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Extract from the Register of European Patents

EP About this file: EP2763157

EP2763157 - MASK BLANK FOR REFLECTION-TYPE EXPOSURE, AND MASK FOR REFLECTION-TYPE EXPOSURE [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  14.05.2021
Database last updated on 07.06.2024
FormerThe patent has been granted
Status updated on  05.06.2020
FormerGrant of patent is intended
Status updated on  28.01.2020
FormerExamination is in progress
Status updated on  11.06.2019
Most recent event   Tooltip08.07.2022Lapse of the patent in a contracting state
New state(s): MK		published on 10.08.2022  [2022/32]
Applicant(s)For all designated states
Toppan Printing Co., Ltd.
1-5-1 Taito Taito-ku Tokyo
1100016 / JP
[2014/32]
Inventor(s)01 / KODERA, Yutaka
c/o TOPPAN PRINTING CO. LTD.
1-5-1, Taito
Taito-ku
Tokyo 110-0016 / JP
02 / SAKATA, Yo
c/o TOPPAN PRINTING CO. LTD.
1-5-1, Taito
Taito-ku
Tokyo 110-0016 / JP
03 / KON, Masato
c/o TOPPAN PRINTING CO. LTD.
1-5-1, Taito
Taito-ku
Tokyo 110-0016 / JP
 [2014/32]
Representative(s)TBK
Bavariaring 4-6
80336 München / DE
[2014/32]
Application number, filing date12835040.224.09.2012
[2020/28]
WO2012JP06054
Priority number, dateJP2011021263528.09.2011         Original published format: JP 2011212635
JP2011023355325.10.2011         Original published format: JP 2011233553
[2014/32]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2013046627
Date:04.04.2013
Language:JA
[2013/14]
Type: A1 Application with search report 
No.:EP2763157
Date:06.08.2014
Language:EN
[2014/32]
Type: B1 Patent specification 
No.:EP2763157
Date:08.07.2020
Language:EN
[2020/28]
Search report(s)International search report - published on:JP04.04.2013
(Supplementary) European search report - dispatched on:EP02.10.2015
ClassificationIPC:G03F1/24, G03F1/38, G03F1/40, G03F1/60
[2019/52]
CPC:
G03F1/24 (EP,CN,US); H01L21/0273 (KR); G03F1/38 (EP,US);
G03F1/40 (EP,CN,US); G03F1/60 (EP,CN,US)
Former IPC [2015/45]H01L21/027, G03F1/24, G03F1/54, G03F1/60, G03F7/20, G03F1/40
Former IPC [2014/32]H01L21/027, G03F1/24, G03F1/54, G03F1/60, G03F7/20
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2014/32]
Extension statesBANot yet paid
MENot yet paid
TitleGerman:MASKENROHLING FÜR REFLEXIONSBELICHTUNG UND MASKE FÜR REFLEXIONSBELICHTUNG[2014/32]
English:MASK BLANK FOR REFLECTION-TYPE EXPOSURE, AND MASK FOR REFLECTION-TYPE EXPOSURE[2014/32]
French:ÉBAUCHE DE MASQUE POUR EXPOSITION DU TYPE RÉFLEXION ET MASQUE POUR EXPOSITION DU TYPE RÉFLEXION[2014/32]
Entry into regional phase26.03.2014Translation filed 
26.03.2014National basic fee paid 
26.03.2014Search fee paid 
26.03.2014Designation fee(s) paid 
26.03.2014Examination fee paid 
Examination procedure26.03.2014Examination requested  [2014/32]
14.04.2016Amendment by applicant (claims and/or description)
14.06.2019Despatch of a communication from the examining division (Time limit: M04)
07.10.2019Reply to a communication from the examining division
29.01.2020Communication of intention to grant the patent
29.05.2020Fee for grant paid
29.05.2020Fee for publishing/printing paid
29.05.2020Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  14.06.2019
Opposition(s)09.04.2021No opposition filed within time limit [2021/24]
Fees paidRenewal fee
29.09.2014Renewal fee patent year 03
29.09.2015Renewal fee patent year 04
29.09.2016Renewal fee patent year 05
29.09.2017Renewal fee patent year 06
27.09.2018Renewal fee patent year 07
30.09.2019Renewal fee patent year 08
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU24.09.2012
AL08.07.2020
AT08.07.2020
CY08.07.2020
CZ08.07.2020
DK08.07.2020
EE08.07.2020
ES08.07.2020
FI08.07.2020
HR08.07.2020
LT08.07.2020
LV08.07.2020
MC08.07.2020
MK08.07.2020
MT08.07.2020
PL08.07.2020
RO08.07.2020
RS08.07.2020
SE08.07.2020
SI08.07.2020
SK08.07.2020
SM08.07.2020
TR08.07.2020
IE24.09.2020
LU24.09.2020
BE30.09.2020
CH30.09.2020
LI30.09.2020
BG08.10.2020
NO08.10.2020
GR09.10.2020
IS08.11.2020
PT09.11.2020
[2022/32]
Former [2022/27]HU24.09.2012
AL08.07.2020
AT08.07.2020
CY08.07.2020
CZ08.07.2020
DK08.07.2020
EE08.07.2020
ES08.07.2020
FI08.07.2020
HR08.07.2020
LT08.07.2020
LV08.07.2020
MC08.07.2020
MT08.07.2020
PL08.07.2020
RO08.07.2020
RS08.07.2020
SE08.07.2020
SI08.07.2020
SK08.07.2020
SM08.07.2020
TR08.07.2020
IE24.09.2020
LU24.09.2020
BE30.09.2020
CH30.09.2020
LI30.09.2020
BG08.10.2020
NO08.10.2020
GR09.10.2020
IS08.11.2020
PT09.11.2020
Former [2022/26]AL08.07.2020
AT08.07.2020
CZ08.07.2020
DK08.07.2020
EE08.07.2020
ES08.07.2020
FI08.07.2020
HR08.07.2020
LT08.07.2020
LV08.07.2020
MC08.07.2020
PL08.07.2020
RO08.07.2020
RS08.07.2020
SE08.07.2020
SI08.07.2020
SK08.07.2020
SM08.07.2020
TR08.07.2020
IE24.09.2020
LU24.09.2020
BE30.09.2020
CH30.09.2020
LI30.09.2020
BG08.10.2020
NO08.10.2020
GR09.10.2020
IS08.11.2020
PT09.11.2020
Former [2021/37]AL08.07.2020
AT08.07.2020
CZ08.07.2020
DK08.07.2020
EE08.07.2020
ES08.07.2020
FI08.07.2020
HR08.07.2020
LT08.07.2020
LV08.07.2020
MC08.07.2020
PL08.07.2020
RO08.07.2020
RS08.07.2020
SE08.07.2020
SI08.07.2020
SK08.07.2020
SM08.07.2020
IE24.09.2020
LU24.09.2020
BE30.09.2020
CH30.09.2020
LI30.09.2020
BG08.10.2020
NO08.10.2020
GR09.10.2020
IS08.11.2020
PT09.11.2020
Former [2021/36]AL08.07.2020
AT08.07.2020
CZ08.07.2020
DK08.07.2020
EE08.07.2020
ES08.07.2020
FI08.07.2020
HR08.07.2020
LT08.07.2020
LV08.07.2020
MC08.07.2020
PL08.07.2020
RO08.07.2020
RS08.07.2020
SE08.07.2020
SI08.07.2020
SK08.07.2020
SM08.07.2020
LU24.09.2020
BE30.09.2020
BG08.10.2020
NO08.10.2020
GR09.10.2020
IS08.11.2020
PT09.11.2020
Former [2021/28]AL08.07.2020
AT08.07.2020
CZ08.07.2020
DK08.07.2020
EE08.07.2020
ES08.07.2020
FI08.07.2020
HR08.07.2020
LT08.07.2020
LV08.07.2020
MC08.07.2020
PL08.07.2020
RO08.07.2020
RS08.07.2020
SE08.07.2020
SK08.07.2020
SM08.07.2020
LU24.09.2020
BG08.10.2020
NO08.10.2020
GR09.10.2020
IS08.11.2020
PT09.11.2020
Former [2021/27]AL08.07.2020
AT08.07.2020
CZ08.07.2020
DK08.07.2020
EE08.07.2020
ES08.07.2020
FI08.07.2020
HR08.07.2020
LT08.07.2020
LV08.07.2020
MC08.07.2020
PL08.07.2020
RO08.07.2020
RS08.07.2020
SE08.07.2020
SM08.07.2020
LU24.09.2020
BG08.10.2020
NO08.10.2020
GR09.10.2020
IS08.11.2020
PT09.11.2020
Former [2021/25]AL08.07.2020
AT08.07.2020
CZ08.07.2020
DK08.07.2020
EE08.07.2020
ES08.07.2020
FI08.07.2020
HR08.07.2020
LT08.07.2020
LV08.07.2020
MC08.07.2020
PL08.07.2020
RO08.07.2020
RS08.07.2020
SE08.07.2020
SM08.07.2020
BG08.10.2020
NO08.10.2020
GR09.10.2020
IS08.11.2020
PT09.11.2020
Former [2021/23]AT08.07.2020
CZ08.07.2020
DK08.07.2020
EE08.07.2020
ES08.07.2020
FI08.07.2020
HR08.07.2020
LT08.07.2020
LV08.07.2020
MC08.07.2020
PL08.07.2020
RO08.07.2020
RS08.07.2020
SE08.07.2020
SM08.07.2020
BG08.10.2020
NO08.10.2020
GR09.10.2020
IS08.11.2020
PT09.11.2020
Former [2021/22]AT08.07.2020
CZ08.07.2020
DK08.07.2020
EE08.07.2020
ES08.07.2020
FI08.07.2020
HR08.07.2020
LT08.07.2020
LV08.07.2020
PL08.07.2020
RO08.07.2020
RS08.07.2020
SE08.07.2020
BG08.10.2020
NO08.10.2020
GR09.10.2020
IS08.11.2020
PT09.11.2020
Former [2021/20]AT08.07.2020
DK08.07.2020
ES08.07.2020
FI08.07.2020
HR08.07.2020
LT08.07.2020
LV08.07.2020
PL08.07.2020
RS08.07.2020
SE08.07.2020
BG08.10.2020
NO08.10.2020
GR09.10.2020
IS08.11.2020
PT09.11.2020
Former [2021/10]AT08.07.2020
ES08.07.2020
FI08.07.2020
HR08.07.2020
LT08.07.2020
LV08.07.2020
PL08.07.2020
RS08.07.2020
SE08.07.2020
BG08.10.2020
NO08.10.2020
GR09.10.2020
IS08.11.2020
PT09.11.2020
Former [2021/09]AT08.07.2020
ES08.07.2020
FI08.07.2020
LT08.07.2020
SE08.07.2020
BG08.10.2020
NO08.10.2020
GR09.10.2020
PT09.11.2020
Former [2021/08]ES08.07.2020
FI08.07.2020
LT08.07.2020
SE08.07.2020
BG08.10.2020
NO08.10.2020
PT09.11.2020
Former [2021/07]FI08.07.2020
LT08.07.2020
NO08.10.2020
Documents cited:Search[XAY]US2007160916  (IKUTA YOSHIAKI [US], et al) [X] 1 * figures 1, 2, 4 * * paragraph [0017] - paragraph [0019] * * paragraph [0050] - paragraph [0065] * * paragraph [127ff] * [A] 2 [Y] 1,3;
 [A]US2009220869  (TAKAI KOSUKE [JP]) [A] 1-3 * the whole document *;
 [YDA]JP2011044520  (DAINIPPON PRINTING CO LTD) [YD] 1,3 * paragraph [0008] - paragraph [0012] * * claims 1-7 * * paragraph [0019] - paragraph [0020] * * paragraph [0024] - paragraph [0032] * * paragraph [0035] - paragraph [0036] * * paragraph [0046] - paragraph [0060] * * figures 3-7, 10; examples 1-3 * [A] 2;
 [A]  - NAKAJIMA K ET AL, "Low-thermal expansion material for EUVL photomask substrate application", PROCEEDINGS OF SPIE, S P I E - INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, US, (20040414), vol. 5446, no. 1, doi:10.1117/12.557815, ISSN 0277-786X, pages 812 - 823, XP002332800 [A] 2 * the whole document *

DOI:   http://dx.doi.org/10.1117/12.557815
International search[A]JP2007273651  (TOPPAN PRINTING CO LTD);
 [Y]JP2009523311  (ASAHI GLASS CO., LTD.);
 [Y]JP2011044520  (DAINIPPON PRINTING CO LTD)
by applicantJP2007273651
 JP2011044520
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.