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Extract from the Register of European Patents

EP About this file: EP2437281

EP2437281 - METHOD FOR PREPARING AN SOS SUBSTRATE HAVING LOW SURFACE DEFECT DENSITY [Right-click to bookmark this link]
Former [2012/14]SOS SUBSTRATE HAVING LOW SURFACE DEFECT DENSITY
[2013/43]
StatusNo opposition filed within time limit
Status updated on  24.04.2015
Database last updated on 15.07.2024
Most recent event   Tooltip12.10.2018Lapse of the patent in a contracting state
New state(s): AL		published on 14.11.2018  [2018/46]
Applicant(s)For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Ohtemachi 2-chome Chiyoda-ku
Tokyo 100-0004 / JP
[2012/14]
Inventor(s)01 / AKIYAMA, Shoji
c/o Advanced Functional Materials Research Center
SHIN-ETSU CHEMICAL CO. LTD.
13-1 Isobe 2-chome
Annaka-shi Gunma 379-0195 / JP
02 / ITO, Atsuo
c/o SHIN-ETSU CHEMICAL CO. LTD.
6-1 Otemachi 2-chome
Chiyoda-ku
Tokyo 100-0004 / JP
03 / TOBISAKA, Yuji
c/o Advanced Functional Materials Research Center
SHIN-ETSU CHEMICAL CO. LTD.
13-1 Isobe 2-chome
Annaka-shi Gunma 379-0195 / JP
04 / KAWAI, Makoto
c/o Advanced Functional Materials Research Center
SHIN-ETSU CHEMICAL CO. LTD.
13-1 Isobe 2-chome
Annaka-shi Gunma 379-0195 / JP
 [2012/14]
Representative(s)Martin, Didier Roland Valéry, et al
Cabinet Didier Martin
50, chemin des Verrières
69260 Charbonnières-les-Bains / FR
[N/P]
Former [2012/14]Martin, Didier Roland Valéry, et al
Cabinet Didier Martin 50, chemin des Verrières
69260 Charbonnières-les Bains / FR
Application number, filing date10780542.625.05.2010
WO2010JP58824
Priority number, dateJP2009013096929.05.2009         Original published format: JP 2009130969
[2012/14]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2010137587
Date:02.12.2010
Language:JA
[2010/48]
Type: A1 Application with search report 
No.:EP2437281
Date:04.04.2012
Language:EN
[2012/14]
Type: B1 Patent specification 
No.:EP2437281
Date:18.06.2014
Language:EN
[2014/25]
Search report(s)International search report - published on:JP02.12.2010
(Supplementary) European search report - dispatched on:EP19.12.2012
ClassificationIPC:H01L21/02, H01L21/265, H01L27/12, H01L21/762
[2013/03]
CPC:
H01L21/265 (EP,KR,US); H01L21/26506 (EP,KR,US); H01L21/2658 (EP,US);
H01L21/268 (EP,KR,US); H01L21/76254 (EP,KR,US); H01L21/86 (KR);
H01L27/1203 (KR) (-)
Former IPC [2012/14]H01L21/02, H01L21/265, H01L27/12
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   SM,   TR [2012/14]
Extension statesBANot yet paid
MENot yet paid
RSNot yet paid
TitleGerman:VERFAHREN ZUR HERSTELLUNG EINES SOS-SUBSTRAT MIT GERINGER OBERFLÄCHENDEFEKTDICHTE[2013/43]
English:METHOD FOR PREPARING AN SOS SUBSTRATE HAVING LOW SURFACE DEFECT DENSITY[2013/43]
French:METHODE POUR PREPARER UN SUBSTRAT SILICIUM SUR SAPHIRE (SOS) À FAIBLE DENSITÉ DE DÉFAUTS DE SURFACE[2014/04]
Former [2012/14]SOS-SUBSTRAT MIT GERINGER OBERFLÄCHENDEFEKTDICHTE
Former [2012/14]SOS SUBSTRATE HAVING LOW SURFACE DEFECT DENSITY
Former [2012/14]SUBSTRAT SILICIUM SUR SAPHIR (SOS) À FAIBLE DENSITÉ DE DÉFAUTS DE SURFACE
Entry into regional phase27.12.2011Translation filed 
27.12.2011National basic fee paid 
27.12.2011Search fee paid 
27.12.2011Designation fee(s) paid 
27.12.2011Examination fee paid 
Examination procedure27.12.2011Examination requested  [2012/14]
11.07.2013Amendment by applicant (claims and/or description)
08.01.2014Communication of intention to grant the patent
06.05.2014Fee for grant paid
06.05.2014Fee for publishing/printing paid
06.05.2014Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  08.01.2014
Opposition(s)19.03.2015No opposition filed within time limit [2015/22]
Fees paidRenewal fee
30.04.2012Renewal fee patent year 03
10.05.2013Renewal fee patent year 04
27.03.2014Renewal fee patent year 05
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU25.05.2010
AL18.06.2014
AT18.06.2014
BE18.06.2014
BG18.06.2014
CY18.06.2014
CZ18.06.2014
DK18.06.2014
EE18.06.2014
ES18.06.2014
FI18.06.2014
HR18.06.2014
IT18.06.2014
LT18.06.2014
LV18.06.2014
MC18.06.2014
MK18.06.2014
MT18.06.2014
NL18.06.2014
PL18.06.2014
RO18.06.2014
SE18.06.2014
SI18.06.2014
SK18.06.2014
SM18.06.2014
TR18.06.2014
NO18.09.2014
GR19.09.2014
IS18.10.2014
PT20.10.2014
[2018/46]
Former [2018/30]HU25.05.2010
AT18.06.2014
BE18.06.2014
BG18.06.2014
CY18.06.2014
CZ18.06.2014
DK18.06.2014
EE18.06.2014
ES18.06.2014
FI18.06.2014
HR18.06.2014
IT18.06.2014
LT18.06.2014
LV18.06.2014
MC18.06.2014
MK18.06.2014
MT18.06.2014
NL18.06.2014
PL18.06.2014
RO18.06.2014
SE18.06.2014
SI18.06.2014
SK18.06.2014
SM18.06.2014
TR18.06.2014
NO18.09.2014
GR19.09.2014
IS18.10.2014
PT20.10.2014
Former [2017/38]HU25.05.2010
AT18.06.2014
BE18.06.2014
BG18.06.2014
CY18.06.2014
CZ18.06.2014
DK18.06.2014
EE18.06.2014
ES18.06.2014
FI18.06.2014
HR18.06.2014
IT18.06.2014
LT18.06.2014
LV18.06.2014
MC18.06.2014
MT18.06.2014
NL18.06.2014
PL18.06.2014
RO18.06.2014
SE18.06.2014
SI18.06.2014
SK18.06.2014
SM18.06.2014
TR18.06.2014
NO18.09.2014
GR19.09.2014
IS18.10.2014
PT20.10.2014
Former [2017/03]AT18.06.2014
BE18.06.2014
CY18.06.2014
CZ18.06.2014
DK18.06.2014
EE18.06.2014
ES18.06.2014
FI18.06.2014
HR18.06.2014
IT18.06.2014
LT18.06.2014
LV18.06.2014
MC18.06.2014
MT18.06.2014
NL18.06.2014
PL18.06.2014
RO18.06.2014
SE18.06.2014
SI18.06.2014
SK18.06.2014
NO18.09.2014
GR19.09.2014
IS18.10.2014
PT20.10.2014
Former [2016/06]AT18.06.2014
BE18.06.2014
CY18.06.2014
CZ18.06.2014
DK18.06.2014
EE18.06.2014
ES18.06.2014
FI18.06.2014
HR18.06.2014
IT18.06.2014
LT18.06.2014
LV18.06.2014
MC18.06.2014
NL18.06.2014
PL18.06.2014
RO18.06.2014
SE18.06.2014
SI18.06.2014
SK18.06.2014
NO18.09.2014
GR19.09.2014
IS18.10.2014
PT20.10.2014
Former [2015/36]AT18.06.2014
BE18.06.2014
CY18.06.2014
CZ18.06.2014
DK18.06.2014
EE18.06.2014
ES18.06.2014
FI18.06.2014
HR18.06.2014
IT18.06.2014
LT18.06.2014
LV18.06.2014
NL18.06.2014
PL18.06.2014
RO18.06.2014
SE18.06.2014
SI18.06.2014
SK18.06.2014
NO18.09.2014
GR19.09.2014
IS18.10.2014
PT20.10.2014
Former [2015/30]AT18.06.2014
BE18.06.2014
CY18.06.2014
CZ18.06.2014
DK18.06.2014
EE18.06.2014
ES18.06.2014
FI18.06.2014
HR18.06.2014
IT18.06.2014
LT18.06.2014
LV18.06.2014
NL18.06.2014
PL18.06.2014
RO18.06.2014
SE18.06.2014
SK18.06.2014
NO18.09.2014
GR19.09.2014
IS18.10.2014
PT20.10.2014
Former [2015/22]AT18.06.2014
CY18.06.2014
CZ18.06.2014
DK18.06.2014
EE18.06.2014
ES18.06.2014
FI18.06.2014
HR18.06.2014
IT18.06.2014
LT18.06.2014
LV18.06.2014
NL18.06.2014
PL18.06.2014
RO18.06.2014
SE18.06.2014
SK18.06.2014
NO18.09.2014
GR19.09.2014
IS18.10.2014
PT20.10.2014
Former [2015/12]AT18.06.2014
CY18.06.2014
CZ18.06.2014
EE18.06.2014
ES18.06.2014
FI18.06.2014
HR18.06.2014
LT18.06.2014
LV18.06.2014
NL18.06.2014
PL18.06.2014
RO18.06.2014
SE18.06.2014
SK18.06.2014
NO18.09.2014
GR19.09.2014
IS18.10.2014
PT20.10.2014
Former [2015/11]CY18.06.2014
CZ18.06.2014
EE18.06.2014
ES18.06.2014
FI18.06.2014
HR18.06.2014
LT18.06.2014
LV18.06.2014
PL18.06.2014
RO18.06.2014
SE18.06.2014
SK18.06.2014
NO18.09.2014
GR19.09.2014
PT20.10.2014
Former [2015/10]CY18.06.2014
CZ18.06.2014
EE18.06.2014
ES18.06.2014
FI18.06.2014
HR18.06.2014
LT18.06.2014
LV18.06.2014
SE18.06.2014
SK18.06.2014
NO18.09.2014
GR19.09.2014
Former [2014/50]CY18.06.2014
FI18.06.2014
HR18.06.2014
LT18.06.2014
LV18.06.2014
SE18.06.2014
NO18.09.2014
GR19.09.2014
Former [2014/49]CY18.06.2014
FI18.06.2014
LT18.06.2014
NO18.09.2014
Former [2014/48]CY18.06.2014
LT18.06.2014
Former [2014/47]CY18.06.2014
Documents cited:Search[X]WO2008105101  (SHINETSU CHEMICAL CO [JP], et al) [X] 1-5 * abstract *;
 [XP]EP2128891  (SHINETSU CHEMICAL CO [JP]) [XP] 1-5 * paragraphs [0059] - [0078]; figure 1 *;
 [XI]US7122865  (HOELZL ROBERT [DE], et al) [X] 1 * column 3, lines 31-46; claims 1,2 * [I] 2-5;
 [XAI]EP1986218  (SHINETSU CHEMICAL CO [JP]) [X] 6-11,15-18 * paragraph [0017] - paragraph [0036]; figures 1a-1h * [A] 1-5 [I] 12-14
International search[X]JP2007227415  (SHINETSU CHEMICAL CO);
 [X]JP2005005711  (SILTRONIC AG)
by applicant   - YOSHII ET AL., JAPANESE JOURNAL OF APPLIED PHYSICS, (1982), vol. 21, no. 21-1, pages 175 - 179
    - Science of SOI, REALIZE SCIENCE&ENGINEERING CENTER CO., LTD.
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.