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EP2586806
European procedure
Extract from the Register of European Patents
EP About this file: EP2586806
| EP2586806 - Modified novolak phenolic resin, making method, and resist composition [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 05.03.2021 Database last updated on 17.08.2024 | |
| Former | The patent has been granted Status updated on 27.03.2020 | ||
| Former | Grant of patent is intended Status updated on 11.12.2019 | ||
| Former | Examination is in progress Status updated on 14.05.2019 | Most recent event Tooltip | 05.03.2021 | No opposition filed within time limit | published on 07.04.2021 [2021/14] | Applicant(s) | For all designated states Shin-Etsu Chemical Co., Ltd. 6-1, Otemachi 2-chome Chiyoda-ku Tokyo / JP | [2013/18] | Inventor(s) | 01 /
Hirano, Yoshinori Shin-Etsu Chemical Co., Ltd., Silicone-Electronics Materials Research Center 1-10, Hitomi, Matsuida-machi Annaka-shi Gunma-ken / JP | 02 /
Yanagisawa, Hideyoshi Shin-Etsu Chemical Co., Ltd., Silicone-Electronics Materials Research Center 1-10, Hitomi, Matsuida-machi Annaka-shi Gunma-ken / JP | [2013/18] | Representative(s) | Mewburn Ellis LLP Aurora Building Counterslip Bristol BS1 6BX / GB | [2020/18] |
| Former [2013/18] | Stuart, Ian Alexander Mewburn Ellis LLP 33 Gutter Lane London EC2V 8AS / GB | Application number, filing date | 12189273.1 | 19.10.2012 | [2013/18] | Priority number, date | JP20110233901 | 25.10.2011 Original published format: JP 2011233901 | JP20120176987 | 09.08.2012 Original published format: JP 2012176987 | [2013/18] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP2586806 | Date: | 01.05.2013 | Language: | EN | [2013/18] | Type: | A3 Search report | No.: | EP2586806 | Date: | 18.09.2013 | Language: | EN | [2013/38] | Type: | B1 Patent specification | No.: | EP2586806 | Date: | 29.04.2020 | Language: | EN | [2020/18] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 19.08.2013 | Classification | IPC: | C08G8/00, C08L61/00, C08L61/04, C08L61/20, G03F7/00, H01B3/00, H05B33/00, H05K1/00 | [2013/38] | CPC: |
C08G8/00 (EP,KR,US);
C08G8/28 (KR,US);
C08G14/10 (US);
C08G14/12 (KR);
C08L61/00 (EP,KR);
C08L61/04 (EP,KR);
C08L61/20 (EP,KR);
G03F7/0045 (KR);
G03F7/0226 (US);
G03F7/023 (EP,KR,US);
G03F7/0236 (EP,KR,US);
G03F7/038 (US);
G03F7/0382 (US)
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| Former IPC [2013/18] | C08G8/00 | Designated contracting states | DE, FR, GB [2020/17] |
| Former [2013/18] | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR | Title | German: | Modifiziertes Novolak-Phenolharz, Herstellungsverfahren und Resistzusammensetzung | [2013/18] | English: | Modified novolak phenolic resin, making method, and resist composition | [2013/18] | French: | Résine phénolique novolaque modifiée, son procédé de fabrication et composition de réserve | [2013/18] | Examination procedure | 14.03.2014 | Amendment by applicant (claims and/or description) | 14.03.2014 | Examination requested [2014/17] | 23.04.2014 | Despatch of a communication from the examining division (Time limit: M04) | 15.08.2014 | Reply to a communication from the examining division | 17.05.2019 | Despatch of a communication from the examining division (Time limit: M04) | 13.09.2019 | Reply to a communication from the examining division | 12.12.2019 | Communication of intention to grant the patent | 17.03.2020 | Fee for grant paid | 17.03.2020 | Fee for publishing/printing paid | 17.03.2020 | Receipt of the translation of the claim(s) | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 23.04.2014 | Opposition(s) | 01.02.2021 | No opposition filed within time limit [2021/14] | Fees paid | Renewal fee | 14.10.2014 | Renewal fee patent year 03 | 12.10.2015 | Renewal fee patent year 04 | 11.10.2016 | Renewal fee patent year 05 | 11.10.2017 | Renewal fee patent year 06 | 11.10.2018 | Renewal fee patent year 07 | 15.10.2019 | Renewal fee patent year 08 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]US5876895 (HISHIRO YOSHIKI [JP], et al) [X] 1-14* column 1, line 10 - column 11, line 25; example -; claims 1-5 *; | [X]WO9942507 (OLIN MICROELECTRONIC CHEM INC [US]) [X] 1-14 * page 1, line 5 - page 16, line 31; example -; claims 1-20 *; | [X]JP2001249449 (SUMITOMO DUREZ CO) [X] 1-14 * the whole document *; | [X]JP2004014297 (JSR CORP) [X] 1-14 * the whole document *; | [X]US2004094752 (ITO NOBUYUKI [JP], et al) [X] 1-14 * paragraph [0001] - paragraph [0379]; example -; claims 1-26 *; | [X]US2004126696 (INOMATA KATSUMI [JP], et al) [X] 1-14 * paragraph [0001] - paragraph [0123]; example -; claims 1-6 *; | [X]JP2006201653 (NIPPON ZEON CO) [X] 1-14 * the whole document *; | [X]EP1755365 (JSR CORP [JP]) [X] 1-14 * paragraph [0001] - paragraph [0096]; example -; claims 1-8 *; | [X]JP2010085567 (SUMITOMO BAKELITE CO) [X] 1-14 * the whole document *; | [XP]EP2395395 (SHINETSU CHEMICAL CO [JP]) [XP] 1-14 * paragraph [0001] - paragraph [0058]; example -; claims 1-12 * | by applicant | JPH03243613 | JP2000309617 | JP2004292791 | JP2005306987 |