blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP2823489

EP2823489 - METHOD OF PRODUCING A FRESNEL ZONE PLATE FOR APPLICATIONS IN HIGH ENERGY RADIATION [Right-click to bookmark this link]
StatusThe application has been refused
Status updated on  31.05.2017
Database last updated on 23.11.2024
FormerExamination is in progress
Status updated on  01.11.2016
Most recent event   Tooltip20.04.2018Refusal of applicationpublished on 23.05.2018  [2018/21]
Applicant(s)For all designated states
Max-Planck-Gesellschaft zur Förderung der Wissenschaften
Hofgartenstrasse 8
80539 Munich / DE
[2015/03]
Inventor(s)01 / SCHÜTZ, Gisela
Oesterfeldstr. 46
70563 Stuttgart / DE
02 / GRÉVENT, Corinne
Körschtalstr. 8/1
73760 Ostfildern / DE
03 / KESKINBORA, Kahraman
Bärenseestr. 27
70569 Stuttgart / DE
04 / HIRSCHER, Michael
Greutterstr. 6
70499 Stuttgart / DE
 [2015/03]
Representative(s)Hannke, Christian
Hannke Bittner & Partner
Patent- und Rechtsanwälte mbB
Prüfeninger Straße 1
93049 Regensburg / DE
[N/P]
Former [2015/03]Hannke, Christian
Hannke Bittner & Partner
Patent- und Rechtsanwälte
Prüfeninger Strasse 1
93049 Regensburg / DE
Application number, filing date13707893.707.03.2013
WO2013EP54646
Priority number, dateEP2012015866908.03.2012         Original published format: EP 12158669
[2015/03]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO2013132024
Date:12.09.2013
Language:EN
[2013/37]
Type: A2 Application without search report 
No.:EP2823489
Date:14.01.2015
Language:EN
The application published by WIPO in one of the EPO official languages on 12.09.2013 takes the place of the publication of the European patent application.
[2015/03]
Search report(s)International search report - published on:EP19.12.2013
ClassificationIPC:G21K1/06
[2015/03]
CPC:
G21K1/06 (EP,US); G21K1/067 (US); G02B5/1857 (US);
G02B5/1876 (US); G21K1/062 (US); G21K2201/067 (EP,US);
Y10T29/49982 (EP,US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2015/03]
TitleGerman:VERFAHREN ZUR HERSTELLUNG EINER FRESNEL-ZONENPLATTE FÜR ANWENDUNGEN IN HOCHENERGETISCHER STRAHLUNG[2015/03]
English:METHOD OF PRODUCING A FRESNEL ZONE PLATE FOR APPLICATIONS IN HIGH ENERGY RADIATION[2015/03]
French:PROCÉDÉ DE PRODUCTION DE PLAQUE À ZONE DE FRESNEL DESTINÉE À DES APPLICATIONS DE RAYONNEMENT À HAUTE ÉNERGIE[2015/03]
Entry into regional phase05.09.2014National basic fee paid 
05.09.2014Designation fee(s) paid 
05.09.2014Examination fee paid 
Examination procedure05.09.2014Examination requested  [2015/03]
14.04.2015Amendment by applicant (claims and/or description)
20.10.2016Despatch of a communication from the examining division (Time limit: M04)
21.02.2017Reply to a communication from the examining division
01.06.2017Despatch of communication that the application is refused, reason: substantive examination [2018/21]
06.04.2018Application refused, date of legal effect [2018/21]
Appeal following examination14.08.2017Appeal received No.  T1897/17
14.02.2018Result of appeal procedure: appeal of the applicant inadmissible
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  20.10.2016
Fees paidRenewal fee
19.02.2015Renewal fee patent year 03
16.03.2016Renewal fee patent year 04
13.03.2017Renewal fee patent year 05
20.03.2018Renewal fee patent year 06
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search   [XDYI] - RASHI GARG ET AL, "Novel method for fabrication of high-efficiency optics for short wavelength radiation", PROCEEDINGS OF SPIE, (20060121), vol. 6110, doi:10.1117/12.646492, ISSN 0277-786X, pages 61100S - 61100S-3, XP055063804 [XD] 1,2,7-9,15-19 * the whole document * [Y] 3,4 [I] 5,6,12-14

DOI:   http://dx.doi.org/10.1117/12.646492
 [XAI]  - SURPI A ET AL, "Focused ion beam fabrication procedures of x-ray micro Fresnel zone plates", JOURNAL OF MICROMECHANICS & MICROENGINEERING, INSTITUTE OF PHYSICS PUBLISHING, BRISTOL, GB, (200703), vol. 17, no. 3, doi:10.1088/0960-1317/17/3/026, ISSN 0960-1317, pages 617 - 622, XP020120041 [X] 1,2,5,7-9,12,13,15,20,21 * pages 619-621 * [A] 3,4 [I] 6,14

DOI:   http://dx.doi.org/10.1088/0960-1317/17/3/026
 [XAI]  - P P ILINSKI ET AL, "X-ray Zone Plate Fabrication Using a Focused Ion Beam", ADVANCES IN X-RAY OPTICS, (2001), vol. 4145, pages 311 - 316, XP055063830 [X] 1,2,8,9,12,13,15,16,18-21 * pages 312-315 * [A] 3,4 [I] 5-7,14,17
 [Y]  - VICTOR CALLEGARI ET AL, "TECHNICAL NOTE; Optimized fabrication of curved surfaces by a FIB for direct focusing with glass fibres", JOURNAL OF MICROMECHANICS & MICROENGINEERING, INSTITUTE OF PHYSICS PUBLISHING, BRISTOL, GB, (200910), vol. 19, no. 10, doi:10.1088/0960-1317/19/10/107003, ISSN 0960-1317, page 107003, XP020164958 [Y] 3,4 * page 2, line r *

DOI:   http://dx.doi.org/10.1088/0960-1317/19/10/107003
 [T]  - KAHRAMAN KESKINBORA ET AL, "Ion beam lithography for Fresnel zone plates in X-ray microscopy", OPTICS EXPRESS, (20130520), vol. 21, no. 10, doi:10.1364/OE.21.011747, ISSN 1094-4087, page 11747, XP055082922 [T] 20,21

DOI:   http://dx.doi.org/10.1364/OE.21.011747
 [XI]  - CHANTAL KHAN MALEK ET AL, "Focused ion beam direct micromachining of DOEs", PROCEEDINGS OF SPIE, (20000101), doi:10.1117/12.397932, pages 167 - 172, XP055082946 [X] 1,2,5,8,9,14 * pages 170-171 * [I] 16-21

DOI:   http://dx.doi.org/10.1117/12.397932
ExaminationUS2004130785
    - J. Lenz ET AL, "Nanofabrication of Optical Elements for SXR and EUV Applications: Ion Beam Lithography as a New Approach", AIP CONFERENCE PROCEEDINGS, NEW YORK, US, (20110101), doi:10.1063/1.3625315, ISSN 0094-243X, pages 104 - 107, XP055373498

DOI:   http://dx.doi.org/10.1063/1.3625315
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.