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Extract from the Register of European Patents

EP About this file: EP2896994

EP2896994 - A pellicle for EUV, and an assembly including the pellicle, and a method for assembling the same [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  06.05.2022
Database last updated on 15.06.2024
FormerThe patent has been granted
Status updated on  28.05.2021
FormerGrant of patent is intended
Status updated on  08.04.2021
Most recent event   Tooltip14.06.2024Lapse of the patent in a contracting state
New state(s): TR		published on 17.07.2024 [2024/29]
Applicant(s)For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Ohtemachi 2-chome Chiyoda-ku
Tokyo 100-0004 / JP
[2015/30]
Inventor(s)01 / Motoyuki, Yamada
c/o SHIN-ETSU CHEMICAL CO., LTD.
Advanced Functional Materials Research Center
2-13-1 Isobe
Annaka-shi Gunma / JP
02 / Shoji, Akiyama
c/o SHIN-ETSU CHEMICAL CO., LTD.
Advanced Functional Materials Research Center
2-13-1 Isobe
Annaka-shi Gunma / JP
 [2015/30]
Representative(s)TBK
Bavariaring 4-6
80336 München / DE
[2015/30]
Application number, filing date15151391.816.01.2015
[2015/30]
Priority number, dateJP2014000764120.01.2014         Original published format: JP 2014007641
JP2014025510217.12.2014         Original published format: JP 2014255102
[2015/30]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP2896994
Date:22.07.2015
Language:EN
[2015/30]
Type: B1 Patent specification 
No.:EP2896994
Date:30.06.2021
Language:EN
[2021/26]
Search report(s)(Supplementary) European search report - dispatched on:EP05.06.2015
ClassificationIPC:G03F1/00, G03F1/62, G03F1/64, G03F1/24
[2015/30]
CPC:
G03F1/24 (EP,CN,US); G03F1/62 (EP,CN,KR,US); G03F1/64 (EP,CN,US)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2015/30]
TitleGerman:EUV Pellikel und Anordnung einschliesslich dieses Pellikels sowie Montageverfahren hierfür[2021/16]
English:A pellicle for EUV, and an assembly including the pellicle, and a method for assembling the same[2015/30]
French:Pellicule pour ultraviolets extrêmes, ensemble comprenant la pellicule et son procédé d'assemblage[2015/30]
Former [2015/30]EUV Pellikel und Anordnung einschließlich dieses Pellikels sowie Montageverfahren hierfür
Examination procedure14.12.2015Amendment by applicant (claims and/or description)
14.12.2015Examination requested  [2016/03]
09.04.2021Communication of intention to grant the patent
21.05.2021Fee for grant paid
21.05.2021Fee for publishing/printing paid
21.05.2021Receipt of the translation of the claim(s)
Opposition(s)31.03.2022No opposition filed within time limit [2022/23]
Fees paidRenewal fee
11.01.2017Renewal fee patent year 03
15.01.2018Renewal fee patent year 04
15.01.2019Renewal fee patent year 05
14.01.2020Renewal fee patent year 06
13.01.2021Renewal fee patent year 07
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU16.01.2015
AL30.06.2021
AT30.06.2021
CY30.06.2021
CZ30.06.2021
DK30.06.2021
EE30.06.2021
ES30.06.2021
FI30.06.2021
HR30.06.2021
LT30.06.2021
LV30.06.2021
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MK30.06.2021
PL30.06.2021
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SK30.06.2021
SM30.06.2021
TR30.06.2021
BG30.09.2021
NO30.09.2021
GR01.10.2021
IS30.10.2021
PT02.11.2021
GB16.01.2022
IE16.01.2022
LU16.01.2022
BE31.01.2022
CH31.01.2022
LI31.01.2022
[2024/29]
Former [2024/22]HU16.01.2015
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GB16.01.2022
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BE31.01.2022
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PT02.11.2021
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BE31.01.2022
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PT02.11.2021
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Documents cited:Search[XP]WO2014154452  (ASML NETHERLANDS BV [NL]) [XP] 1,3,4,6,7 * figures 3, 4, 5, 6a, 6b, 7 * * claims 11, 13, 22, 23 * * paragraph [0013] - paragraph [0017] * * paragraph [0102] - paragraph [0119] * * paragraph [0133] - paragraph [0137] *;
 [A]EP2477072  (SHINETSU CHEMICAL CO [JP]) [A] 1-7 * the whole document *;
 [A]EP2124102  (SHINETSU CHEMICAL CO [JP]) [A] 1-7 * the whole document *
 [X]  - KI-HO KO ET AL, "Effect of extreme-ultraviolet pellicle support to patterned mask", PROCEEDINGS OF SPIE, (20120313), vol. 8322, doi:10.1117/12.918019, ISSN 0277-786X, pages 1 - 8, XP055191178 [X] 1 * the whole document *

DOI:   http://dx.doi.org/10.1117/12.918019
 [X]  - SHROFF YASHESH ET AL, "High transmission pellicles for extreme ultraviolet lithography reticle protection", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AVS / AIP, MELVILLE, NEW YORK, NY, US, (20101130), vol. 28, no. 6, doi:10.1116/1.3505126, ISSN 1071-1023, pages 1 - 6, XP012144344 [X] 1 * the whole document *

DOI:   http://dx.doi.org/10.1116/1.3505126
by applicantUS6623893
 JP2010256434
    - SHROFF ET AL., "EUV pellicle Development for Mask Defect Control", EMERGING LITHOGRAPHIC TECHNOLOGIES X, PROC OF SPIE, (2006), vol. 6151, pages 1 - 10
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.