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EP2857899
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EP About this file: EP2857899
| EP2857899 - PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR PRODUCING WIRING BOARD [Right-click to bookmark this link] | |||
| Former [2015/15] | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING WIRING BOARD | ||
| [2017/36] | Status | The application is deemed to be withdrawn Status updated on 02.03.2018 Database last updated on 03.09.2024 | |
| Former | Grant of patent is intended Status updated on 29.05.2017 | Most recent event Tooltip | 02.03.2018 | Application deemed to be withdrawn | published on 04.04.2018 [2018/14] | Applicant(s) | For all designated states Hitachi Chemical Company, Ltd. 9-2, Marunouchi 1-chome Chiyoda-ku Tokyo 100-6606 / JP | [2015/15] | Inventor(s) | 01 /
ITAGAKI, Katsutoshi c/o Hitachi Chemical Company Ltd. 13-1 Higashi-cho 4-chome Hitachi-shi Ibaraki 317-8555 / JP | 02 /
SHINDOU, Masanori c/o Hitachi Chemical Company Ltd. 13-1 Higashi-cho 4-chome Hitachi-shi Ibaraki 317-8555 / JP | [2015/15] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastraße 30 81925 München / DE | [2015/15] | Application number, filing date | 13797586.8 | 28.05.2013 | WO2013JP64782 | Priority number, date | JP20120125516 | 31.05.2012 Original published format: JP 2012125516 | [2015/15] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2013180131 | Date: | 05.12.2013 | Language: | JA | [2013/49] | Type: | A1 Application with search report | No.: | EP2857899 | Date: | 08.04.2015 | Language: | EN | [2015/15] | Search report(s) | International search report - published on: | JP | 05.12.2013 | (Supplementary) European search report - dispatched on: | EP | 28.09.2016 | Classification | IPC: | G03F7/004 | [2015/15] | CPC: |
G03F7/085 (EP,US);
G03F7/0045 (KR);
G03F7/027 (EP,KR,US);
G03F7/20 (US);
H05K3/064 (US);
H05K3/108 (US);
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2015/15] | Title | German: | LICHTEMPFINDLICHE HARZZUSAMMENSETZUNG, LICHTEMPFINDLICHES ELEMENT, VERFAHREN ZUR BILDUNG EINER FOTOLACKSTRUKTUR UND VERFAHREN ZUR HERSTELLUNG EINER LEITERPLATTE | [2015/15] | English: | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR PRODUCING WIRING BOARD | [2017/36] | French: | COMPOSITION DE RÉSINE PHOTOSENSIBLE, ÉLÉMENT PHOTOSENSIBLE, PROCÉDÉ DE FORMATION D'UN MOTIF DE RÉSIST ET PROCÉDÉ DE FABRICATION D'UN PANNEAU DE CÂBLAGE | [2015/15] |
| Former [2015/15] | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING WIRING BOARD | Entry into regional phase | 21.11.2014 | Translation filed | 21.11.2014 | National basic fee paid | 21.11.2014 | Search fee paid | 21.11.2014 | Designation fee(s) paid | 21.11.2014 | Examination fee paid | Examination procedure | 21.11.2014 | Examination requested [2015/15] | 30.05.2017 | Communication of intention to grant the patent | 10.10.2017 | Application deemed to be withdrawn, date of legal effect [2018/14] | 15.11.2017 | Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time [2018/14] | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 30.05.2017 | Fees paid | Renewal fee | 22.05.2015 | Renewal fee patent year 03 | 24.05.2016 | Renewal fee patent year 04 | 18.05.2017 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]EP1834765 (FUJIFILM CORP [JP]) [A] 1-6* paragraphs [0280] - [0281] * | International search | [A]JPH1172914 (TOAGOSEI CO LTD); | [A]JP2004294552 (HITACHI CHEMICAL CO LTD); | [A]JP2005010572 (TORAY INDUSTRIES); | [A]WO2006016658 (HITACHI CHEMICAL CO LTD [JP], et al); | [A]JP2007047290 (HITACHI CHEMICAL CO LTD); | [A]WO2008015754 (CHIYODA CHEMICAL CO LTD [JP], et al); | [A]JP2008256769 (KONICA MINOLTA MED & GRAPHIC); | [A]JP2011013623 (HITACHI CHEMICAL CO LTD) | by applicant | JPH11327137 | WO2006016658 | WO2008015754 |