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Extract from the Register of European Patents

EP About this file: EP2504279

EP2504279 - REACTOR AND METHOD FOR PRODUCTION OF SILICON [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  10.12.2021
Database last updated on 03.09.2024
FormerExamination is in progress
Status updated on  19.01.2018
Most recent event   Tooltip10.12.2021Application deemed to be withdrawnpublished on 12.01.2022  [2022/02]
Applicant(s)For all designated states
Dynatec Engineering AS
Rakkestadveien 1
1814 Askim / NO
[2012/40]
Inventor(s)01 / FILTVEDT, Josef
Kråkerudbakken 84
N-1825 Tomter / NO
02 / FILTVEDT, Werner, O.
Furukvisten 2
N-1825 Tomter / NO
03 / HOLT, Arve
Veslefjellet 33
N-2015 Leirsund / NO
 [2012/40]
Representative(s)Protector IP AS
Pilestredet 33
0166 Oslo / NO
[N/P]
Former [2012/40]Protector IP Consultants AS
Oscarsgate 20
0352 Oslo / NO
Application number, filing date10833630.625.11.2010
WO2010NO00431
Priority number, dateNO2009000341125.11.2009         Original published format: NO 20093411
NO2010000021011.02.2010         Original published format: NO 20100210
[2012/40]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2011065839
Date:03.06.2011
Language:EN
[2011/22]
Type: A1 Application with search report 
No.:EP2504279
Date:03.10.2012
Language:EN
The application published by WIPO in one of the EPO official languages on 03.06.2011 takes the place of the publication of the European patent application.
[2012/40]
Search report(s)International search report - published on:XN03.06.2011
(Supplementary) European search report - dispatched on:EP24.06.2016
ClassificationIPC:B01J19/28, B01J19/24, B01J19/02, B01J4/00, C01B33/027, C23C16/24, C30B25/08, C30B29/06, C23C16/44, C23C16/455, C01B33/035
[2016/30]
CPC:
C01B33/035 (EP,KR,US); B01J19/02 (EP,US); B01J19/18 (KR);
B01J19/2405 (EP,US); B01J19/28 (EP,US); B01J4/002 (EP,US);
B01J4/007 (EP,US); C01B33/027 (KR); C23C16/24 (EP,KR,US);
C23C16/4418 (EP,KR,US); C23C16/45502 (EP,KR,US); C23C16/45504 (EP,KR,US);
C30B25/08 (EP,KR,US); C30B29/06 (EP,KR,US); B01J2219/00056 (EP,US);
B01J2219/0009 (EP,US); B01J2219/00141 (EP,US); B01J2219/00144 (EP,US);
B01J2219/00146 (EP,US); B01J2219/00148 (EP,US); B01J2219/00155 (EP,US);
B01J2219/00164 (EP,US); B01J2219/0236 (EP,US); B01J2219/029 (EP,US) (-)
Former IPC [2012/40]C01B33/027
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2012/40]
TitleGerman:REAKTOR UND VERFAHREN ZUR HERSTELLUNG VON SILIKON[2012/40]
English:REACTOR AND METHOD FOR PRODUCTION OF SILICON[2012/40]
French:RÉACTEUR ET PROCÉDÉ POUR LA PRODUCTION DE SILICIUM[2012/40]
Entry into regional phase20.06.2012National basic fee paid 
20.06.2012Search fee paid 
20.06.2012Designation fee(s) paid 
20.06.2012Examination fee paid 
Examination procedure20.06.2012Examination requested  [2012/40]
11.01.2017Amendment by applicant (claims and/or description)
17.01.2018Despatch of a communication from the examining division (Time limit: M04)
15.05.2018Reply to a communication from the examining division
08.04.2021Despatch of a communication from the examining division (Time limit: M04)
19.08.2021Application deemed to be withdrawn, date of legal effect  [2022/02]
08.09.2021Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2022/02]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  17.01.2018
Fees paidRenewal fee
07.11.2012Renewal fee patent year 03
19.11.2013Renewal fee patent year 04
11.11.2014Renewal fee patent year 05
12.11.2015Renewal fee patent year 06
18.11.2016Renewal fee patent year 07
20.11.2017Renewal fee patent year 08
23.11.2018Renewal fee patent year 09
27.11.2019Renewal fee patent year 10
17.11.2020Renewal fee patent year 11
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[X]US5284519  (GADGIL PRASAD N [CA]) [X] 1-10 * claim 1 * * column 4, line 1 - column 5, line 45 * * column 7, lines 46-49 * * figures 1-3,6A, 6B *;
 [X]US5254172  (OTAKI TOSHIO [JP], et al) [X] 1-10 * column 3, line 47 - column 4, line 31 * * column 5, lines 49-63 * * column 6, lines 6-29 * * figures 1,7-10 *;
 [X]US2009238971  (HIGASHI SHINYA [JP], et al) [X] 1-10 * paragraphs [0036] - [0051] * * figure 1 *;
 [XA]US2007154382  (EDWIN EMIL [NO], et al) [X] 1-6,10 * paragraphs [0088] , [0089] , [0099] , [0113] , [0117] * * figures 1-3 * [A] 7-9;
 [XPA]WO2010060630  (SCHMID SILICON TECHNOLOGY GMBH [DE], et al) [XP] 1,4,7 * claims 15-18 * * paragraph bridging pages 9 and 10 * * page 11, second paragraph * * figure 1 * [A] 2,3,5,6,8-10;
 [E]WO2010136529  (DYNATEC ENGINEERING AS [NO], et al) [E] 1-4,7,9 * page 2, line 31 - page 3, line 3 * * page 3, lines 25-32 * * page 6, lines 1-34 * * page 7, lines 9-17 * * figures 1,2 *
International search[A]US3865647  (REUSCHEL KONRAD);
 [X]US4343772  (FROSCH ROBERT A ADMINISTRATOR, et al)
by applicantUS3979490
 US4818495
 US5810934
 US5254172
 US2009238971
 NO20090002111
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.