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Extract from the Register of European Patents

EP About this file: EP2469337

EP2469337 - Positive photosensitive resin composition, method for forming pattern, and electronic component [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  28.11.2014
Database last updated on 26.07.2024
Most recent event   Tooltip28.11.2014No opposition filed within time limitpublished on 31.12.2014  [2015/01]
Applicant(s)For all designated states
Hitachi Chemical DuPont MicroSystems Ltd.
4-1, Koishikawa 1-chome Bunkyo-ku Tokyo
112-0002 / JP
[2012/26]
Inventor(s)01 / Hattori, Takashi
c/o Hitachi Chemical Co., Ltd., Res. & Dev. Ctr.
13-1, Higashi-cho 4-chome
Hitachi-shi
Ibaraki, 317-8555 / JP
02 / Murakami, Yasuharu
c/o Hitachi Chemical Co., Ltd., Res. & Dev. Ctr.
13-1, Higashi-cho 4-chome
Hitachi-shi
Ibaraki, 317-8555 / JP
03 / Matsutani, Hiroshi
c/o Hitachi Chemical Co., Ltd., Res. & Dev. Ctr.
13-1, Higashi-cho 4-chome
Hitachi-shi
Ibaraki, 317-8555 / JP
04 / Ooe, Masayuki
c/o Hitachi Chemical DuPont Microsyst. Ltd., Res.
& Dev. Ctr.
13-1, Higashi-cho 4-chome
Hitachi-shi
Ibaraki, 317-8555 / JP
05 / Nakano, Hajime
c/o Hitachi Chemical DuPont Microsyst. Ltd.
Yamazaki R&D Ctr.
13-1, Higashi-cho 4-chome
Hitachi-shi
Ibaraki, 317-8555 / JP
 [2012/26]
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[N/P]
Former [2014/04]HOFFMANN EITLE
Patent- und Rechtsanwälte
Arabellastrasse 4
81925 München / DE
Former [2012/26]HOFFMANN EITLE
Patent- und Rechtsanwälte
Arabellastraße 4
81925 München / DE
Application number, filing date12160970.511.03.2005
[2012/26]
Priority number, dateJP2004013914907.05.2004         Original published format: JP 2004139149
JP2004018561323.06.2004         Original published format: JP 2004185613
JP2004022928505.08.2004         Original published format: JP 2004229285
[2012/26]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP2469337
Date:27.06.2012
Language:EN
[2012/26]
Type: B1 Patent specification 
No.:EP2469337
Date:22.01.2014
Language:EN
[2014/04]
Search report(s)(Supplementary) European search report - dispatched on:EP16.05.2012
ClassificationIPC:G03F7/023, G03F7/004, H01L21/027, H01L21/311
[2012/26]
CPC:
G03F7/0233 (EP,KR,US); G03F7/0387 (EP,KR,US); G03F7/0392 (KR);
H01L21/31144 (EP,KR,US)
Designated contracting statesDE,   FR,   GB [2012/26]
TitleGerman:Positive lichtempfindliche Harzzusammensetzung, Verfahren zum Bilden eines Musters und elektronische Komponente[2013/31]
English:Positive photosensitive resin composition, method for forming pattern, and electronic component[2012/26]
French:Composition de résine photosensible positive, procédé de formation de motif et composant électronique[2012/26]
Former [2012/26]Positive lichtempfindliche Harzzusammensetzung, Verfahren zum Bilden eines Musters und elektronisches Komponent
Examination procedure23.03.2012Examination requested  [2012/26]
21.12.2012Amendment by applicant (claims and/or description)
16.08.2013Communication of intention to grant the patent
09.12.2013Fee for grant paid
09.12.2013Fee for publishing/printing paid
Parent application(s)   TooltipEP05720621.1  / EP1744213
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued (EP20050720621) is  23.11.2011
Opposition(s)23.10.2014No opposition filed within time limit [2015/01]
Fees paidRenewal fee
23.03.2012Renewal fee patent year 03
23.03.2012Renewal fee patent year 04
23.03.2012Renewal fee patent year 05
23.03.2012Renewal fee patent year 06
23.03.2012Renewal fee patent year 07
23.03.2012Renewal fee patent year 08
20.03.2013Renewal fee patent year 09
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:SearchJP2002169283  [ ];
 [Y]EP0807852  (SUMITOMO BAKELITE CO [JP]) [Y] 2,7,11 * formula (2); page 3, lines 7-11; claim 1 * * page 4, lines 1-32 *;
 [Y]US5738915  (FATHI ZAKARYAE [US], et al) [Y] 14 * the whole document *;
 [Y]US5847218  (OHSAWA YOUICHI [JP], et al) [Y] 1* the whole document *;
 [XY]EP0961169  (HITACHI CHEM DUPONT MICROSYS [JP]) [X] 1,3-6,10,12,13,15,16 * paragraphs [0001] , [0010] - [0013] - [0017] , [0026] , [0033] - [0035] - [0072] - [0077] - [0082] , [0088] - [0101] * * examples 1-7 * * figure 1; claims 1-3,5,8-11,13 * [Y] 1,2,7-9,11,14,17;
 [Y]JP2002169283  (HITACHI CHEM DUPONT MICROSYS) [Y] 7-9,11 * Formula (II);; claims 1-11 *;
 [Y]US6480411  (KOGANEI AKIO [JP]) [Y] 17 * paragraph [0006] * * paragraph [0111] - paragraph [0134] *
    [ ] - DATABASE WPI, 0, Derwent World Patents Index, vol. 2002, no. 65, Database accession no. 2002-602932, & JP2002169283 A 20020614 (HITACHI KASEI DUPONT MICROSYSTEMS KK) [ ] * abstract *
by applicantJPS4911541
 JPS5040922
 JPS5213315
 JPS54145794
 JPS5638038
 US4395482
 JPS59108031
 JPS59219330
 JPS59220730
 JPS59232122
 JPS59231533
 JPS606729
 JPS6072925
 JPS6157620
 JPH0160630B
 JPH03763
 JPH0331434B
 JPH0431861
 JPH0446345
 JPH05197153
 JPH07219228
 JPH08146862
 JP2587148B
 JPH09183846
 US5738915
 JPH10186664
 JPH10307393
 JPH11202489
 JP2000056559
 US6143467
 JP2001183835
 JP2001194791
 JP2002526793
    - J. MACROMOL. SCI. CHEM., (1987), vol. A24, no. 10, page 1407
    - MACROMOLECULES, (1990), page 23
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.