EP2469337 - Positive photosensitive resin composition, method for forming pattern, and electronic component [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 28.11.2014 Database last updated on 26.07.2024 | Most recent event Tooltip | 28.11.2014 | No opposition filed within time limit | published on 31.12.2014 [2015/01] | Applicant(s) | For all designated states Hitachi Chemical DuPont MicroSystems Ltd. 4-1, Koishikawa 1-chome Bunkyo-ku Tokyo 112-0002 / JP | [2012/26] | Inventor(s) | 01 /
Hattori, Takashi c/o Hitachi Chemical Co., Ltd., Res. & Dev. Ctr. 13-1, Higashi-cho 4-chome Hitachi-shi Ibaraki, 317-8555 / JP | 02 /
Murakami, Yasuharu c/o Hitachi Chemical Co., Ltd., Res. & Dev. Ctr. 13-1, Higashi-cho 4-chome Hitachi-shi Ibaraki, 317-8555 / JP | 03 /
Matsutani, Hiroshi c/o Hitachi Chemical Co., Ltd., Res. & Dev. Ctr. 13-1, Higashi-cho 4-chome Hitachi-shi Ibaraki, 317-8555 / JP | 04 /
Ooe, Masayuki c/o Hitachi Chemical DuPont Microsyst. Ltd., Res. & Dev. Ctr. 13-1, Higashi-cho 4-chome Hitachi-shi Ibaraki, 317-8555 / JP | 05 /
Nakano, Hajime c/o Hitachi Chemical DuPont Microsyst. Ltd. Yamazaki R&D Ctr. 13-1, Higashi-cho 4-chome Hitachi-shi Ibaraki, 317-8555 / JP | [2012/26] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastraße 30 81925 München / DE | [N/P] |
Former [2014/04] | HOFFMANN EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | ||
Former [2012/26] | HOFFMANN EITLE Patent- und Rechtsanwälte Arabellastraße 4 81925 München / DE | Application number, filing date | 12160970.5 | 11.03.2005 | [2012/26] | Priority number, date | JP20040139149 | 07.05.2004 Original published format: JP 2004139149 | JP20040185613 | 23.06.2004 Original published format: JP 2004185613 | JP20040229285 | 05.08.2004 Original published format: JP 2004229285 | [2012/26] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP2469337 | Date: | 27.06.2012 | Language: | EN | [2012/26] | Type: | B1 Patent specification | No.: | EP2469337 | Date: | 22.01.2014 | Language: | EN | [2014/04] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 16.05.2012 | Classification | IPC: | G03F7/023, G03F7/004, H01L21/027, H01L21/311 | [2012/26] | CPC: |
G03F7/0233 (EP,KR,US);
G03F7/0387 (EP,KR,US);
G03F7/0392 (KR);
H01L21/31144 (EP,KR,US)
| Designated contracting states | DE, FR, GB [2012/26] | Title | German: | Positive lichtempfindliche Harzzusammensetzung, Verfahren zum Bilden eines Musters und elektronische Komponente | [2013/31] | English: | Positive photosensitive resin composition, method for forming pattern, and electronic component | [2012/26] | French: | Composition de résine photosensible positive, procédé de formation de motif et composant électronique | [2012/26] |
Former [2012/26] | Positive lichtempfindliche Harzzusammensetzung, Verfahren zum Bilden eines Musters und elektronisches Komponent | Examination procedure | 23.03.2012 | Examination requested [2012/26] | 21.12.2012 | Amendment by applicant (claims and/or description) | 16.08.2013 | Communication of intention to grant the patent | 09.12.2013 | Fee for grant paid | 09.12.2013 | Fee for publishing/printing paid | Parent application(s) Tooltip | EP05720621.1 / EP1744213 | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued (EP20050720621) is 23.11.2011 | Opposition(s) | 23.10.2014 | No opposition filed within time limit [2015/01] | Fees paid | Renewal fee | 23.03.2012 | Renewal fee patent year 03 | 23.03.2012 | Renewal fee patent year 04 | 23.03.2012 | Renewal fee patent year 05 | 23.03.2012 | Renewal fee patent year 06 | 23.03.2012 | Renewal fee patent year 07 | 23.03.2012 | Renewal fee patent year 08 | 20.03.2013 | Renewal fee patent year 09 |
Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | JP2002169283 [ ]; | [Y]EP0807852 (SUMITOMO BAKELITE CO [JP]) [Y] 2,7,11 * formula (2); page 3, lines 7-11; claim 1 * * page 4, lines 1-32 *; | [Y]US5738915 (FATHI ZAKARYAE [US], et al) [Y] 14 * the whole document *; | [Y]US5847218 (OHSAWA YOUICHI [JP], et al) [Y] 1* the whole document *; | [XY]EP0961169 (HITACHI CHEM DUPONT MICROSYS [JP]) [X] 1,3-6,10,12,13,15,16 * paragraphs [0001] , [0010] - [0013] - [0017] , [0026] , [0033] - [0035] - [0072] - [0077] - [0082] , [0088] - [0101] * * examples 1-7 * * figure 1; claims 1-3,5,8-11,13 * [Y] 1,2,7-9,11,14,17; | [Y]JP2002169283 (HITACHI CHEM DUPONT MICROSYS) [Y] 7-9,11 * Formula (II);; claims 1-11 *; | [Y]US6480411 (KOGANEI AKIO [JP]) [Y] 17 * paragraph [0006] * * paragraph [0111] - paragraph [0134] * | [ ] - DATABASE WPI, 0, Derwent World Patents Index, vol. 2002, no. 65, Database accession no. 2002-602932, & JP2002169283 A 20020614 (HITACHI KASEI DUPONT MICROSYSTEMS KK) [ ] * abstract * | by applicant | JPS4911541 | JPS5040922 | JPS5213315 | JPS54145794 | JPS5638038 | US4395482 | JPS59108031 | JPS59219330 | JPS59220730 | JPS59232122 | JPS59231533 | JPS606729 | JPS6072925 | JPS6157620 | JPH0160630B | JPH03763 | JPH0331434B | JPH0431861 | JPH0446345 | JPH05197153 | JPH07219228 | JPH08146862 | JP2587148B | JPH09183846 | US5738915 | JPH10186664 | JPH10307393 | JPH11202489 | JP2000056559 | US6143467 | JP2001183835 | JP2001194791 | JP2002526793 | - J. MACROMOL. SCI. CHEM., (1987), vol. A24, no. 10, page 1407 | - MACROMOLECULES, (1990), page 23 |