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Extract from the Register of European Patents

EP About this file: EP2612348

EP2612348 - METHOD OF MANUFACTURING P-DOPED SILICON LAYERS [Right-click to bookmark this link]
Former [2013/28]P-DOPED SILICON LAYERS
[2017/26]
StatusNo opposition filed within time limit
Status updated on  05.10.2018
Database last updated on 26.07.2024
FormerThe patent has been granted
Status updated on  27.10.2017
FormerGrant of patent is intended
Status updated on  19.06.2017
Most recent event   Tooltip10.07.2020Lapse of the patent in a contracting state
New state(s): AL, IS		published on 12.08.2020  [2020/33]
Applicant(s)For all designated states
Evonik Degussa GmbH
Rellinghauser Straße 1-11
45128 Essen / DE
[2017/48]
Former [2013/28]For all designated states
Evonik Degussa GmbH
Rellinghauser Straße 1- 11
45128 Essen / DE
Inventor(s)01 / WIEBER, Stephan
Marie-Juchacz-Strasse 7
76137 Karlsruhe / DE
02 / PATZ, Matthias
Lindhorststrasse 34
46240 Bottrop / DE
03 / STÜGER, Harald
Eichenweg 23/7
A-8042 Graz / AT
04 / LEHMKUHL, Jasmin
Johannesstraße 51
45721 Haltern am See / DE
 [2013/28]
Application number, filing date11757199.219.08.2011
[2017/48]
WO2011EP64279
Priority number, dateDE2010104023103.09.2010         Original published format: DE102010040231
[2013/28]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report
No.:WO2012028476
Date:08.03.2012
Language:DE
[2012/10]
Type: A1 Application with search report 
No.:EP2612348
Date:10.07.2013
Language:DE
The application published by WIPO in one of the EPO official languages on 08.03.2012 takes the place of the publication of the European patent application.
[2013/28]
Type: B1 Patent specification 
No.:EP2612348
Date:29.11.2017
Language:DE
[2017/48]
Search report(s)International search report - published on:EP08.03.2012
ClassificationIPC:H01L21/228, H01L21/02, C07F9/50, H01L31/18, C23C18/12
[2013/28]
CPC:
H01L21/02381 (EP,US); H01L21/228 (EP,KR,US); C23C18/12 (KR);
C23C18/1204 (EP,US); C23C18/122 (EP,US); C23C18/1225 (EP,US);
C23C18/143 (EP,US); H01L21/0237 (EP,US); H01L21/02532 (EP,US);
H01L21/02579 (EP,US); H01L21/0262 (EP,US); H01L21/02628 (EP,US);
H01L29/16 (EP,US); H01L31/068 (EP,US); H01L31/18 (KR);
H01L31/1804 (EP,US); Y02E10/547 (EP,US); Y02P70/50 (EP,US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2013/28]
Extension statesBANot yet paid
MENot yet paid
TitleGerman:VERFAHREN ZUR HERSTELLUNG P-DOTIERTER SILICIUMSCHICHTEN[2017/26]
English:METHOD OF MANUFACTURING P-DOPED SILICON LAYERS[2017/26]
French:PROCÉDÉ DE FABRICATION DES COUCHES DE SILICIUM DOPÉES DE TYPE P[2017/26]
Former [2013/28]P-DOTIERTE SILICIUMSCHICHTEN
Former [2013/28]P-DOPED SILICON LAYERS
Former [2013/28]COUCHES DE SILICIUM DOPÉES P
Entry into regional phase26.02.2013National basic fee paid 
26.02.2013Designation fee(s) paid 
26.02.2013Examination fee paid 
Examination procedure26.02.2013Examination requested  [2013/28]
10.10.2013Amendment by applicant (claims and/or description)
04.11.2014Despatch of a communication from the examining division (Time limit: M04)
17.12.2014Reply to a communication from the examining division
29.05.2015Despatch of a communication from the examining division (Time limit: M04)
17.09.2015Reply to a communication from the examining division
18.04.2016Despatch of a communication from the examining division (Time limit: M04)
16.08.2016Reply to a communication from the examining division
20.06.2017Communication of intention to grant the patent
19.10.2017Fee for grant paid
19.10.2017Fee for publishing/printing paid
19.10.2017Receipt of the translation of the claim(s)
Divisional application(s)EP15185644.0  / EP2991102
The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  04.11.2014
Opposition(s)30.08.2018No opposition filed within time limit [2018/45]
Fees paidRenewal fee
23.08.2013Renewal fee patent year 03
25.08.2014Renewal fee patent year 04
20.08.2015Renewal fee patent year 05
22.08.2016Renewal fee patent year 06
22.08.2017Renewal fee patent year 07
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU19.08.2011
AL29.11.2017
CY29.11.2017
CZ29.11.2017
DK29.11.2017
EE29.11.2017
FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
MC29.11.2017
MK29.11.2017
MT29.11.2017
PL29.11.2017
PT29.11.2017
RO29.11.2017
RS29.11.2017
SE29.11.2017
SI29.11.2017
SK29.11.2017
SM29.11.2017
TR29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
IS29.03.2018
AT19.08.2018
IE19.08.2018
LU19.08.2018
[2020/33]
Former [2020/31]HU19.08.2011
CY29.11.2017
CZ29.11.2017
DK29.11.2017
EE29.11.2017
FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
MC29.11.2017
MK29.11.2017
MT29.11.2017
PL29.11.2017
PT29.11.2017
RO29.11.2017
RS29.11.2017
SE29.11.2017
SI29.11.2017
SK29.11.2017
SM29.11.2017
TR29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
AT19.08.2018
IE19.08.2018
LU19.08.2018
Former [2020/27]HU19.08.2011
CY29.11.2017
CZ29.11.2017
DK29.11.2017
EE29.11.2017
FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
MC29.11.2017
MT29.11.2017
PL29.11.2017
PT29.11.2017
RO29.11.2017
RS29.11.2017
SE29.11.2017
SI29.11.2017
SK29.11.2017
SM29.11.2017
TR29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
AT19.08.2018
IE19.08.2018
LU19.08.2018
Former [2020/16]CY29.11.2017
CZ29.11.2017
DK29.11.2017
EE29.11.2017
FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
MC29.11.2017
MT29.11.2017
PL29.11.2017
RO29.11.2017
RS29.11.2017
SE29.11.2017
SI29.11.2017
SK29.11.2017
SM29.11.2017
TR29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
AT19.08.2018
IE19.08.2018
LU19.08.2018
Former [2020/03]CY29.11.2017
CZ29.11.2017
DK29.11.2017
EE29.11.2017
FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
MC29.11.2017
MT29.11.2017
PL29.11.2017
RO29.11.2017
RS29.11.2017
SE29.11.2017
SI29.11.2017
SK29.11.2017
SM29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
AT19.08.2018
IE19.08.2018
LU19.08.2018
Former [2019/33]CY29.11.2017
CZ29.11.2017
DK29.11.2017
EE29.11.2017
FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
MC29.11.2017
MT29.11.2017
PL29.11.2017
RO29.11.2017
RS29.11.2017
SE29.11.2017
SI29.11.2017
SK29.11.2017
SM29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
IE19.08.2018
LU19.08.2018
Former [2019/21]CY29.11.2017
CZ29.11.2017
DK29.11.2017
EE29.11.2017
FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
MC29.11.2017
MT29.11.2017
PL29.11.2017
RO29.11.2017
RS29.11.2017
SE29.11.2017
SI29.11.2017
SK29.11.2017
SM29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
LU19.08.2018
Former [2019/15]CY29.11.2017
CZ29.11.2017
DK29.11.2017
EE29.11.2017
FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
MC29.11.2017
MT29.11.2017
PL29.11.2017
RO29.11.2017
RS29.11.2017
SE29.11.2017
SI29.11.2017
SK29.11.2017
SM29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
Former [2018/52]CY29.11.2017
CZ29.11.2017
DK29.11.2017
EE29.11.2017
FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
MT29.11.2017
PL29.11.2017
RO29.11.2017
RS29.11.2017
SE29.11.2017
SI29.11.2017
SK29.11.2017
SM29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
Former [2018/43]CY29.11.2017
CZ29.11.2017
DK29.11.2017
EE29.11.2017
FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
MT29.11.2017
PL29.11.2017
RO29.11.2017
RS29.11.2017
SE29.11.2017
SK29.11.2017
SM29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
Former [2018/40]CY29.11.2017
CZ29.11.2017
DK29.11.2017
EE29.11.2017
FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
PL29.11.2017
RO29.11.2017
RS29.11.2017
SE29.11.2017
SK29.11.2017
SM29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
Former [2018/37]CY29.11.2017
CZ29.11.2017
DK29.11.2017
EE29.11.2017
FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
PL29.11.2017
RS29.11.2017
SE29.11.2017
SK29.11.2017
SM29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
Former [2018/35]CY29.11.2017
CZ29.11.2017
DK29.11.2017
EE29.11.2017
FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
RS29.11.2017
SE29.11.2017
SK29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
Former [2018/24]FI29.11.2017
HR29.11.2017
LT29.11.2017
LV29.11.2017
RS29.11.2017
SE29.11.2017
BG28.02.2018
NO28.02.2018
GR01.03.2018
Former [2018/22]FI29.11.2017
LT29.11.2017
NO28.02.2018
Cited inInternational search[XI]US7674926  (GUO WENZHUO [US], et al) [X] 1-3,5,6,10,11,14 * abstract * * column 1 - column 2 * * column 3, line 23 - line 25 * * column 9, line 17 - column 10, line 50 * [I] 4,7-9,12,13;
 [XI]EP1284306  (JSR CORP [JP]) [X] 1-3,5-14 * abstract * * paragraph [0001] * * paragraph [0014] - paragraph [0015] * * paragraph [0051] - paragraph [0057] * * paragraph [0101] - paragraph [0103] * [I] 4;
 [A]US2008160265  (HIESLMAIR HENRY [US], et al) [A] 1-14 * abstract *;
 [A]EP0130311  (ALLIED CORP [US]) [A] 1-14 * abstract * * page 8 *;
 [A]US7314513  (ZUERCHER FABIO [US], et al) [A] 1-14 * column 17 - column 18 *
by applicantUS5866471
 EP1085579
 EP1357154
 EP1640342
 US2008022897
 JP2002100576
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.