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Extract from the Register of European Patents

EP About this file: EP2221668

EP2221668 - Lithographic apparatus and positioning assembly [Right-click to bookmark this link]
Former [2010/34]Lithographic apparatus and device manufacturing method
[2020/51]
StatusNo opposition filed within time limit
Status updated on  18.02.2022
Database last updated on 15.06.2024
FormerThe patent has been granted
Status updated on  12.03.2021
FormerGrant of patent is intended
Status updated on  13.12.2020
FormerExamination is in progress
Status updated on  28.07.2017
Most recent event   Tooltip14.06.2024Lapse of the patent in a contracting state
New state(s): TR		published on 17.07.2024 [2024/29]
Applicant(s)For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
[2021/15]
Former [2010/34]For all designated states
ASML Netherlands B.V.
Corporate IP De Run 6501
5504 DR Veldhoven / NL
Inventor(s)01 / Vervoordeldonk, Michael, Johannes
Pastoor de Leijerstraat 16
5246 JC, Rosmalen / NL
02 / Kunst, Ronald
Peulland 14
5663 JZ Geldrop / NL
03 / De Vos, Youssef
Kaulildijk 1
2275, Lille / BE
04 / Van de Rijdt, Johannes, Hubertus, Antonius
Bunder 45
5421 AG, Gemert / NL
05 / Van Kempen, Robertus Jacobus Theodorus
Korenbloem 5
5427 BN, Boekel / NL
 [2021/15]
Former [2010/34]01 / Vervoordeldonk, Michael, Johannes
Pastoor de Leijerstraat 16
5246 JC, Rosmalen / NL
02 / Kunst, Ronald
Peulland 14
5663 JZ Geldrop / NL
03 / De Vos, Youssef
Kaulildijk 1
2275, Lille / BE
04 / Van de Rijdt, Johannes, Hubertus, Antonius
Bunder 45
5421 AG, Gemert / NL
05 / Van Kempen, Robertus Jacobus Theodorus
Korenbloem 5
5427 BN, Boekel / NL
Representative(s)ASML Netherlands B.V.
Corporate Intellectual Property
P.O. Box 324
5500 AH Veldhoven / NL
[2021/15]
Former [2012/52]Maas, Abraham Johannes, et al
ASML Netherlands B.V.
Corporate Intellectual Property
P.O. Box 324
5500 AH Veldhoven / NL
Former [2010/34]Maas, Abraham Johannes
ASML Netherlands B.V. De Run 6501
5504 DR Veldhoven / NL
Application number, filing date10151504.725.01.2010
[2010/34]
Priority number, dateUS20090155019P24.02.2009         Original published format: US 155019 P
[2010/34]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP2221668
Date:25.08.2010
Language:EN
[2010/34]
Type: B1 Patent specification 
No.:EP2221668
Date:14.04.2021
Language:EN
[2021/15]
Search report(s)(Supplementary) European search report - dispatched on:EP11.06.2010
ClassificationIPC:G03F7/20
[2010/34]
CPC:
G03F7/70758 (EP,KR,US); G03F7/70775 (KR); G03F7/70716 (KR);
G03F7/70725 (KR); G03F7/70783 (EP,US); Y10T74/20354 (EP,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   SM,   TR [2021/15]
Former [2010/34]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  SE,  SI,  SK,  SM,  TR 
TitleGerman:Lithographischer Apparat und Positionierungsanordnung[2020/51]
English:Lithographic apparatus and positioning assembly[2020/51]
French:Appareil lithographique et dispositif de positionnement[2020/51]
Former [2010/34]Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
Former [2010/34]Lithographic apparatus and device manufacturing method
Former [2010/34]Appareil lithographique et procédé de fabrication d'un dispositif
Examination procedure23.02.2011Amendment by applicant (claims and/or description)
23.02.2011Examination requested  [2011/14]
18.02.2015Despatch of a communication from the examining division (Time limit: M06)
12.08.2015Reply to a communication from the examining division
18.07.2017Despatch of a communication from the examining division (Time limit: M06)
11.01.2018Reply to a communication from the examining division
19.03.2019Despatch of a communication from the examining division (Time limit: M06)
11.09.2019Reply to a communication from the examining division
26.11.2019Despatch of a communication from the examining division (Time limit: M06)
11.05.2020Reply to a communication from the examining division
14.12.2020Communication of intention to grant the patent
09.03.2021Fee for grant paid
09.03.2021Fee for publishing/printing paid
09.03.2021Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  18.02.2015
Opposition(s)17.01.2022No opposition filed within time limit [2022/12]
Fees paidRenewal fee
25.01.2012Renewal fee patent year 03
28.01.2013Renewal fee patent year 04
30.01.2014Renewal fee patent year 05
23.01.2015Renewal fee patent year 06
27.01.2016Renewal fee patent year 07
20.01.2017Renewal fee patent year 08
26.01.2018Renewal fee patent year 09
22.01.2019Renewal fee patent year 10
23.01.2020Renewal fee patent year 11
27.01.2021Renewal fee patent year 12
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU25.01.2010
AT14.04.2021
CY14.04.2021
CZ14.04.2021
DK14.04.2021
EE14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
IT14.04.2021
LT14.04.2021
LV14.04.2021
MC14.04.2021
MK14.04.2021
PL14.04.2021
RO14.04.2021
SE14.04.2021
SI14.04.2021
SK14.04.2021
SM14.04.2021
TR14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
IS14.08.2021
PT16.08.2021
[2024/29]
Former [2024/22]HU25.01.2010
AT14.04.2021
CY14.04.2021
CZ14.04.2021
DK14.04.2021
EE14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
IT14.04.2021
LT14.04.2021
LV14.04.2021
MC14.04.2021
MK14.04.2021
PL14.04.2021
RO14.04.2021
SE14.04.2021
SI14.04.2021
SK14.04.2021
SM14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
IS14.08.2021
PT16.08.2021
Former [2024/20]HU25.01.2010
AT14.04.2021
CY14.04.2021
CZ14.04.2021
DK14.04.2021
EE14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
IT14.04.2021
LT14.04.2021
LV14.04.2021
MC14.04.2021
PL14.04.2021
RO14.04.2021
SE14.04.2021
SI14.04.2021
SK14.04.2021
SM14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
IS14.08.2021
PT16.08.2021
Former [2024/18]HU25.01.2010
AT14.04.2021
CZ14.04.2021
DK14.04.2021
EE14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
IT14.04.2021
LT14.04.2021
LV14.04.2021
MC14.04.2021
PL14.04.2021
RO14.04.2021
SE14.04.2021
SI14.04.2021
SK14.04.2021
SM14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
IS14.08.2021
PT16.08.2021
Former [2022/39]AT14.04.2021
CZ14.04.2021
DK14.04.2021
EE14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
IT14.04.2021
LT14.04.2021
LV14.04.2021
MC14.04.2021
PL14.04.2021
RO14.04.2021
SE14.04.2021
SI14.04.2021
SK14.04.2021
SM14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
IS14.08.2021
PT16.08.2021
Former [2022/36]AT14.04.2021
CZ14.04.2021
DK14.04.2021
EE14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
IT14.04.2021
LT14.04.2021
LV14.04.2021
PL14.04.2021
RO14.04.2021
SE14.04.2021
SI14.04.2021
SK14.04.2021
SM14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
IS14.08.2021
PT16.08.2021
Former [2022/29]AT14.04.2021
CZ14.04.2021
DK14.04.2021
EE14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
LT14.04.2021
LV14.04.2021
PL14.04.2021
RO14.04.2021
SE14.04.2021
SI14.04.2021
SK14.04.2021
SM14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
IS14.08.2021
PT16.08.2021
Former [2022/23]AT14.04.2021
CZ14.04.2021
DK14.04.2021
EE14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
LT14.04.2021
LV14.04.2021
PL14.04.2021
RO14.04.2021
SE14.04.2021
SK14.04.2021
SM14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
IS14.08.2021
PT16.08.2021
Former [2022/10]AT14.04.2021
CZ14.04.2021
DK14.04.2021
EE14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
LT14.04.2021
LV14.04.2021
PL14.04.2021
RO14.04.2021
SE14.04.2021
SK14.04.2021
SM14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
PT16.08.2021
IS22.12.2021
Former [2022/09]AT14.04.2021
CZ14.04.2021
DK14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
LT14.04.2021
LV14.04.2021
PL14.04.2021
RO14.04.2021
SE14.04.2021
SK14.04.2021
SM14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
IS14.08.2021
PT16.08.2021
Former [2022/08]AT14.04.2021
CZ14.04.2021
DK14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
LT14.04.2021
LV14.04.2021
PL14.04.2021
SE14.04.2021
SM14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
IS14.08.2021
PT16.08.2021
Former [2022/07]AT14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
LT14.04.2021
LV14.04.2021
PL14.04.2021
SE14.04.2021
SM14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
IS14.08.2021
PT16.08.2021
Former [2021/52]AT14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
LT14.04.2021
LV14.04.2021
PL14.04.2021
SE14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
IS14.08.2021
PT16.08.2021
Former [2021/51]AT14.04.2021
ES14.04.2021
FI14.04.2021
HR14.04.2021
LT14.04.2021
LV14.04.2021
SE14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
IS14.08.2021
PT16.08.2021
Former [2021/50]AT14.04.2021
FI14.04.2021
HR14.04.2021
LT14.04.2021
LV14.04.2021
SE14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
PT16.08.2021
Former [2021/49]AT14.04.2021
FI14.04.2021
HR14.04.2021
LT14.04.2021
LV14.04.2021
SE14.04.2021
BG14.07.2021
NO14.07.2021
GR15.07.2021
Former [2021/47]AT14.04.2021
FI14.04.2021
LT14.04.2021
BG14.07.2021
Former [2021/46]AT14.04.2021
FI14.04.2021
LT14.04.2021
Documents cited:Search[XI]US5294854  (TRUMPER DAVID L [US]) [X] 1-9,13,14 * abstract * * figures 1,9 * * column 1, line 14 - line 17 * * column 4, line 54 - column 5, line 49 * * column 10, line 33 - line 59 * [I] 10-12;
 [XI]US6130517  (YUAN BAUSAN [US], et al) [X] 1-9,13,14 * abstract * * figures 1-4 * * column 1, line 6 - line 10 * * column 2, line 61 - column 3, line 27 * [I] 10-12
ExaminationDE3037648
 US2008067415
 JP2008172137
 US2008309911
 JPS6288526
 US2004140780
by applicantUS5294854
 US6130517
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.