blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Release notes
European Patent Register Assistant
European Patent Register Resource Book
European Patent Register – pocket guide
FAQ - European Patent Register
Federated Register (Flyer)
Global Dossier (Flyer)
Register events
Deep link coverage
Federated Register content
The Patent Information Tour
Fair use charter

Extract from the Register of European Patents

EP About this file: EP3042391

EP3042391 - METHOD FOR PRODUCING A SUBSTRATE, SUBSTRATE, METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR WITH A SUBSTRATE, MICRO-ELECTROMECHANICAL SYSTEM WITH A SUBSTRATE, AND MOTOR VEHICLE [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  03.07.2020
Database last updated on 28.09.2024
Most recent event   Tooltip03.07.2020Withdrawal of applicationpublished on 05.08.2020  [2020/32]
Applicant(s)For all designated states
Robert Bosch GmbH
Postfach 30 02 20
70442 Stuttgart / DE
[2020/18]
Former [2016/28]For all designated states
Robert Bosch GmbH
Postfach 30 02 20
70442 Stuttgart / DE
Inventor(s)01 / TRAUTMANN, Achim
Stuttgarter Strasse 12
71229 Leonberg / DE
02 / BANZHAF, Christian Tobias
Bleichwiese 21
89150 Laichingen / DE
 [2016/28]
Application number, filing date14747945.507.08.2014
[2016/28]
WO2014EP66951
Priority number, dateDE20131021776805.09.2013         Original published format: DE102013217768
[2016/28]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report
No.:WO2015032577
Date:12.03.2015
Language:DE
[2015/10]
Type: A1 Application with search report 
No.:EP3042391
Date:13.07.2016
Language:DE
The application published by WIPO in one of the EPO official languages on 12.03.2015 takes the place of the publication of the European patent application.
[2016/28]
Search report(s)International search report - published on:EP12.03.2015
ClassificationIPC:H01L21/308, H01L29/16, H01L29/66, H01L29/78, B81B1/00, B81C1/00, H01L29/423
[2020/30]
CPC:
H01L29/7813 (EP,US); H01L21/3083 (EP,US); H01L29/045 (US);
H01L29/1095 (US); H01L29/1608 (EP,US); H01L29/4236 (EP,US);
H01L29/66068 (EP,US) (-)
Former IPC [2016/28]H01L21/308, H01L29/16, H01L29/66, H01L29/78, B81B1/00, B81C1/00
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2016/28]
TitleGerman:VERFAHREN ZUR HERSTELLUNG EINES SUBSTRATS, SUBSTRAT, METALL-OXID-HALBLEITER-FELDEFFEKTTRANSISTOR MIT EINEM SUBSTRAT, MIKROELEKTROMECHANISCHES SYSTEM MIT EINEM SUBSTRAT, UND KRAFTFAHRZEUG[2016/28]
English:METHOD FOR PRODUCING A SUBSTRATE, SUBSTRATE, METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR WITH A SUBSTRATE, MICRO-ELECTROMECHANICAL SYSTEM WITH A SUBSTRATE, AND MOTOR VEHICLE[2016/28]
French:PROCÉDÉ PERMETTANT DE PRODUIRE UN SUBSTRAT, SUBSTRAT, TRANSISTOR À EFFET DE CHAMP MÉTAL-OXYDE-SEMI-CONDUCTEUR POURVU D'UN SUBSTRAT, SYSTÈME MICROÉLECTROMÉCANIQUE POURVU D'UN SUBSTRAT, ET VÉHICULE AUTOMOBILE[2016/28]
Entry into regional phase05.04.2016National basic fee paid 
05.04.2016Designation fee(s) paid 
05.04.2016Examination fee paid 
Examination procedure05.04.2016Examination requested  [2016/28]
09.05.2016Amendment by applicant (claims and/or description)
30.06.2020Application withdrawn by applicant  [2020/32]
Fees paidRenewal fee
31.08.2016Renewal fee patent year 03
31.08.2017Renewal fee patent year 04
31.08.2018Renewal fee patent year 05
02.09.2019Renewal fee patent year 06
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search[XI]US2009272982  (NAKAMURA SHUN-ICHI [JP], et al) [X] 1,2,4-8 * paragraphs [0058] - [0063] - [0066] , [0181] - [0184]; figures 48,49 * * paragraph [0135]; figures 37,67 * [I] 3,10;
 [X]EP2258655  (ACREO AB [SE]) [X] 9 * paragraphs [0027] - [0033]; figure 6 *;
 [XP]WO2014010006  (HITACHI LTD [JP], et al) [XP] 1,2,6-8 * paragraphs [0055] - [0058]; figures 25-30 *
 [I]  - LAURA J. EVANS ET AL, "Deep Reactive Ion Etching (DRIE) of High Aspect Ratio SiC Microstructures Using a Time-Multiplexed Etch-Passivate Process", MATERIALS SCIENCE FORUM, (20061015), vol. 527-529, doi:10.4028/www.scientific.net/MSF.527-529.1115, pages 1115 - 1118, XP055142896 [I] 9 * page 1115 *

DOI:   http://dx.doi.org/10.4028/www.scientific.net/MSF.527-529.1115
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.