EP2782126 - Member for semiconductor manufacturing apparatuses [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 26.02.2021 Database last updated on 02.08.2024 | |
Former | The patent has been granted Status updated on 20.03.2020 | ||
Former | Grant of patent is intended Status updated on 13.11.2019 | Most recent event Tooltip | 14.06.2024 | Lapse of the patent in a contracting state New state(s): TR | published on 17.07.2024 [2024/29] | Applicant(s) | For all designated states NGK Insulators, Ltd. 2-56, Suda-cho, Mizuho-ku Nagoya-city, Aichi 467-8530 / JP | [2014/39] | Inventor(s) | 01 /
Ohba, Kazuma c/o NGK Insulators, Ltd., Legal Affairs & Intellectual Property Dept. 2-56 Suda-cho Mizuho-ku Nagoya-city, Aichi 467-8530 / JP | 02 /
Kawajiri, Tetsuya c/o NGK Insulators, Ltd., Legal Affairs & Intellectual Property Dept. 2-56 Suda-cho Mizuho-ku Nagoya-city, Aichi 467-8530 / JP | 03 /
Kataigi, Takashi c/o NGK Insulators, Ltd., Legal Affairs & Intellectual Property Dept. 2-56 Suda-cho Mizuho-ku Nagoya-city, Aichi 467-8530 / JP | [2014/39] | Representative(s) | Mewburn Ellis LLP Aurora Building Counterslip Bristol BS1 6BX / GB | [N/P] |
Former [2020/17] | Mewburn Ellis LLP City Tower 40 Basinghall Street London EC2V 5DE / GB | ||
Former [2014/39] | Naylor, Matthew John, et al Mewburn Ellis LLP 33 Gutter Lane London EC2V 8AS / GB | Application number, filing date | 14159711.2 | 14.03.2014 | [2014/39] | Priority number, date | JP20130054840 | 18.03.2013 Original published format: JP 2013054840 | [2014/39] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP2782126 | Date: | 24.09.2014 | Language: | EN | [2014/39] | Type: | B1 Patent specification | No.: | EP2782126 | Date: | 22.04.2020 | Language: | EN | [2020/17] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 12.05.2014 | Classification | IPC: | H01L21/67, H01L21/683 | [2014/39] | CPC: |
H01L21/67103 (EP,CN,US);
H01L21/67 (US);
B32B15/04 (US);
B32B18/00 (US);
B32B7/12 (US);
H01L21/6833 (EP,CN,US);
Y10T428/31522 (EP,US)
(-)
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2015/18] |
Former [2014/39] | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR | Title | German: | Element für Halbleiterherstellungsvorrichtungen | [2014/39] | English: | Member for semiconductor manufacturing apparatuses | [2014/39] | French: | Élément pour appareils de fabrication de semi-conducteur | [2014/39] | Examination procedure | 24.03.2015 | Amendment by applicant (claims and/or description) | 24.03.2015 | Examination requested [2015/18] | 14.11.2019 | Communication of intention to grant the patent | 21.02.2020 | Fee for grant paid | 21.02.2020 | Fee for publishing/printing paid | 21.02.2020 | Receipt of the translation of the claim(s) | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 14.11.2019 | Opposition(s) | 25.01.2021 | No opposition filed within time limit [2021/13] | Fees paid | Renewal fee | 21.03.2016 | Renewal fee patent year 03 | 27.01.2017 | Renewal fee patent year 04 | 13.03.2018 | Renewal fee patent year 05 | 13.03.2019 | Renewal fee patent year 06 | 12.03.2020 | Renewal fee patent year 07 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | HU | 14.03.2014 | AL | 22.04.2020 | AT | 22.04.2020 | CY | 22.04.2020 | CZ | 22.04.2020 | DK | 22.04.2020 | EE | 22.04.2020 | ES | 22.04.2020 | FI | 22.04.2020 | HR | 22.04.2020 | IT | 22.04.2020 | LT | 22.04.2020 | LV | 22.04.2020 | MC | 22.04.2020 | MK | 22.04.2020 | NL | 22.04.2020 | PL | 22.04.2020 | RO | 22.04.2020 | RS | 22.04.2020 | SE | 22.04.2020 | SI | 22.04.2020 | SK | 22.04.2020 | SM | 22.04.2020 | TR | 22.04.2020 | BG | 22.07.2020 | NO | 22.07.2020 | GR | 23.07.2020 | IS | 22.08.2020 | PT | 24.08.2020 | [2024/29] |
Former [2024/22] | HU | 14.03.2014 | |
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CZ | 22.04.2020 | ||
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BG | 22.07.2020 | ||
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GR | 23.07.2020 | ||
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PT | 24.08.2020 | ||
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SI | 22.04.2020 | ||
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SM | 22.04.2020 | ||
BG | 22.07.2020 | ||
NO | 22.07.2020 | ||
GR | 23.07.2020 | ||
IS | 22.08.2020 | ||
PT | 24.08.2020 | ||
Former [2023/27] | HU | 14.03.2014 | |
AL | 22.04.2020 | ||
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CZ | 22.04.2020 | ||
DK | 22.04.2020 | ||
EE | 22.04.2020 | ||
ES | 22.04.2020 | ||
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IT | 22.04.2020 | ||
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MC | 22.04.2020 | ||
NL | 22.04.2020 | ||
PL | 22.04.2020 | ||
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RS | 22.04.2020 | ||
SE | 22.04.2020 | ||
SI | 22.04.2020 | ||
SK | 22.04.2020 | ||
SM | 22.04.2020 | ||
BG | 22.07.2020 | ||
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GR | 23.07.2020 | ||
IS | 22.08.2020 | ||
PT | 24.08.2020 | ||
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BG | 22.07.2020 | ||
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GR | 23.07.2020 | ||
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PT | 24.08.2020 | ||
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BG | 22.07.2020 | ||
NO | 22.07.2020 | ||
GR | 23.07.2020 | ||
IS | 22.08.2020 | ||
PT | 24.08.2020 | ||
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CZ | 22.04.2020 | ||
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BG | 22.07.2020 | ||
NO | 22.07.2020 | ||
GR | 23.07.2020 | ||
IS | 22.08.2020 | ||
PT | 24.08.2020 | ||
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BG | 22.07.2020 | ||
NO | 22.07.2020 | ||
GR | 23.07.2020 | ||
IS | 22.08.2020 | ||
PT | 24.08.2020 | ||
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RS | 22.04.2020 | ||
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IS | 22.08.2020 | ||
PT | 24.08.2020 | ||
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IS | 22.08.2020 | ||
PT | 24.08.2020 | ||
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SE | 22.04.2020 | ||
NO | 22.07.2020 | ||
GR | 23.07.2020 | ||
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PT | 24.08.2020 | ||
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HR | 22.04.2020 | ||
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LV | 22.04.2020 | ||
NL | 22.04.2020 | ||
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NO | 22.07.2020 | ||
GR | 23.07.2020 | ||
IS | 22.08.2020 | ||
PT | 24.08.2020 | ||
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SE | 22.04.2020 | ||
NO | 22.07.2020 | ||
IS | 22.08.2020 | ||
PT | 24.08.2020 | ||
Former [2020/47] | LT | 22.04.2020 | |
NO | 22.07.2020 | ||
IS | 22.08.2020 | ||
Former [2020/46] | IS | 22.08.2020 | Documents cited: | Search | [Y]US4026831 (MORIYA MASAFUMI, et al) [Y] 1-9 * column 1, line 46 - column 13, line 22 *; | [Y]US6166897 (MATSUNAGA TADAO [JP]) [Y] 1-9 * column 3, line 49 - column 10, line 35 * * figures 1,2 *; | [A]US2005046021 (HOSOKAWA KAZUHITO [JP]) [A] 1 * the whole document *; | [A]EP1986228 (SHINETSU CHEMICAL CO [JP]) [A] 1 * the whole document *; | [A]US2009246915 (ICHIKAWA ISAO [JP], et al) [A] 1* the whole document * |