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Extract from the Register of European Patents

EP About this file: EP2302458

EP2302458 - Lithography system [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  21.07.2017
Database last updated on 28.06.2024
Most recent event   Tooltip13.07.2018Lapse of the patent in a contracting state
New state(s): TR		published on 15.08.2018  [2018/33]
Applicant(s)For all designated states
MAPPER LITHOGRAPHY IP B.V.
Computerlaan 15
2628 XK Delft / NL
[2011/13]
Inventor(s)01 / Van 't Spijker, Johannes Christiaan
c/o Computerlaan 15
2628 XK, Delft / NL
02 / Jager, Remco
c/o Computerlaan 15
2628 XK Delft / NL
03 / Wieland, Marco Jan-Jaco
c/o Computerlaan 15
2628 XK, Delft / NL
04 / Kruit, Pieter
Koornmarkt 49
2611 EB, Delft / NL
 [2016/25]
Former [2011/13]01 / Van 't Spijker, Johannes Christiaan
c/o Computerlaan 15
2628 XK, Delft / NL
02 / Jager, Remco
Wijnbrugstraat 239
3011 XW Rotterdam / NL
03 / Wieland, Marco Jan-Jaco
c/o Computerlaan 15
2628 XK, Delft / NL
04 / Kruit, Pieter
Koornmarkt 49
2611 EB, Delft / NL
Representative(s)Peters, Sebastian Martinus
Octrooibureau Vriesendorp & Gaade B.V.
Koninginnegracht 19
2514 AB Den Haag / NL
[2016/37]
Former [2011/13]Peters, Sebastian Martinus
Octrooibureau Vriesendorp & Gaade B.V. Dr. Kuyperstraat 6
2514 BB Den Haag / NL
Application number, filing date10185251.524.10.2003
[2011/13]
Priority number, dateUS20020421464P25.10.2002         Original published format: US 421464 P
[2011/13]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP2302458
Date:30.03.2011
Language:EN
[2011/13]
Type: A3 Search report 
No.:EP2302458
Date:06.04.2011
[2011/14]
Type: B1 Patent specification 
No.:EP2302458
Date:14.09.2016
Language:EN
[2016/37]
Search report(s)(Supplementary) European search report - dispatched on:EP09.03.2011
ClassificationIPC:G03F7/20, H01J37/317
[2011/13]
CPC:
B82Y10/00 (EP,KR,US); G03F7/2006 (KR); G03F7/70383 (KR,US);
B82Y40/00 (EP,KR,US); G03B27/52 (EP,KR,US); G03F7/70291 (EP,KR,US);
G03F7/70508 (EP,KR,US); G03F7/70825 (KR,US); G03F7/70991 (EP,KR,US);
H01J37/045 (EP,KR,US); H01J37/3174 (EP,US); H01J37/3177 (EP,US);
H01L21/0274 (KR); H01L21/0275 (KR); H01J2237/0432 (EP,US);
H01J2237/0435 (EP,US); H01J2237/0437 (EP,US); H01J2237/2482 (EP,US) (-)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   RO,   SE,   SI,   SK,   TR [2016/37]
Former [2011/13]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Lithographisches System[2011/13]
English:Lithography system[2011/13]
French:Système de lithographie[2011/13]
Examination procedure06.10.2011Amendment by applicant (claims and/or description)
06.10.2011Examination requested  [2011/46]
14.04.2014Despatch of a communication from the examining division (Time limit: M06)
17.10.2014Reply to a communication from the examining division
17.04.2015Despatch of a communication from the examining division (Time limit: M06)
24.11.2015Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
04.02.2016Reply to a communication from the examining division
05.04.2016Communication of intention to grant the patent
29.07.2016Fee for grant paid
29.07.2016Fee for publishing/printing paid
29.07.2016Receipt of the translation of the claim(s)
Parent application(s)   TooltipEP03759083.3  / EP1554634
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued (EP20030759083) is  11.01.2008
Opposition(s)15.06.2017No opposition filed within time limit [2017/34]
Request for further processing for:The application is deemed to be withdrawn due to failure to reply to the examination report
04.02.2016Request for further processing filed
04.02.2016Full payment received (date of receipt of payment)
Request granted
17.02.2016Decision despatched
Fees paidRenewal fee
01.10.2010Renewal fee patent year 03
01.10.2010Renewal fee patent year 04
01.10.2010Renewal fee patent year 05
01.10.2010Renewal fee patent year 06
01.10.2010Renewal fee patent year 07
01.10.2010Renewal fee patent year 08
13.10.2011Renewal fee patent year 09
23.10.2012Renewal fee patent year 10
22.10.2013Renewal fee patent year 11
21.10.2014Renewal fee patent year 12
23.09.2015Renewal fee patent year 13
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU24.10.2003
BE14.09.2016
CY14.09.2016
CZ14.09.2016
DK14.09.2016
EE14.09.2016
ES14.09.2016
FI14.09.2016
IT14.09.2016
MC14.09.2016
RO14.09.2016
SE14.09.2016
SI14.09.2016
SK14.09.2016
TR14.09.2016
LU24.10.2016
CH31.10.2016
LI31.10.2016
BG14.12.2016
GR15.12.2016
PT16.01.2017
[2018/29]
Former [2018/28]HU24.10.2003
BE14.09.2016
CY14.09.2016
CZ14.09.2016
DK14.09.2016
EE14.09.2016
ES14.09.2016
FI14.09.2016
IT14.09.2016
MC14.09.2016
RO14.09.2016
SE14.09.2016
SI14.09.2016
SK14.09.2016
LU24.10.2016
CH31.10.2016
LI31.10.2016
BG14.12.2016
GR15.12.2016
PT16.01.2017
Former [2017/52]BE14.09.2016
CZ14.09.2016
DK14.09.2016
EE14.09.2016
ES14.09.2016
FI14.09.2016
IT14.09.2016
RO14.09.2016
SE14.09.2016
SI14.09.2016
SK14.09.2016
LU24.10.2016
CH31.10.2016
LI31.10.2016
BG14.12.2016
GR15.12.2016
PT16.01.2017
Former [2017/40]BE14.09.2016
CZ14.09.2016
DK14.09.2016
EE14.09.2016
ES14.09.2016
FI14.09.2016
IT14.09.2016
RO14.09.2016
SE14.09.2016
SK14.09.2016
LU24.10.2016
CH31.10.2016
LI31.10.2016
BG14.12.2016
GR15.12.2016
PT16.01.2017
Former [2017/35]BE14.09.2016
CZ14.09.2016
DK14.09.2016
EE14.09.2016
ES14.09.2016
FI14.09.2016
IT14.09.2016
RO14.09.2016
SE14.09.2016
SK14.09.2016
CH31.10.2016
LI31.10.2016
BG14.12.2016
GR15.12.2016
PT16.01.2017
Former [2017/34]BE14.09.2016
CZ14.09.2016
DK14.09.2016
EE14.09.2016
ES14.09.2016
FI14.09.2016
IT14.09.2016
RO14.09.2016
SE14.09.2016
SK14.09.2016
BG14.12.2016
GR15.12.2016
PT16.01.2017
Former [2017/23]BE14.09.2016
CZ14.09.2016
EE14.09.2016
ES14.09.2016
FI14.09.2016
IT14.09.2016
RO14.09.2016
SE14.09.2016
SK14.09.2016
BG14.12.2016
GR15.12.2016
PT16.01.2017
Former [2017/23]BE14.09.2016
CZ14.09.2016
EE14.09.2016
ES14.09.2016
FI14.09.2016
RO14.09.2016
SE14.09.2016
SK14.09.2016
BG14.12.2016
GR15.12.2016
Former [2017/12]ES14.09.2016
FI14.09.2016
SE14.09.2016
BE31.10.2016
GR15.12.2016
Former [2017/10]FI14.09.2016
SE14.09.2016
BE31.10.2016
Documents cited:Search[A]WO9110170  (MANUFACTURING SCIENCES INC [US]) [A] 1,16 * page 11, line 19 - line 33 * * page 21, line 15 - page 24, line 19 * * page 31, line 3 - page 32, line 1 * * figures 1,2,14-16,18 *;
 [X]US6014200  (SOGARD MICHAEL R [US], et al) [X] 1-8,14-16 * column 3, line 54 - line 67 * * column 6, line 9 - column 8, line 18 * * column 14, line 61 - column 15, line 62 * * figures 1, 2, 11A *;
 [A]WO0060632  (UT BATTELLE LLC [US], et al) [A] 1,16 * page 8, line 17 - page 12, line 20 * * page 13, line 18 - page 14, line 20 * * page 15, line 13 - page 16, line 19 * * page 18, line 3 - page 19, line 8 * * figures 4-6,8 *;
 [A]WO0135165  (ION DIAGNOSTICS INC [US]) [A] 1,16* page 28, line 4 - page 35, line 5 *
ExaminationUS2002145113
by applicantUS5834783
 US5905267
 US5981954
 WO0118606
 US6285488
 US2001028042
 US2001028043
 US2001028044
 WO02054465
 WO02058118
 WO02058119
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.