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EP2375285
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EP About this file: EP2375285
| EP2375285 - Photosensitive composition and pattern-forming method using the photosensitive composition [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 10.06.2016 Database last updated on 03.09.2024 | Most recent event Tooltip | 10.06.2016 | Application deemed to be withdrawn | published on 13.07.2016 [2016/28] | Applicant(s) | For all designated states FUJIFILM Corporation 26-30 Nishiazabu 2-chome Minato-ku Tokyo / JP | [N/P] |
| Former [2011/41] | For all designated states FUJIFILM Corporation 26-30 Nishiazabu 2-chome, Minato-ku Tokyo / JP | Inventor(s) | 01 /
Kodama, Kunihiko c/o FUJIFILM Corporation 4000, Kawashiri, Yoshida-cho Haibara-gun Shizuoka / JP | [2011/41] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastraße 30 81925 München / DE | [N/P] |
| Former [2011/41] | HOFFMANN EITLE Patent- und Rechtsanwälte Arabellastraße 4 81925 München / DE | Application number, filing date | 11171307.9 | 02.02.2005 | [2011/41] | Priority number, date | JP20040029068 | 05.02.2004 Original published format: JP 2004029068 | [2011/41] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP2375285 | Date: | 12.10.2011 | Language: | EN | [2011/41] | Type: | A3 Search report | No.: | EP2375285 | Date: | 15.08.2012 | Language: | EN | [2012/33] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 18.07.2012 | Classification | IPC: | G03F7/004, G03F7/038 | [2011/41] | CPC: |
G03F7/0758 (EP,US);
A01D1/08 (KR);
A01B1/06 (KR);
A01D1/04 (KR);
G03F7/0045 (EP,US);
G03F7/0046 (EP,US);
G03F7/0382 (EP,US);
G03F7/0392 (EP,US);
G03F7/0395 (EP,US);
G03F7/0397 (EP,US);
Y10S430/106 (EP,US);
Y10S430/111 (EP,US);
Y10S430/121 (EP,US);
Y10S430/122 (EP,US);
Y10S430/123 (EP,US);
Y10S430/126 (EP,US)
(-)
| Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR [2011/41] | Title | German: | Lichtempfindliche Zusammensetzung und Strukturierungsverfahren mit der lichtempfindlichen Zusammensetzung | [2011/41] | English: | Photosensitive composition and pattern-forming method using the photosensitive composition | [2011/41] | French: | Composition photosensible et procédé de formation de motifs l'utilisant | [2011/41] | Examination procedure | 13.02.2013 | Examination requested [2013/13] | 14.02.2013 | Amendment by applicant (claims and/or description) | 04.06.2013 | Despatch of a communication from the examining division (Time limit: M06) | 25.11.2013 | Reply to a communication from the examining division | 08.09.2015 | Communication of intention to grant the patent | 19.01.2016 | Application deemed to be withdrawn, date of legal effect [2016/28] | 22.02.2016 | Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time [2016/28] | Parent application(s) Tooltip | EP05002140.1 / EP1566692 | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued (EP20050002140) is 15.02.2011 | Fees paid | Renewal fee | 24.06.2011 | Renewal fee patent year 03 | 24.06.2011 | Renewal fee patent year 04 | 24.06.2011 | Renewal fee patent year 05 | 24.06.2011 | Renewal fee patent year 06 | 24.06.2011 | Renewal fee patent year 07 | 27.02.2012 | Renewal fee patent year 08 | 20.02.2013 | Renewal fee patent year 09 | 18.02.2014 | Renewal fee patent year 10 | 11.02.2015 | Renewal fee patent year 11 | Penalty fee | Additional fee for renewal fee | 29.02.2016 | 12 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]EP0726500 (JAPAN SYNTHETIC RUBBER CO LTD [JP]) [A] 1-16 * page 5, line 1 - line 28 *; | [AD]US5554664 (LAMANNA WILLIAM M [US], et al) [AD] 1-16 * claims 6,8 *; | [A]US2003008241 (SATO KENICHIRO [JP], et al) [A] 1-16 * page 73, compound Ia-8 * * page 74, compound Ia-14 * * page 75, compounds IIb-5 and IIb-9 * * page 97, table I-3, example I-9 * * page 98, table I-4, example I-37 *; | [A]US2003108809 (SATO KENICHIRO [JP]) [A] 1-16 * page 40, paragraph 177 *; | [Y]US2003129527 (KUDO TAKANORI [US], et al) [Y] 1-16 * page 2, paragraph 16 * * claims 1,8 *; | [AD]US2003148211 (KAMABUCHI AKIRA [JP], et al) [AD] 1-16* page 7 - page 8 *; | [Y]WO03107093 (CLARIANT INT LTD [CH]) [Y] 1-16 * page 1, line 16 * * page 2, lines 16-24 * * page 20, lines 10-15 *; | [A] - G.M. WALLRAFF ET AL., "Characterization and acid diffusion measurements of new strong acid photoacid generators", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, USA, (200203), vol. 4690, no. 1, pages 160 - 168, XP002332410 [A] 1-16 * page 162, paragraph 2.2 * * page 163; figure 3 * DOI: http://dx.doi.org/10.1117/12.474215 | by applicant | US3779778 | US3849137 | JPS55164824 | EP0126712 | JPS61226746 | JPS61226745 | JPS6236663 | JPS6269263 | EP0219294 | JPS62153853 | JPS62170950 | EP0254853 | JPS6326653 | JPS6334540 | JPS63146038 | JPS63146029 | JPS63163452 | JPH0225850 | JPH0228531 | US4916210 | DE3914407 | JPH03223860 | JPH04122938 | JPH04251259 | US5294511 | US5296330 | US5360692 | US5405720 | US5436098 | JPH07230165 | JPH0862834 | US5529881 | US5554664 | US5576143 | JPH095988 | JPH0954432 | US5824451 | JP2002090991 | JP2002268223 | JP2002277862 | JP2002341539 | US2003148211 | JP2003261529 | - PROCESSING OFSPDE, (1996), vol. 2724, page 355 |