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Extract from the Register of European Patents

EP About this file: EP2281922

EP2281922 - Method and apparatus of using solution based precursors for atomic layer deposition [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  17.11.2017
Database last updated on 06.07.2024
FormerExamination is in progress
Status updated on  03.03.2017
Most recent event   Tooltip17.11.2017Application deemed to be withdrawnpublished on 20.12.2017  [2017/51]
Applicant(s)For all designated states
Linde LLC
575 Mountain Avenue
Murray Hill, NJ 07974 / US
[2011/06]
Inventor(s)01 / Hogle, Richard, Allen
4654 Merrick Court
Oceanside CA 92056 / US
02 / Helly, Patrick, Joseph
14110 Oak Glen Road
Valley Center CA 92082 / US
03 / Wang, Qing, Min
135 Meadowview Road
North Andover, MA 01845 / US
04 / Ma, Ce
5653 Shasta Daisy Trail
San Diego, CA 92130 / US
 [2011/18]
Former [2011/12]01 / Hogle, Richard, Allen
4654 Merrick Court
Oceanside CA 92056 / US
02 / Helly, Patrick, Joseph
14110 Oak Glen Road
Valley Center CA 92082 / US
03 / Wang, Qing, Min
135 Meadowview Road
North Andover, MA 01845 / US
04 / Ma, Ce
305 Billinggratz Turn Lane
Cary NC 27519 / US
Former [2011/06]01 / Hogle, Richard, Allen
4654 Merrick Court
Oceanside CA 92056 / US
02 / Helly, Patrick, Joseph
14110 Oak Glen Road
Valley Center CA 92082 / US
03 / Wang, Qing, Min
235 West Locust Avenue
Edison New Jersey 08820 / US
04 / Ma, Ce
305 Billinggratz Turn Lane
Cary NC 27519 / US
Representative(s)Gellner, Bernd
Linde GmbH
Intellectual Property EMEA
Dr.-Carl-von-Linde-Straße 6-14
82049 Pullach / DE
[N/P]
Former [2011/06]Gellner, Bernd
Linde AG Legal Services Intellectual Property Dr.-Carl-von-Linde-Strasse 6-14
82049 Pullach / DE
Application number, filing date10012892.525.04.2006
[2011/06]
Priority number, dateUS20050676491P29.04.2005         Original published format: US 676491 P
US2006040090410.04.2006         Original published format: US 400904
[2011/06]
Previously filed application, dateEP2006025221325.04.2006
[2011/06]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP2281922
Date:09.02.2011
Language:EN
[2011/06]
Type: A3 Search report 
No.:EP2281922
Date:22.06.2011
[2011/25]
Search report(s)(Supplementary) European search report - dispatched on:EP19.05.2011
ClassificationIPC:C23C16/455
[2011/06]
CPC:
C23C16/45544 (EP,US); H01L21/20 (KR); C23C16/448 (EP,US);
C23C16/45525 (EP,US); Y10T428/8305 (EP,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2011/06]
Extension statesALNot yet paid
BANot yet paid
HRNot yet paid
MKNot yet paid
YUNot yet paid
TitleGerman:Vorrichtung und Verfahren zur lösungs-basierten Abscheidung von Atomschichten[2011/06]
English:Method and apparatus of using solution based precursors for atomic layer deposition[2011/06]
French:Méthode et appareil pour dépôt par couche atomique utilisant une solution.[2011/06]
Examination procedure22.12.2011Examination requested  [2012/05]
03.04.2012Amendment by applicant (claims and/or description)
06.03.2017Despatch of a communication from the examining division (Time limit: M04)
18.07.2017Application deemed to be withdrawn, date of legal effect  [2017/51]
16.08.2017Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2017/51]
Parent application(s)   TooltipEP06252213.1  / EP1717343
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued (EP20060252213) is  12.06.2008
Request for further processing for:The application is deemed to be withdrawn due to failure to reply to the Extended European Search Report/Written Opinion of the International Searching Authority/International Preliminary Examination Report/Supplementary international search report/Supplementary European search report
03.04.2012Request for further processing filed
03.04.2012Full payment received (date of receipt of payment)
Request granted
24.04.2012Decision despatched
Fees paidRenewal fee
01.10.2010Renewal fee patent year 03
01.10.2010Renewal fee patent year 04
01.10.2010Renewal fee patent year 05
12.04.2011Renewal fee patent year 06
28.03.2012Renewal fee patent year 07
12.04.2013Renewal fee patent year 08
25.03.2014Renewal fee patent year 09
10.04.2015Renewal fee patent year 10
11.04.2016Renewal fee patent year 11
Penalty fee
Additional fee for renewal fee
30.04.201712   M06   Not yet paid
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Documents cited:Search[XY]US5356477  (VISSER JAN [NL]) [X] 1,4 * column 2, line 8 - line 55 * * column 6, line 21 - line 58 * [Y] 2,3,5-15;
 [Y]US2004043149  (GORDON ROY G [US], et al) [Y] 5 * table 1 *;
 [Y]  - POTTER R J ET AL, "DEPOSITION OF HFO2, GD2O3 AND PROX BY LIQUID INJECTION ALD TECHNIQUES", CHEMICAL VAPOR DEPOSITION, WILEY-VCH VERLAG, WEINHEIM, DE, (200503), vol. 11, no. 3, ISSN 0948-1907, pages 159 - 169, XP001236223 [Y] 2,3,6,7,9-15 * paragraph [02.1] *

DOI:   http://dx.doi.org/10.1002/cvde.200406348
 [Y]  - D.B. BEACH ET AL, "MOCVD of very thin films of lead lanthanum titanate", MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS. METAL-ORGANIC CHEMICAL VAPOR DEPOSITION OF ELECTRONIC CERAMICS II., us, (19951127), vol. 415, pages 225 - 230, XP008079571 [Y] 8 *Deposition process*
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.