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Extract from the Register of European Patents

EP About this file: EP2896278

EP2896278 - DEVICE FOR GENERATING PLASMA HAVING A HIGH RANGE ALONG AN AXIS BY ELECTRON CYCLOTRON RESONANCE (ECR) FROM A GASEOUS MEDIUM [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  17.04.2020
Database last updated on 14.09.2024
FormerThe patent has been granted
Status updated on  10.05.2019
FormerGrant of patent is intended
Status updated on  01.01.2019
Most recent event   Tooltip01.07.2022Lapse of the patent in a contracting state
New state(s): MK
published on 03.08.2022  [2022/31]
Applicant(s)For all designated states
H.E.F.
Rue Benoît Fourneyron
42160 Andrezieux-Boutheon / FR
[2015/30]
Inventor(s)01 / SCHMIDT, Beat
27 Bis rue de Roanne
F-42210 Montrond Les Bains / FR
02 / HEAU, Christophe
22 Rue Voltaire
F-42100 Saint Etienne / FR
03 / MAURIN-PERRIER, Philippe
564 Route de Saint Romain
F-42680 Saint Marcellin en Forez / FR
 [2015/30]
Representative(s)Cabinet Laurent & Charras
3 place de l'Hotel de Ville
CS 70203
42005 Saint-Etienne Cedex 1 / FR
[2019/24]
Former [2015/30]Cabinet Laurent & Charras
3 Place de l'Hotel de Ville CS 70203
42005 Saint Etienne Cedex 1 / FR
Application number, filing date13774719.204.09.2013
[2019/24]
WO2013FR52035
Priority number, dateFR2012005849511.09.2012         Original published format: FR 1258495
[2015/30]
Filing languageFR
Procedural languageFR
PublicationType: A1 Application with search report
No.:WO2014041280
Date:20.03.2014
Language:FR
[2014/12]
Type: A1 Application with search report 
No.:EP2896278
Date:22.07.2015
Language:FR
The application published by WIPO in one of the EPO official languages on 20.03.2014 takes the place of the publication of the European patent application.
[2015/30]
Type: B1 Patent specification 
No.:EP2896278
Date:12.06.2019
Language:FR
[2019/24]
Search report(s)International search report - published on:EP20.03.2014
ClassificationIPC:H05H1/46, H01J37/32
[2015/30]
CPC:
H01J37/32192 (EP,US); H01J37/32009 (US); H01J37/32678 (EP,US);
H05H1/46 (EP,US); H05H1/463 (EP,US); H01J37/32 (RU)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2015/30]
Extension statesBANot yet paid
MENot yet paid
TitleGerman:VORRICHTUNG ZUR PLASMAERZEUGUNG MIT HOHEM BEREICH ENTLANG EINER ACHSE DURCH ELEKTRONZYKLOTRONRESONANZ (ECR) AUS EINEM GASFÖRMIGEN MEDIUM[2015/30]
English:DEVICE FOR GENERATING PLASMA HAVING A HIGH RANGE ALONG AN AXIS BY ELECTRON CYCLOTRON RESONANCE (ECR) FROM A GASEOUS MEDIUM[2015/30]
French:DISPOSITIF POUR GÉNÉRER UN PLASMA PRÉSENTANT UNE ÉTENDUE IMPORTANTE LE LONG D'UN AXE PAR RÉSONNANCE CYCLOTRONIQUE ÉLECTRONIQUE RCE À PARTIR D'UN MILIEU GAZEUX.[2019/03]
Former [2015/30]DISPOSITIF POUR GENERER UN PLASMA PRESENTANT UNE ETENDUE IMPORTANTE LE LONG D'UN AXE PAR RESONNANCE CYCLOTRONIQUE ELECTRONIQUE RCE A PARTIR D'UN MILIEU GAZEUX.
Entry into regional phase19.02.2015National basic fee paid 
19.02.2015Designation fee(s) paid 
19.02.2015Examination fee paid 
Examination procedure19.02.2015Examination requested  [2015/30]
30.07.2015Amendment by applicant (claims and/or description)
02.01.2019Communication of intention to grant the patent
26.04.2019Fee for grant paid
26.04.2019Fee for publishing/printing paid
26.04.2019Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  02.01.2019
Opposition(s)13.03.2020No opposition filed within time limit [2020/21]
Fees paidRenewal fee
29.09.2015Renewal fee patent year 03
26.09.2016Renewal fee patent year 04
26.09.2017Renewal fee patent year 05
25.09.2018Renewal fee patent year 06
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See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAL12.06.2019
CY12.06.2019
EE12.06.2019
HR12.06.2019
MC12.06.2019
MK12.06.2019
MT12.06.2019
RS12.06.2019
SM12.06.2019
IE04.09.2019
LU04.09.2019
GR13.09.2019
IS12.10.2019
[2022/31]
Former [2021/34]AL12.06.2019
CY12.06.2019
EE12.06.2019
HR12.06.2019
MC12.06.2019
MT12.06.2019
RS12.06.2019
SM12.06.2019
IE04.09.2019
LU04.09.2019
GR13.09.2019
IS12.10.2019
Former [2021/26]AL12.06.2019
CY12.06.2019
EE12.06.2019
HR12.06.2019
MC12.06.2019
RS12.06.2019
SM12.06.2019
IE04.09.2019
LU04.09.2019
GR13.09.2019
IS12.10.2019
Former [2020/36]AL12.06.2019
EE12.06.2019
HR12.06.2019
MC12.06.2019
RS12.06.2019
SM12.06.2019
IE04.09.2019
LU04.09.2019
GR13.09.2019
IS12.10.2019
Former [2020/35]AL12.06.2019
EE12.06.2019
HR12.06.2019
MC12.06.2019
RS12.06.2019
SM12.06.2019
LU04.09.2019
GR13.09.2019
IS24.02.2020
Former [2020/24]AL12.06.2019
EE12.06.2019
HR12.06.2019
MC12.06.2019
RS12.06.2019
SM12.06.2019
GR13.09.2019
IS24.02.2020
Former [2020/14]AL12.06.2019
EE12.06.2019
HR12.06.2019
RS12.06.2019
SM12.06.2019
GR13.09.2019
IS12.10.2019
Former [2020/12]AL12.06.2019
EE12.06.2019
HR12.06.2019
RS12.06.2019
GR13.09.2019
IS12.10.2019
Former [2019/50]AL12.06.2019
HR12.06.2019
RS12.06.2019
GR13.09.2019
Cited inInternational search[XYI]US4745337  (PICHOT MICHEL [FR], et al) [X] 1,2 * abstract * * column 2, lines 41-51 * * column 4, lines 35-55 * * column 5, lines 34-66 * [Y] 4,9 [I] 3;
 [A]US5961773  (ICHIMURA SATOSHI [JP], et al) [A] 1-11* abstract *;
 [IY]WO2008009558  (CENTRE NAT RECH SCIENT [FR], et al) [I] 1 * abstract * * page 12, lines 27-30 * [Y] 4,9;
 [A]EP1976346  (ECOLE POLYTECH [FR], et al) [A] 1-11 * abstract *
by applicantDE4136297
 DE19812558
 EP1075168
 WO2005027595
 WO2008017304
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