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Extract from the Register of European Patents

EP About this file: EP2321450

EP2321450 - METHODS AND SYSTEM FOR GENERATING A PUMPING FORCE IN A SILICON MELT BY APPLYING A TIME-VARYING MAGNETIC FIELD [Right-click to bookmark this link]
Former [2011/20]GENERATING A PUMPING FORCE IN A SILICON MELT BY APPLYING A TIME-VARYING MAGNETIC FIELD
[2012/16]
StatusNo opposition filed within time limit
Status updated on  09.08.2013
Database last updated on 02.08.2024
Most recent event   Tooltip17.07.2015Lapse of the patent in a contracting state
New state(s): HU		published on 19.08.2015  [2015/34]
Applicant(s)For all designated states
MEMC Electronic Materials, Inc.
501 Pearl Drive
St. Peters, MO 63376 / US
[2011/20]
Inventor(s)01 / SREEDHARAMURTHY, Hariprasad
C/o Memc Electronic Materials Inc.
501 Pearl Drive
St. Peters, MO 63376 / US
02 / KULKARNI, Milind, S.
C/o Memc Electronic Materials Inc.
501 Pearl Drive
St. Peters, MO 63376 / US
03 / KORB, Harold, W.
C/o Memc Electronic Materials Inc.
501 Pearl Drive
St. Peters, MO 63376 / US
 [2012/40]
Former [2011/20]01 / SREEDHARAMURTHY, Hariprasad
C/o Memc Electronic Materials Inc. 501 Pearl Drive
St. Peters, MO 63376 / US
02 / KULKARNI, Milind, S.
C/o Memc Electronic Materials Inc. 501 Pearl Drive
St. Peters, MO 63376 / US
03 / KORB, Harold, W.
C/o Memc Electronic Materials Inc. 501 Pearl Drive
St. Peters, MO 63376 / US
Representative(s)Maiwald, Walter
Maiwald GmbH
Elisenhof
Elisenstraße 3
80335 München / DE
[N/P]
Former [2012/40]Maiwald, Walter
Maiwald Patentanwalts GmbH
Elisenhof
Elisenstrasse 3
80335 München / DE
Former [2011/20]Maiwald, Walter
Maiwald Patentanwalts GmbH Elisenhof Elisenstraße 3
DE-80335 München / DE
Application number, filing date09791232.306.08.2009
[2011/20]
WO2009US53002
Priority number, dateUS20080087117P07.08.2008         Original published format: US 87117 P
[2011/20]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2010017389
Date:11.02.2010
Language:EN
[2010/06]
Type: A1 Application with search report 
No.:EP2321450
Date:18.05.2011
Language:EN
The application published by WIPO in one of the EPO official languages on 11.02.2010 takes the place of the publication of the European patent application.
[2011/20]
Type: B1 Patent specification 
No.:EP2321450
Date:03.10.2012
Language:EN
[2012/40]
Search report(s)International search report - published on:EP11.02.2010
ClassificationIPC:C30B15/30, C30B29/06
[2011/20]
CPC:
C30B15/305 (EP,US); C30B15/30 (KR); C30B29/06 (EP,KR,US);
H01L21/02 (KR); Y10T117/1008 (US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   SM,   TR [2011/20]
TitleGerman:VERFAHREN UND ANLAGE ZUR ERZEUGUNG EINER PUMPKRAFT IN EINER SILICIUMSCHMELZE DUCH ANLEGEN EINES ZEITLICH VARIABLEN MAGNETFELDS[2012/16]
English:METHODS AND SYSTEM FOR GENERATING A PUMPING FORCE IN A SILICON MELT BY APPLYING A TIME-VARYING MAGNETIC FIELD[2012/16]
French:MÉTHODES ET DISPOSITIF POUR LA GÉNÉRATION D'UNE FORCE DE POMPAGE DANS UN BAIN DE FUSION DE SILICIUM, EN APPLIQUANT UN CHAMP MAGNÉTIQUE VARIABLE DANS LE TEMPS[2012/16]
Former [2011/20]ERZEUGUNG EINER PUMPKRAFT IN EINER SILICIUMSCHMELZE DUCH ANLEGEN EINES ZEITLICH VARIABLEN MAGNETFELDS
Former [2011/20]GENERATING A PUMPING FORCE IN A SILICON MELT BY APPLYING A TIME-VARYING MAGNETIC FIELD
Former [2011/20]GÉNÉRATION D'UNE FORCE DE POMPAGE DANS UN BAIN DE FUSION DE SILICIUM, EN APPLIQUANT UN CHAMP MAGNÉTIQUE VARIABLE DANS LE TEMPS
Entry into regional phase03.03.2011National basic fee paid 
03.03.2011Designation fee(s) paid 
03.03.2011Examination fee paid 
Examination procedure03.03.2011Examination requested  [2011/20]
11.04.2011Amendment by applicant (claims and/or description)
08.11.2011Despatch of a communication from the examining division (Time limit: M04)
01.03.2012Reply to a communication from the examining division
26.04.2012Communication of intention to grant the patent
02.08.2012Fee for grant paid
02.08.2012Fee for publishing/printing paid
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  08.11.2011
Opposition(s)04.07.2013No opposition filed within time limit [2013/37]
Fees paidRenewal fee
25.08.2011Renewal fee patent year 03
27.08.2012Renewal fee patent year 04
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU06.08.2009
AT03.10.2012
BE03.10.2012
CY03.10.2012
CZ03.10.2012
DK03.10.2012
EE03.10.2012
FI03.10.2012
HR03.10.2012
IT03.10.2012
LT03.10.2012
LV03.10.2012
MC03.10.2012
MK03.10.2012
MT03.10.2012
NL03.10.2012
PL03.10.2012
RO03.10.2012
SE03.10.2012
SI03.10.2012
SK03.10.2012
SM03.10.2012
TR03.10.2012
BG03.01.2013
NO03.01.2013
GR04.01.2013
ES14.01.2013
IS03.02.2013
PT04.02.2013
[2015/34]
Former [2015/32]AT03.10.2012
BE03.10.2012
CY03.10.2012
CZ03.10.2012
DK03.10.2012
EE03.10.2012
FI03.10.2012
HR03.10.2012
IT03.10.2012
LT03.10.2012
LV03.10.2012
MC03.10.2012
MK03.10.2012
MT03.10.2012
NL03.10.2012
PL03.10.2012
RO03.10.2012
SE03.10.2012
SI03.10.2012
SK03.10.2012
SM03.10.2012
TR03.10.2012
BG03.01.2013
NO03.01.2013
GR04.01.2013
ES14.01.2013
IS03.02.2013
PT04.02.2013
Former [2015/24]AT03.10.2012
BE03.10.2012
CY03.10.2012
CZ03.10.2012
DK03.10.2012
EE03.10.2012
FI03.10.2012
HR03.10.2012
IT03.10.2012
LT03.10.2012
LV03.10.2012
MC03.10.2012
NL03.10.2012
PL03.10.2012
RO03.10.2012
SE03.10.2012
SI03.10.2012
SK03.10.2012
SM03.10.2012
BG03.01.2013
NO03.01.2013
GR04.01.2013
ES14.01.2013
IS03.02.2013
PT04.02.2013
Former [2014/20]AT03.10.2012
BE03.10.2012
CY03.10.2012
CZ03.10.2012
DK03.10.2012
EE03.10.2012
FI03.10.2012
HR03.10.2012
IT03.10.2012
LT03.10.2012
LV03.10.2012
MC03.10.2012
NL03.10.2012
PL03.10.2012
RO03.10.2012
SE03.10.2012
SI03.10.2012
SK03.10.2012
BG03.01.2013
NO03.01.2013
GR04.01.2013
ES14.01.2013
IS03.02.2013
PT04.02.2013
Former [2013/52]AT03.10.2012
BE03.10.2012
CY03.10.2012
CZ03.10.2012
DK03.10.2012
EE03.10.2012
FI03.10.2012
HR03.10.2012
IT03.10.2012
LT03.10.2012
LV03.10.2012
NL03.10.2012
PL03.10.2012
RO03.10.2012
SE03.10.2012
SI03.10.2012
SK03.10.2012
BG03.01.2013
NO03.01.2013
GR04.01.2013
ES14.01.2013
IS03.02.2013
PT04.02.2013
Former [2013/37]AT03.10.2012
BE03.10.2012
CZ03.10.2012
DK03.10.2012
EE03.10.2012
FI03.10.2012
HR03.10.2012
IT03.10.2012
LT03.10.2012
LV03.10.2012
NL03.10.2012
PL03.10.2012
RO03.10.2012
SE03.10.2012
SI03.10.2012
SK03.10.2012
BG03.01.2013
NO03.01.2013
GR04.01.2013
ES14.01.2013
IS03.02.2013
PT04.02.2013
Former [2013/35]AT03.10.2012
BE03.10.2012
CZ03.10.2012
DK03.10.2012
EE03.10.2012
FI03.10.2012
HR03.10.2012
LT03.10.2012
LV03.10.2012
NL03.10.2012
PL03.10.2012
SE03.10.2012
SI03.10.2012
SK03.10.2012
BG03.01.2013
NO03.01.2013
GR04.01.2013
ES14.01.2013
IS03.02.2013
PT04.02.2013
Former [2013/34]AT03.10.2012
BE03.10.2012
DK03.10.2012
FI03.10.2012
HR03.10.2012
LT03.10.2012
LV03.10.2012
NL03.10.2012
PL03.10.2012
SE03.10.2012
SI03.10.2012
BG03.01.2013
NO03.01.2013
GR04.01.2013
ES14.01.2013
IS03.02.2013
PT04.02.2013
Former [2013/31]AT03.10.2012
BE03.10.2012
FI03.10.2012
HR03.10.2012
LT03.10.2012
LV03.10.2012
NL03.10.2012
PL03.10.2012
SE03.10.2012
SI03.10.2012
NO03.01.2013
GR04.01.2013
ES14.01.2013
IS03.02.2013
PT04.02.2013
Former [2013/28]BE03.10.2012
FI03.10.2012
HR03.10.2012
LT03.10.2012
LV03.10.2012
NL03.10.2012
PL03.10.2012
SE03.10.2012
SI03.10.2012
NO03.01.2013
GR04.01.2013
ES14.01.2013
IS03.02.2013
PT04.02.2013
Former [2013/24]BE03.10.2012
FI03.10.2012
HR03.10.2012
LT03.10.2012
LV03.10.2012
NL03.10.2012
PL03.10.2012
SE03.10.2012
SI03.10.2012
NO03.01.2013
GR04.01.2013
ES14.01.2013
IS03.02.2013
Former [2013/23]FI03.10.2012
HR03.10.2012
LT03.10.2012
LV03.10.2012
NL03.10.2012
PL03.10.2012
SE03.10.2012
SI03.10.2012
NO03.01.2013
ES14.01.2013
IS03.02.2013
Former [2013/22]FI03.10.2012
LT03.10.2012
NL03.10.2012
SE03.10.2012
SI03.10.2012
NO03.01.2013
ES14.01.2013
IS03.02.2013
Former [2013/21]LT03.10.2012
SE03.10.2012
SI03.10.2012
NO03.01.2013
Former [2013/20]LT03.10.2012
SI03.10.2012
NO03.01.2013
Former [2013/11]SI03.10.2012
Cited inInternational search[Y]DE19529481  (WACKER SILTRONIC HALBLEITERMAT [DE]) [Y] 15,16 * page 2 - page 3 *;
 [XY]US2006144320  (KORB HAROLD W [US]) [X] 1-3,5,6,10-14,17-20 * paragraphs [0010] , [0011] , [0013] , [0015] , [0016] , [0056] * [Y] 4,7-9,15,16;
 [Y]US2006144321  (LU ZHENG [US]) [Y] 7-9 * paragraphs [0012] , [0013] , [0054] , [0062] , [0063] , [0070] *;
 [A]US2007022943  (HONG YOUNG HO [KR], et al) [A] 1-16* paragraphs [0009] , [0013] , [0037] , [0048]; figure 2 *;
 [Y]  - VIZMAN ET AL, "Influence of different types of magnetic fields on the interface shape in a 200mm Si-EMCZ configuration", JOURNAL OF CRYSTAL GROWTH, ELSEVIER, AMSTERDAM, NL, (20070410), vol. 303, no. 1, ISSN 0022-0248, pages 221 - 225, XP022025702 [Y] 4 * page 223 - page 224 *

DOI:   http://dx.doi.org/10.1016/j.jcrysgro.2006.11.347
 [A]  - WATANABE M ET AL, "Large modification of crystal-melt interface shape during Si crystal growth by using electromagnetic Czochralski method (EMCZ)", JOURNAL OF CRYSTAL GROWTH, ELSEVIER, AMSTERDAM, NL, vol. 292, no. 2, ISSN 0022-0248, (20060701), pages 252 - 256, (20060701), XP025157061 [A] 1-16 * the whole document *

DOI:   http://dx.doi.org/10.1016/j.jcrysgro.2006.04.047
by applicantDE19529481
 US2006144320
 US2006144321
    - VIZMAN D. ET AL., J. CRYST. GROWTH, (2007), vol. 303, pages 221 - 225
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.