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Extract from the Register of European Patents

EP About this file: EP2851749

EP2851749 - X-ray mask structure and method for preparing the same [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  10.06.2022
Database last updated on 05.10.2024
FormerThe patent has been granted
Status updated on  02.07.2021
FormerGrant of patent is intended
Status updated on  20.04.2021
FormerExamination is in progress
Status updated on  03.07.2019
Most recent event   Tooltip06.09.2024Lapse of the patent in a contracting state
New state(s): MT		published on 09.10.2024 [2024/41]
Applicant(s)For all designated states
National Synchrotron Radiation Research Center
101 Hsin-Ann Road
Hsinchu Science Park
30076 Hsinchu / TW
[2015/13]
Inventor(s)01 / Shew, Bor Yuan
101 Hsin-Ann Road
Hsinchu Science Park
30076 Hsinchu / TW
 [2015/13]
Representative(s)2K Patentanwälte Blasberg Kewitz & Reichel
Partnerschaft mbB
Schumannstrasse 27
60325 Frankfurt am Main / DE
[2015/13]
Application number, filing date13193850.821.11.2013
[2015/13]
Priority number, dateUS201361881152P23.09.2013         Original published format: US 201361881152 P
US20131408152915.11.2013         Original published format: US201314081529
[2015/13]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP2851749
Date:25.03.2015
Language:EN
[2015/13]
Type: B1 Patent specification 
No.:EP2851749
Date:04.08.2021
Language:EN
[2021/31]
Search report(s)(Supplementary) European search report - dispatched on:EP19.03.2014
ClassificationIPC:G03F1/22
[2015/13]
CPC:
G03F1/22 (EP,CN,KR,US); G03F1/68 (KR)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2015/44]
Former [2015/13]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
TitleGerman:Röntgenstrahlmaskenstruktur und Verfahren zu ihrer Herstellung[2015/13]
English:X-ray mask structure and method for preparing the same[2015/13]
French:Structure de masque à rayons x et son procédé de préparation[2015/13]
Examination procedure17.09.2015Amendment by applicant (claims and/or description)
17.09.2015Examination requested  [2015/44]
08.07.2019Despatch of a communication from the examining division (Time limit: M04)
06.11.2019Reply to a communication from the examining division
20.03.2020Despatch of a communication from the examining division (Time limit: M04)
24.06.2020Reply to a communication from the examining division
21.04.2021Communication of intention to grant the patent
23.06.2021Receipt of the translation of the claim(s)
29.06.2021Fee for grant paid
29.06.2021Fee for publishing/printing paid
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  08.07.2019
Opposition(s)06.05.2022No opposition filed within time limit [2022/28]
Fees paidRenewal fee
27.11.2015Renewal fee patent year 03
30.11.2016Renewal fee patent year 04
30.11.2017Renewal fee patent year 05
29.11.2018Renewal fee patent year 06
29.11.2019Renewal fee patent year 07
30.11.2020Renewal fee patent year 08
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU21.11.2013
AL04.08.2021
AT04.08.2021
CY04.08.2021
CZ04.08.2021
DK04.08.2021
EE04.08.2021
ES04.08.2021
FI04.08.2021
HR04.08.2021
IT04.08.2021
LT04.08.2021
LV04.08.2021
MC04.08.2021
MK04.08.2021
MT04.08.2021
NL04.08.2021
PL04.08.2021
RO04.08.2021
RS04.08.2021
SE04.08.2021
SI04.08.2021
SK04.08.2021
SM04.08.2021
BG04.11.2021
NO04.11.2021
GR05.11.2021
GB21.11.2021
IE21.11.2021
LU21.11.2021
BE30.11.2021
CH30.11.2021
LI30.11.2021
IS04.12.2021
PT06.12.2021
[2024/41]
Former [2024/22]HU21.11.2013
AL04.08.2021
AT04.08.2021
CY04.08.2021
CZ04.08.2021
DK04.08.2021
EE04.08.2021
ES04.08.2021
FI04.08.2021
HR04.08.2021
IT04.08.2021
LT04.08.2021
LV04.08.2021
MC04.08.2021
MK04.08.2021
NL04.08.2021
PL04.08.2021
RO04.08.2021
RS04.08.2021
SE04.08.2021
SI04.08.2021
SK04.08.2021
SM04.08.2021
BG04.11.2021
NO04.11.2021
GR05.11.2021
GB21.11.2021
IE21.11.2021
LU21.11.2021
BE30.11.2021
CH30.11.2021
LI30.11.2021
IS04.12.2021
PT06.12.2021
Former [2023/30]HU21.11.2013
AL04.08.2021
AT04.08.2021
CY04.08.2021
CZ04.08.2021
DK04.08.2021
EE04.08.2021
ES04.08.2021
FI04.08.2021
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IT04.08.2021
LT04.08.2021
LV04.08.2021
MC04.08.2021
NL04.08.2021
PL04.08.2021
RO04.08.2021
RS04.08.2021
SE04.08.2021
SI04.08.2021
SK04.08.2021
SM04.08.2021
BG04.11.2021
NO04.11.2021
GR05.11.2021
GB21.11.2021
IE21.11.2021
LU21.11.2021
BE30.11.2021
CH30.11.2021
LI30.11.2021
IS04.12.2021
PT06.12.2021
Former [2023/29]HU21.11.2013
AL04.08.2021
AT04.08.2021
CZ04.08.2021
DK04.08.2021
EE04.08.2021
ES04.08.2021
FI04.08.2021
HR04.08.2021
IT04.08.2021
LT04.08.2021
LV04.08.2021
MC04.08.2021
NL04.08.2021
PL04.08.2021
RO04.08.2021
RS04.08.2021
SE04.08.2021
SI04.08.2021
SK04.08.2021
SM04.08.2021
BG04.11.2021
NO04.11.2021
GR05.11.2021
GB21.11.2021
IE21.11.2021
LU21.11.2021
BE30.11.2021
CH30.11.2021
LI30.11.2021
IS04.12.2021
PT06.12.2021
Former [2022/48]AL04.08.2021
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CZ04.08.2021
DK04.08.2021
EE04.08.2021
ES04.08.2021
FI04.08.2021
HR04.08.2021
IT04.08.2021
LT04.08.2021
LV04.08.2021
MC04.08.2021
NL04.08.2021
PL04.08.2021
RO04.08.2021
RS04.08.2021
SE04.08.2021
SI04.08.2021
SK04.08.2021
SM04.08.2021
BG04.11.2021
NO04.11.2021
GR05.11.2021
GB21.11.2021
IE21.11.2021
LU21.11.2021
BE30.11.2021
CH30.11.2021
LI30.11.2021
IS04.12.2021
PT06.12.2021
Former [2022/47]AL04.08.2021
AT04.08.2021
CZ04.08.2021
DK04.08.2021
EE04.08.2021
ES04.08.2021
FI04.08.2021
HR04.08.2021
IT04.08.2021
LT04.08.2021
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MC04.08.2021
NL04.08.2021
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SI04.08.2021
SK04.08.2021
SM04.08.2021
BG04.11.2021
NO04.11.2021
GR05.11.2021
GB21.11.2021
LU21.11.2021
BE30.11.2021
CH30.11.2021
LI30.11.2021
IS04.12.2021
PT06.12.2021
Former [2022/37]AL04.08.2021
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SE04.08.2021
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BG04.11.2021
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GR05.11.2021
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BE30.11.2021
CH30.11.2021
LI30.11.2021
IS04.12.2021
PT06.12.2021
Former [2022/36]AL04.08.2021
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EE04.08.2021
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BG04.11.2021
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BE30.11.2021
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PT06.12.2021
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SM04.08.2021
BG04.11.2021
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GR05.11.2021
LU21.11.2021
BE30.11.2021
IS04.12.2021
PT06.12.2021
Former [2022/33]AL04.08.2021
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MC04.08.2021
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SM04.08.2021
BG04.11.2021
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BE30.11.2021
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PT06.12.2021
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EE04.08.2021
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FI04.08.2021
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NL04.08.2021
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SM04.08.2021
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GR05.11.2021
IS04.12.2021
PT06.12.2021
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NL04.08.2021
PL04.08.2021
RO04.08.2021
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SM04.08.2021
BG04.11.2021
NO04.11.2021
GR05.11.2021
IS04.12.2021
PT06.12.2021
Former [2022/24]AT04.08.2021
CZ04.08.2021
DK04.08.2021
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BG04.11.2021
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Documents cited:Search[X]US3742230  (SPEARS D, et al) [X] 1-16 * column 3, line 33 - column 4, line 2; figures 1-4 * * column 4, line 58 - line 60 *;
 [A]WO2004062899  (LEE SEUNG-SEOB [KR], et al) [A] 1,10 * page 4, line 32 - page 5, line 22; figure 2 *;
 [A]US2002028396  (SURENDRA MAHESWARAN [US], et al) [A] 1-10 * figures 3-10 *;
 [A]DE3900526  (FRAUNHOFER GES FORSCHUNG [DE]) [A] 1,10 * the whole document *
 [X]  - "LAYERED X-RAY MASK SUBSTRATE", IBM TECHNICAL DISCLOSURE BULLETIN,, (19850401), vol. 27, no. 11, pages 6615 - 6616, XP001392174 [X] 1-16 * the whole document *
 [A]  - "X-RAY LITHOGRAPHY MASK WITH VISIBLE LIGHT TRANSMITTING AREAS", IBM TECHNICAL DISCLOSURE BULLETIN, INTERNATIONAL BUSINESS MACHINES CORP. (THORNWOOD), US, (19891001), vol. 32, no. 5A, ISSN 0018-8689, page 240/241, XP000048902 [A] 1-10 * the whole document *
 [A]  - BRUNGER W H ET AL, "Influence of thin film thickness variations on pattern fidelity of X-ray masks", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 5, no. 1-4, doi:10.1016/0167-9317(86)90030-4, ISSN 0167-9317, (19861201), pages 61 - 65, (19861201), XP024436607 [A] 1,10 * the whole document *

DOI:   http://dx.doi.org/10.1016/0167-9317(86)90030-4
ExaminationJPS5349953
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