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Extract from the Register of European Patents

EP About this file: EP2952557

EP2952557 - MICROWAVE INDUCED PLASMA CLEANING DEVICE AND METHOD FOR PRODUCER GAS [Right-click to bookmark this link]
Former [2015/50]Microwave induced plasma cleaning device and method for producer gas
[2016/14]
StatusNo opposition filed within time limit
Status updated on  29.09.2017
Database last updated on 03.09.2024
Most recent event   Tooltip17.07.2020Lapse of the patent in a contracting state
New state(s): AL, IS
published on 19.08.2020  [2020/34]
Applicant(s)For all designated states
PHG Energy, LLC
3048 Owen Drive
Nashville, TN 37013 / US
[2015/50]
Inventor(s)01 / Potgieter, Deon John
9414 Highwood Hill Road
Brentwood, TN Tennessee 37027 / US
02 / Loftin, Mark Oliver
1990 Bradshire Drive
Mobile, AL Alabama 36695 / US
03 / Stanzione, Tom
1190 Oak Haven Road
Knoxville, TN Tennessee 37932-2628 / US
04 / Brown, Jeffrey Scott
111 Mimosa Drive
Leland, MS Mississippi 38756 / US
 [2015/50]
Representative(s)Boult Wade Tennant LLP
Salisbury Square House
8 Salisbury Square
London EC4Y 8AP / GB
[N/P]
Former [2015/50]Boult Wade Tennant
Verulam Gardens
70 Gray's Inn Road
London WC1X 8BT / GB
Application number, filing date14190849.129.10.2014
[2015/50]
Priority number, dateUS201462006448P02.06.2014         Original published format: US 201462006448 P
US20141451762917.10.2014         Original published format: US201414517629
[2015/50]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP2952557
Date:09.12.2015
Language:EN
[2015/50]
Type: B1 Patent specification 
No.:EP2952557
Date:23.11.2016
Language:EN
[2016/47]
Search report(s)(Supplementary) European search report - dispatched on:EP23.03.2015
ClassificationIPC:C10K1/00, B01D53/02, C10K1/32, C10K1/34
[2015/50]
CPC:
C10K3/008 (EP,KR,US); B01D53/74 (RU); B01J19/245 (KR,US);
B01J8/001 (EP,KR,US); B01J8/002 (EP,US); B01J8/008 (EP,KR,US);
B01J8/0453 (EP,KR,US); B01J8/0457 (EP,US); B01J8/0492 (EP,US);
B01J8/0496 (EP,US); C01B3/50 (EP,US); C01B3/56 (EP,US);
C10K1/002 (EP,KR,US); C10K1/024 (EP,KR,US); C10K1/20 (KR,US);
C10K1/32 (EP,KR,US); C10K1/34 (EP,KR,US); C10K3/023 (EP,KR,US);
B01J2208/00061 (EP,US); B01J2208/0007 (EP,US); B01J2208/00212 (EP,US);
B01J2208/00442 (EP,US); B01J2208/00495 (EP,US); B01J2208/0061 (EP,US);
B01J2208/00752 (EP,US); B01J2208/00761 (EP,US); B01J2219/00306 (EP,US);
B01J2219/00495 (EP,US); B01J2219/185 (US); C10K3/00 (RU) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2015/52]
TitleGerman:REINIGUNGSVORRICHTUNG UND -VERFAHREN MIT MIKROWELLENINDUZIERTEM PLASMA FÜR PRODUKTGAS[2016/14]
English:MICROWAVE INDUCED PLASMA CLEANING DEVICE AND METHOD FOR PRODUCER GAS[2016/14]
French:DISPOSITIF DE NETTOYAGE DE PLASMA INDUIT PAR MICRO-ONDES ET PROCÉDÉ POUR GAZ DE GAZOGÈNE[2016/14]
Former [2015/50]Reinigungsvorrichtung und -verfahren mit mikrowelleninduziertem Plasma für Produktgas
Former [2015/50]Microwave induced plasma cleaning device and method for producer gas
Former [2015/50]Dispositif de nettoyage de plasma induit par micro-ondes et procédé pour gaz de gazogène
Examination procedure11.11.2015Amendment by applicant (claims and/or description)
11.11.2015Examination requested  [2015/52]
08.03.2016Communication of intention to grant the patent
24.08.2016Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time
13.10.2016Fee for grant paid
13.10.2016Fee for publishing/printing paid
13.10.2016Receipt of the translation of the claim(s)
Divisional application(s)EP16178211.5  / EP3106505
Opposition(s)24.08.2017No opposition filed within time limit [2017/44]
Request for further processing for:The application is deemed to be withdrawn due to failure to fulfill actions required for granting the patent
13.10.2016Request for further processing filed
13.10.2016Full payment received (date of receipt of payment)
Request granted
25.10.2016Decision despatched
Fees paidRenewal fee
14.10.2016Renewal fee patent year 03
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Lapses during opposition  TooltipHU29.10.2014
AL23.11.2016
AT23.11.2016
BE23.11.2016
CY23.11.2016
CZ23.11.2016
DK23.11.2016
EE23.11.2016
ES23.11.2016
FI23.11.2016
HR23.11.2016
IT23.11.2016
LT23.11.2016
LV23.11.2016
MK23.11.2016
NL23.11.2016
PL23.11.2016
RO23.11.2016
RS23.11.2016
SE23.11.2016
SI23.11.2016
SK23.11.2016
SM23.11.2016
TR23.11.2016
BG23.02.2017
NO23.02.2017
GR24.02.2017
IS23.03.2017
PT23.03.2017
[2020/33]
Former [2020/15]HU29.10.2014
AT23.11.2016
BE23.11.2016
CY23.11.2016
CZ23.11.2016
DK23.11.2016
EE23.11.2016
ES23.11.2016
FI23.11.2016
HR23.11.2016
IT23.11.2016
LT23.11.2016
LV23.11.2016
MK23.11.2016
NL23.11.2016
PL23.11.2016
RO23.11.2016
RS23.11.2016
SE23.11.2016
SI23.11.2016
SK23.11.2016
SM23.11.2016
TR23.11.2016
BG23.02.2017
NO23.02.2017
GR24.02.2017
PT23.03.2017
Former [2019/52]HU29.10.2014
AT23.11.2016
BE23.11.2016
CY23.11.2016
CZ23.11.2016
DK23.11.2016
EE23.11.2016
ES23.11.2016
FI23.11.2016
HR23.11.2016
IT23.11.2016
LT23.11.2016
LV23.11.2016
MK23.11.2016
NL23.11.2016
PL23.11.2016
RO23.11.2016
RS23.11.2016
SE23.11.2016
SI23.11.2016
SK23.11.2016
SM23.11.2016
BG23.02.2017
NO23.02.2017
GR24.02.2017
PT23.03.2017
Former [2019/47]HU29.10.2014
AT23.11.2016
BE23.11.2016
CY23.11.2016
CZ23.11.2016
DK23.11.2016
EE23.11.2016
ES23.11.2016
FI23.11.2016
HR23.11.2016
IT23.11.2016
LT23.11.2016
LV23.11.2016
NL23.11.2016
PL23.11.2016
RO23.11.2016
RS23.11.2016
SE23.11.2016
SI23.11.2016
SK23.11.2016
SM23.11.2016
BG23.02.2017
NO23.02.2017
GR24.02.2017
PT23.03.2017
Former [2019/31]HU29.10.2014
AT23.11.2016
BE23.11.2016
CZ23.11.2016
DK23.11.2016
EE23.11.2016
ES23.11.2016
FI23.11.2016
HR23.11.2016
IT23.11.2016
LT23.11.2016
LV23.11.2016
NL23.11.2016
PL23.11.2016
RO23.11.2016
RS23.11.2016
SE23.11.2016
SI23.11.2016
SK23.11.2016
SM23.11.2016
BG23.02.2017
NO23.02.2017
GR24.02.2017
PT23.03.2017
Former [2017/52]AT23.11.2016
BE23.11.2016
CZ23.11.2016
DK23.11.2016
EE23.11.2016
ES23.11.2016
FI23.11.2016
HR23.11.2016
IT23.11.2016
LT23.11.2016
LV23.11.2016
NL23.11.2016
PL23.11.2016
RO23.11.2016
RS23.11.2016
SE23.11.2016
SI23.11.2016
SK23.11.2016
SM23.11.2016
BG23.02.2017
NO23.02.2017
GR24.02.2017
PT23.03.2017
Former [2017/38]AT23.11.2016
BE23.11.2016
CZ23.11.2016
DK23.11.2016
EE23.11.2016
ES23.11.2016
FI23.11.2016
HR23.11.2016
IT23.11.2016
LT23.11.2016
LV23.11.2016
NL23.11.2016
PL23.11.2016
RO23.11.2016
RS23.11.2016
SE23.11.2016
SK23.11.2016
SM23.11.2016
BG23.02.2017
NO23.02.2017
GR24.02.2017
PT23.03.2017
Former [2017/37]AT23.11.2016
BE23.11.2016
CZ23.11.2016
DK23.11.2016
EE23.11.2016
ES23.11.2016
FI23.11.2016
HR23.11.2016
IT23.11.2016
LT23.11.2016
LV23.11.2016
NL23.11.2016
PL23.11.2016
RO23.11.2016
RS23.11.2016
SE23.11.2016
SK23.11.2016
SM23.11.2016
NO23.02.2017
GR24.02.2017
PT23.03.2017
Former [2017/36]AT23.11.2016
BE23.11.2016
CZ23.11.2016
DK23.11.2016
EE23.11.2016
ES23.11.2016
FI23.11.2016
HR23.11.2016
LT23.11.2016
LV23.11.2016
NL23.11.2016
PL23.11.2016
RO23.11.2016
RS23.11.2016
SE23.11.2016
SK23.11.2016
NO23.02.2017
GR24.02.2017
PT23.03.2017
Former [2017/34]AT23.11.2016
CZ23.11.2016
DK23.11.2016
ES23.11.2016
FI23.11.2016
HR23.11.2016
LT23.11.2016
LV23.11.2016
NL23.11.2016
PL23.11.2016
RS23.11.2016
SE23.11.2016
NO23.02.2017
GR24.02.2017
PT23.03.2017
Former [2017/33]AT23.11.2016
DK23.11.2016
ES23.11.2016
FI23.11.2016
HR23.11.2016
LT23.11.2016
LV23.11.2016
NL23.11.2016
PL23.11.2016
RS23.11.2016
SE23.11.2016
NO23.02.2017
GR24.02.2017
PT23.03.2017
Former [2017/26]AT23.11.2016
ES23.11.2016
FI23.11.2016
HR23.11.2016
LT23.11.2016
LV23.11.2016
NL23.11.2016
PL23.11.2016
RS23.11.2016
SE23.11.2016
NO23.02.2017
GR24.02.2017
PT23.03.2017
Former [2017/12]LV23.11.2016
Documents cited:Search[IY]EP1400276  (DEUTSCH ZENTR LUFT & RAUMFAHRT [DE]) [I] 1-30 * paragraph [0040]; figure 1; claim 1 * [Y] 1-30;
 [Y]WO2009002191  (TOENSETH ERIK [NO]) [Y] 1-30 * page 4, line 17 - line 19; figures 1-3; claims 1,11 * * page 4, line 22 - line 35 * * page 6, line 33 - page 7, line 21 * * page 10, line 34 - line 37 *
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