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Extract from the Register of European Patents

EP About this file: EP3176194

EP3176194 - COMPOSITION FOR FORMING RESIN THIN FILM FOR HYDROFLUORIC ACID ETCHING AND RESIN THIN FILM FOR HYDROFLUORIC ACID ETCHING [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  24.05.2019
Database last updated on 15.06.2024
FormerGrant of patent is intended
Status updated on  22.08.2018
FormerExamination is in progress
Status updated on  23.02.2018
FormerRequest for examination was made
Status updated on  15.06.2017
FormerThe international publication has been made
Status updated on  07.02.2017
Most recent event   Tooltip24.05.2019Application deemed to be withdrawnpublished on 26.06.2019  [2019/26]
Applicant(s)For all designated states
Nissan Chemical Corporation
5-1, Nihonbashi 2-chome
Chuo-ku
Tokyo / JP
[2018/38]
Former [2017/23]For all designated states
Nissan Chemical Industries, Ltd.
7-1 Kanda-Nishiki-cho 3-chome Chiyoda-ku
Tokyo 101-0054 / JP
Inventor(s)01 / SATO, Tetsuo
c/o Materials Research Laboratories
NISSANCHEMICAL INDUSTRIES LTD.
488-6 Suzumi-cho
Funabashi-shi Chiba 274-0052 / JP
 [2017/23]
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[2017/23]
Application number, filing date15828114.730.07.2015
[2017/23]
WO2015JP71663
Priority number, dateJP2014015523830.07.2014         Original published format: JP 2014155238
[2017/23]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2016017762
Date:04.02.2016
Language:JA
[2016/05]
Type: A1 Application with search report 
No.:EP3176194
Date:07.06.2017
Language:EN
[2017/23]
Search report(s)International search report - published on:JP04.02.2016
(Supplementary) European search report - dispatched on:EP06.02.2018
ClassificationIPC:C08L9/00, C09D109/00, C08F299/06, C03C15/00, C08F290/06, C09K13/08, G03F7/027, C09D133/08, C09D133/10, C08F290/04, C09D151/00, G03F7/038, G03F7/039, G03F7/16, G03F7/20, G03F7/32, G03F7/40
[2018/35]
CPC:
C08F290/048 (EP,US); C09D109/00 (EP,KR,US); C09D151/003 (US);
C03C15/00 (EP,US); C08L9/00 (EP,US); C09D133/08 (EP,US);
C09D133/10 (EP,US); C09D151/00 (EP,US); C09K13/08 (EP,KR,US);
G03F7/027 (EP,US); G03F7/038 (US); G03F7/039 (US);
G03F7/11 (KR); G03F7/16 (US); G03F7/168 (US);
G03F7/20 (US); G03F7/26 (KR); G03F7/32 (US);
G03F7/40 (US) (-)
C-Set:
C08F290/048, C08F220/10 (EP,US);
C08F290/048, C08F222/10 (US,EP)
Former IPC [2018/10]C08L9/00, C09D109/00, C08F299/06, C03C15/00, C08F290/06, C09K13/08, G03F7/027, C09D133/08, C09D133/10
Former IPC [2017/23]C08F299/06, C03C15/00, C08F290/06, C09D109/00, C09K13/08, G03F7/027
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2017/23]
TitleGerman:ZUSAMMENSETZUNG ZUR BILDUNG EINER HARZDÜNNSCHICHT FÜR FLUORWASSERSTOFFSÄUREÄTZEN UND HARZDÜNNSCHICHT FÜR FLUORWASSERSTOFFSÄUREÄTZEN[2017/23]
English:COMPOSITION FOR FORMING RESIN THIN FILM FOR HYDROFLUORIC ACID ETCHING AND RESIN THIN FILM FOR HYDROFLUORIC ACID ETCHING[2017/23]
French:COMPOSITION POUR LA FORMATION D'UN FILM MINCE DE RÉSINE POUR LA GRAVURE À L'ACIDE FLUORHYDRIQUE ET FILM MINCE DE RÉSINE POUR LA GRAVURE À L'ACIDE FLUORHYDRIQUE[2017/23]
Entry into regional phase06.02.2017Translation filed 
06.02.2017National basic fee paid 
06.02.2017Search fee paid 
06.02.2017Designation fee(s) paid 
06.02.2017Examination fee paid 
Examination procedure06.02.2017Examination requested  [2017/23]
06.02.2017Date on which the examining division has become responsible
22.02.2018Despatch of a communication from the examining division (Time limit: M04)
29.06.2018Reply to a communication from the examining division
23.08.2018Communication of intention to grant the patent
03.01.2019Application deemed to be withdrawn, date of legal effect  [2019/26]
08.02.2019Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time  [2019/26]
Fees paidRenewal fee
20.07.2017Renewal fee patent year 03
24.07.2018Renewal fee patent year 04
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Documents cited:Search[X]US5135984  (KINOSADA MASAJI [JP], et al) [X] 1-3 * column 5, lines 55-65; examples 1-3; claims 1-3 *;
 [X]JPH0718118  (MATSUSHITA ELECTRIC WORKS LTD) [X] 1-3 * abstract *;
 [X]WO2012014682  (DENKI KAGAKU KOGYO KK [JP], et al) [X] 1-3 * abstract *;
 [X]JP2013181146  (DENKI KAGAKU KOGYO KK) [X] 1-3 * abstract *;
 [X]US6664318  (BYMARK RICHARD M [US], et al) [X] 1,2 * examples 21-25; table 2 *;
 [X]EP2395596  (THREE BOND CO LTD [JP]) [X] 1,2 * paragraph [0072]; examples 12-16 *;
 [A]EP0874027  (OJI PAPER CO [JP]) [A] 1-4 * examples 25,31,34,40,53,56, *;
 [A]EP0153520  (THIOKOL MORTON INC [US]) [A] 1-4 * examples 2,3,5,6 *;
 [A]JP2005019590  (OKI DATA KK, et al) [A] 1-4 * abstract *;
 [A]JPH098013  (SHOWA DENKO KK) [A] 1-4 * abstract *
International search[A]JP2011140624  (NIPPON KAYAKU KK) [A] 1-4 * , claims 1 to 8; paragraph [0116]; paragraphs [0124] to [0149], comparative examples 1-3, 3-3 (Family: none) *;
 [A]JPS55142333  (JAPAN SYNTHETIC RUBBER CO LTD) [A] 1-4 * , page 4, lower right column, line 2 to page 5, upper left column, line 9, example 2 & US 4294908 A & GB 2049211 A & DE 3014261 A & FR 2455304 A *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.