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Extract from the Register of European Patents

EP About this file: EP2468692

EP2468692 - TIO2-CONTAINING SILICIA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  21.06.2013
Database last updated on 26.06.2024
Most recent event   Tooltip21.06.2013Withdrawal of applicationpublished on 24.07.2013  [2013/30]
Applicant(s)For all designated states
Asahi Glass Company, Limited
5-1, Marunouchi 1-chome
Chiyoda-ku
Tokyo 100-8405 / JP
[2012/26]
Inventor(s)01 / KOIKE Akio
c/o Asahi Glass Company
Limited.
12-1, Yurakucho 1-chome
Chiyoda-ku
Tokyo 100-8405 / JP
02 / IWAHASHI Yasutomi
c/o Asahi Glass Company
Limited.
12-1, Yurakucho 1-chome
Chiyoda-ku
Tokyo 100-8405 / JP
03 / KIKUGAWA Shinya
c/o Asahi Glass Company
Limited.
12-1, Yurakucho 1-chome
Chiyoda-ku
Tokyo 100-8405 / JP
 [2012/26]
Representative(s)Müller-Boré & Partner Patentanwälte PartG mbB
Friedenheimer Brücke 21
80639 München / DE
[N/P]
Former [2012/26]Müller-Boré & Partner Patentanwälte
Grafinger Strasse 2
81671 München / DE
Application number, filing date10809950.816.08.2010
WO2010JP63834
Priority number, dateJP2009018989919.08.2009         Original published format: JP 2009189899
[2012/26]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2011021609
Date:24.02.2011
Language:JA
[2011/08]
Type: A1 Application with search report 
No.:EP2468692
Date:27.06.2012
Language:EN
[2012/26]
Search report(s)International search report - published on:JP24.02.2011
ClassificationIPC:C03C3/06, H01L21/027
[2012/26]
CPC:
C03C3/06 (EP,KR,US); C03C15/00 (KR); C03C4/0085 (EP,KR,US);
G03F7/70958 (EP,KR,US); H01L21/0274 (KR); C03C2201/42 (EP,KR,US);
C03C2203/44 (EP,KR,US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   SM,   TR [2012/26]
TitleGerman:TIO2-HALTIGES QUARZGLAS UND OPTISCHES ELEMENT FÜR DIE EUV-LITHOGRAFIE DAMIT[2012/26]
English:TIO2-CONTAINING SILICIA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY[2012/26]
French:VERRE DE SILICE À TENEUR EN TIO2 ET ÉLÉMENT OPTIQUE POUR UNE LITHOGRAPHIE EN EXTRÊME UV[2012/26]
Entry into regional phase17.02.2012Translation filed 
23.02.2012National basic fee paid 
23.02.2012Search fee paid 
23.02.2012Designation fee(s) paid 
23.02.2012Examination fee paid 
Examination procedure23.02.2012Examination requested  [2012/26]
28.06.2012Amendment by applicant (claims and/or description)
13.06.2013Application withdrawn by applicant  [2013/30]
Fees paidRenewal fee
30.08.2012Renewal fee patent year 03
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Cited inInternational search[A]JP2004315351  (ASAHI GLASS CO LTD);
 [Y]JP2005507353  (CORNING INC.);
 [X]JP2008303100  (SHINETSU CHEMICAL CO);
 [XP]JP2010163345  (ASAHI GLASS CO LTD)
by applicantJPS6324937B
 US2002157421
 JP2005104820
 JP2009189899
    - P.C. SCHULTZ; H.T. SMYTH; R.W. DOUGLAS; B. ELLIS, Amorphous Materials, WILLEY, (1972), page 453
    - J. P. WILLIAMS, AMERICAN CERAMIC SOCIETY BULLETIN, (1976), vol. 55, no. 5, page 524
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.