstract * * page 8, lines 7-21 * * page 9, line 18 - page 10, line 8 * * page 12, lines 5-26 * * page 13, line 30 - page 14, line 2 * * page 14, lines 27-32 * [A] 8,10;
 [XA]US2006215712  (ZIENER CHRISTIAN [DE], et al) [X] 1-6,11-13 * abstract * * paragraphs [0035] , [0074] - [0081] - [0085] * [A] 8,10
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.