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Extract from the Register of European Patents

EP About this file: EP2456726

EP2456726 - SILICA GLASS WITH SATURATED INDUCED ABSORPTION AND METHOD OF MAKING [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  17.09.2021
Database last updated on 12.07.2024
FormerThe patent has been granted
Status updated on  09.10.2020
FormerGrant of patent is intended
Status updated on  04.06.2020
FormerExamination is in progress
Status updated on  23.11.2016
Most recent event   Tooltip14.06.2024Lapse of the patent in a contracting state
New state(s): TR
published on 17.07.2024 [2024/29]
Applicant(s)For all designated states
Corning Inc.
1 Riverfront Plaza
Corning, NY 14831 / US
[2012/22]
Inventor(s)01 / SMITH, Charlene M
222 Watauga Avenue
Corning New York 14830 / US
02 / SCHIEFELBEIN, Susan L
808 N. Tioga Street
Ithaca New York 14850 / US
 [2012/22]
Representative(s)Isarpatent
Patent- und Rechtsanwälte Barth
Charles Hassa Peckmann & Partner mbB
Postfach 44 01 51
80750 München / DE
[N/P]
Former [2020/46]Isarpatent
Patent- und Rechtsanwälte Behnisch Barth Charles
Hassa Peckmann & Partner mbB
Postfach 44 01 51
80750 München / DE
Former [2012/22]Isarpatent
Patent- und Rechtsanwälte
Postfach 44 01 51
80750 München / DE
Application number, filing date10736946.423.07.2010
[2020/46]
WO2010US43015
Priority number, dateUS2009050795023.07.2009         Original published format: US 507950
[2012/22]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO2011011662
Date:27.01.2011
Language:EN
[2011/04]
Type: A2 Application without search report 
No.:EP2456726
Date:30.05.2012
Language:EN
The application published by WIPO in one of the EPO official languages on 27.01.2011 takes the place of the publication of the European patent application.
[2012/22]
Type: B1 Patent specification 
No.:EP2456726
Date:11.11.2020
Language:EN
[2020/46]
Search report(s)International search report - published on:EP21.04.2011
ClassificationIPC:C03C3/06, C03B32/00, C03C4/04, C03C23/00, C03C4/00
[2020/18]
CPC:
C03C3/06 (EP,US); C03B32/00 (EP,US); C03C23/0025 (EP,US);
C03C4/0071 (EP,US); C03C4/0085 (EP,US); C03B2201/21 (EP,US);
C03C2201/21 (EP,US); C03C2201/23 (EP,US); C03C2203/54 (EP,US) (-)
Former IPC [2012/22]C03B19/14, C03C3/06, C03C3/04, C03C23/00
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   SM,   TR [2012/22]
Extension statesBANot yet paid
MENot yet paid
RSNot yet paid
TitleGerman:SILIZIUMGLAS MIT GESÄTTIGTER INDUZIERTER ABSORPTION UND HERSTELLUNGSVERFAHREN[2012/22]
English:SILICA GLASS WITH SATURATED INDUCED ABSORPTION AND METHOD OF MAKING[2012/22]
French:VERRE DE SILICE PRÉSENTANT UNE ABSORPTION INDUITE SATURÉE ET SON PROCÉDÉ DE FABRICATION[2012/22]
Entry into regional phase20.01.2012National basic fee paid 
20.01.2012Designation fee(s) paid 
20.01.2012Examination fee paid 
Examination procedure20.01.2012Examination requested  [2012/22]
17.09.2012Amendment by applicant (claims and/or description)
11.07.2016Despatch of a communication from the examining division (Time limit: M04)
21.11.2016Reply to a communication from the examining division
01.02.2019Despatch of a communication from the examining division (Time limit: M04)
18.04.2019Reply to a communication from the examining division
26.07.2019Despatch of a communication from the examining division (Time limit: M04)
04.12.2019Reply to a communication from the examining division
05.06.2020Communication of intention to grant the patent
02.10.2020Fee for grant paid
02.10.2020Fee for publishing/printing paid
02.10.2020Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  11.07.2016
Opposition(s)12.08.2021No opposition filed within time limit [2021/42]
Fees paidRenewal fee
25.07.2012Renewal fee patent year 03
29.07.2013Renewal fee patent year 04
28.07.2014Renewal fee patent year 05
27.07.2015Renewal fee patent year 06
27.07.2016Renewal fee patent year 07
27.07.2017Renewal fee patent year 08
09.07.2018Renewal fee patent year 09
09.07.2019Renewal fee patent year 10
10.07.2020Renewal fee patent year 11
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU23.07.2010
AL11.11.2020
AT11.11.2020
CY11.11.2020
CZ11.11.2020
DK11.11.2020
EE11.11.2020
ES11.11.2020
FI11.11.2020
HR11.11.2020
IT11.11.2020
LT11.11.2020
LV11.11.2020
MC11.11.2020
MK11.11.2020
NL11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SI11.11.2020
SK11.11.2020
SM11.11.2020
TR11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
GB23.07.2021
IE23.07.2021
LU23.07.2021
BE31.07.2021
CH31.07.2021
FR31.07.2021
LI31.07.2021
[2024/29]
Former [2024/22]HU23.07.2010
AL11.11.2020
AT11.11.2020
CY11.11.2020
CZ11.11.2020
DK11.11.2020
EE11.11.2020
ES11.11.2020
FI11.11.2020
HR11.11.2020
IT11.11.2020
LT11.11.2020
LV11.11.2020
MC11.11.2020
MK11.11.2020
NL11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SI11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
GB23.07.2021
IE23.07.2021
LU23.07.2021
BE31.07.2021
CH31.07.2021
FR31.07.2021
LI31.07.2021
Former [2023/27]HU23.07.2010
AL11.11.2020
AT11.11.2020
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CZ11.11.2020
DK11.11.2020
EE11.11.2020
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FI11.11.2020
HR11.11.2020
IT11.11.2020
LT11.11.2020
LV11.11.2020
MC11.11.2020
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PL11.11.2020
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SE11.11.2020
SI11.11.2020
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SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
GB23.07.2021
IE23.07.2021
LU23.07.2021
BE31.07.2021
CH31.07.2021
FR31.07.2021
LI31.07.2021
Former [2023/24]AL11.11.2020
AT11.11.2020
CY11.11.2020
CZ11.11.2020
DK11.11.2020
EE11.11.2020
ES11.11.2020
FI11.11.2020
HR11.11.2020
IT11.11.2020
LT11.11.2020
LV11.11.2020
MC11.11.2020
NL11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SI11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
GB23.07.2021
IE23.07.2021
LU23.07.2021
BE31.07.2021
CH31.07.2021
FR31.07.2021
LI31.07.2021
Former [2022/35]AL11.11.2020
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ES11.11.2020
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IT11.11.2020
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LV11.11.2020
MC11.11.2020
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PL11.11.2020
RO11.11.2020
SE11.11.2020
SI11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
GB23.07.2021
IE23.07.2021
LU23.07.2021
BE31.07.2021
CH31.07.2021
FR31.07.2021
LI31.07.2021
Former [2022/34]AL11.11.2020
AT11.11.2020
CZ11.11.2020
DK11.11.2020
EE11.11.2020
ES11.11.2020
FI11.11.2020
HR11.11.2020
IT11.11.2020
LT11.11.2020
LV11.11.2020
MC11.11.2020
NL11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SI11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
GB23.07.2021
LU23.07.2021
BE31.07.2021
CH31.07.2021
FR31.07.2021
LI31.07.2021
Former [2022/23]AL11.11.2020
AT11.11.2020
CZ11.11.2020
DK11.11.2020
EE11.11.2020
ES11.11.2020
FI11.11.2020
HR11.11.2020
IT11.11.2020
LT11.11.2020
LV11.11.2020
MC11.11.2020
NL11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SI11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
GB23.07.2021
LU23.07.2021
CH31.07.2021
FR31.07.2021
LI31.07.2021
Former [2022/22]AL11.11.2020
AT11.11.2020
CZ11.11.2020
DK11.11.2020
EE11.11.2020
ES11.11.2020
FI11.11.2020
HR11.11.2020
IT11.11.2020
LT11.11.2020
LV11.11.2020
MC11.11.2020
NL11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SI11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
PT11.03.2021
GB23.07.2021
CH31.07.2021
LI31.07.2021
Former [2022/21]AL11.11.2020
AT11.11.2020
CZ11.11.2020
DK11.11.2020
EE11.11.2020
ES11.11.2020
FI11.11.2020
HR11.11.2020
IT11.11.2020
LT11.11.2020
LV11.11.2020
MC11.11.2020
NL11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SI11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
PT11.03.2021
CH31.07.2021
LI31.07.2021
Former [2022/18]AL11.11.2020
AT11.11.2020
CZ11.11.2020
DK11.11.2020
EE11.11.2020
ES11.11.2020
FI11.11.2020
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IT11.11.2020
LT11.11.2020
LV11.11.2020
MC11.11.2020
NL11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SI11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
PT11.03.2021
Former [2022/10]AL11.11.2020
AT11.11.2020
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ES11.11.2020
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IT11.11.2020
LT11.11.2020
LV11.11.2020
NL11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SI11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
PT11.03.2021
Former [2021/51]AL11.11.2020
AT11.11.2020
CZ11.11.2020
DK11.11.2020
EE11.11.2020
ES11.11.2020
FI11.11.2020
HR11.11.2020
IT11.11.2020
LT11.11.2020
LV11.11.2020
NL11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SI11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
Former [2021/49]AL11.11.2020
AT11.11.2020
CZ11.11.2020
DK11.11.2020
EE11.11.2020
FI11.11.2020
HR11.11.2020
IT11.11.2020
LT11.11.2020
LV11.11.2020
NL11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SI11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
Former [2021/48]AL11.11.2020
AT11.11.2020
CZ11.11.2020
DK11.11.2020
EE11.11.2020
FI11.11.2020
HR11.11.2020
IT11.11.2020
LT11.11.2020
LV11.11.2020
NL11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
Former [2021/46]AL11.11.2020
AT11.11.2020
CZ11.11.2020
DK11.11.2020
EE11.11.2020
FI11.11.2020
HR11.11.2020
LT11.11.2020
LV11.11.2020
NL11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
Former [2021/45]AL11.11.2020
AT11.11.2020
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DK11.11.2020
EE11.11.2020
FI11.11.2020
HR11.11.2020
LT11.11.2020
LV11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
Former [2021/37]AT11.11.2020
CZ11.11.2020
DK11.11.2020
EE11.11.2020
FI11.11.2020
HR11.11.2020
LT11.11.2020
LV11.11.2020
PL11.11.2020
RO11.11.2020
SE11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
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CZ11.11.2020
EE11.11.2020
FI11.11.2020
HR11.11.2020
LT11.11.2020
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PL11.11.2020
RO11.11.2020
SE11.11.2020
SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
IS11.03.2021
PT11.03.2021
Former [2021/35]AT11.11.2020
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SK11.11.2020
SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
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SM11.11.2020
BG11.02.2021
NO11.02.2021
GR12.02.2021
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FI11.11.2020
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LT11.11.2020
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BG11.02.2021
NO11.02.2021
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IS11.03.2021
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Cited inInternational search[X]US2009110899  (HRDINA KENNETH EDWARD [US], et al) [X] 1-25 * paragraph [0045] - paragraph [0046] * * example 1 *;
 [XP]JP2009190958  (SHINETSU QUARTZ PROD) [XP] 1-25 * paragraph [0062] - paragraph [0063] *;
 [I]US2007004579  (BOOKBINDER DANA C [US], et al) [I] 1-25 * the whole document *;
 [A]WO2007053733  (CORNING INC [US], et al) [A] 1-25 * paragraph [00121] * * paragraph [00138] - paragraph [00139] * * paragraph [00152] * * examples 2,3 * * example 4 *;
 [I]JPH06166522  (SHINETSU QUARTZ PROD) [I] 1-25 * paragraph [0015] * * figure 1 *;
 [X]JP2002053331  (TOSOH CORP, et al) [X] 23-25 * example 1; table 2 *;
 [X]WO0192176  (CORNING INC [US], et al) [X] 23-25 * page 2, line 28 - page 3, line 2 *;
 [XI]EP1586544  (HERAEUS QUARZGLAS [DE]) [X] 23-25 * paragraph [0001] * * paragraph [0016] * * paragraph [0038] * * paragraph [0050] * * paragraph [0058] - paragraph [0063] * [I] 1-22;
 [X]US2003119652  (KUHN BODO [DE], et al) [X] 22-25 * table 1 * * paragraph [0024] *;
 [X]EP1340722  (HERAEUS QUARZGLAS [DE], et al) [X] 23-25 * example - *
ExaminationWO2006111185
    - SMITH C M ET AL, "Transient absorption in excimer-exposed silica", APPLIED OPTICS, OPTICAL SOCIETY OF AMERICA, WASHINGTON, DC; US, (20001101), vol. 39, no. 31, doi:10.1364/AO.39.005778, ISSN 0003-6935, pages 5778 - 5784, XP002406279

DOI:   http://dx.doi.org/10.1364/AO.39.005778
by applicantUS20090507950
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.