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Extract from the Register of European Patents

EP About this file: EP3179308

EP3179308 - UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMING METHOD [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  25.02.2022
Database last updated on 03.10.2024
FormerThe patent has been granted
Status updated on  19.03.2021
FormerGrant of patent is intended
Status updated on  06.12.2020
FormerExamination is in progress
Status updated on  03.06.2020
FormerRequest for examination was made
Status updated on  12.05.2017
FormerThe international publication has been made
Status updated on  01.02.2017
Most recent event   Tooltip06.09.2024Lapse of the patent in a contracting state
New state(s): MT		published on 09.10.2024 [2024/41]
Applicant(s)For all designated states
Mitsubishi Gas Chemical Company, Inc.
5-2, Marunouchi 2-chome Chiyoda-ku
Tokyo 100-8324 / JP
[2017/24]
Inventor(s)01 / OKADA, Kana
c/o Mitsubishi Gas Chemical Company Inc.
Hiratsuka Research Laboratory
6-2 Higashiyawata 5-chome
Hiratsuka-shi Kanagawa 254-0016 / JP
02 / MAKINOSHIMA, Takashi
c/o Mitsubishi Gas Chemical Company Inc.
Hiratsuka Research Laboratory
6-2 Higashiyawata 5-chome
Hiratsuka-shi Kanagawa 254-0016 / JP
03 / ECHIGO, Masatoshi
c/o Mitsubishi Gas Chemical Company Inc.
Hiratsuka Research Laboratory
6-2 Higashiyawata 5-chome
Hiratsuka-shi Kanagawa 254-0016 / JP
04 / HIGASHIHARA, Go
c/o Mitsubishi Gas Chemical Company Inc.
Mizushima Plant
3-10 Mizushima Kaigandori
Kurashiki-shi Okayama 712-8525 / JP
05 / OKOSHI, Atsushi
c/o Mitsubishi Gas Chemical Company Inc.
Mizushima Plant
3-10 Mizushima Kaigandori
Kurashiki-shi Okayama 712-8525 / JP
 [2017/24]
Representative(s)Müller-Boré & Partner Patentanwälte PartG mbB
Friedenheimer Brücke 21
80639 München / DE
[2017/24]
Application number, filing date15829358.931.07.2015
[2017/24]
WO2015JP71855
Priority number, dateJP2014016253508.08.2014         Original published format: JP 2014162535
[2017/24]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2016021511
Date:11.02.2016
Language:JA
[2016/06]
Type: A1 Application with search report 
No.:EP3179308
Date:14.06.2017
Language:EN
[2017/24]
Type: B1 Patent specification 
No.:EP3179308
Date:21.04.2021
Language:EN
[2021/16]
Search report(s)International search report - published on:JP11.02.2016
(Supplementary) European search report - dispatched on:EP20.03.2018
ClassificationIPC:G03F7/11, C07C261/02, G03F7/004, G03F7/26, H01L21/027
[2017/24]
CPC:
G03F7/0752 (EP,US); G03F7/11 (US); C07C261/02 (EP,US);
C09D179/04 (US); C09D7/20 (EP,US); G03F7/0045 (US);
G03F7/0046 (US); G03F7/0392 (US); G03F7/091 (EP,US);
G03F7/094 (EP,US); G03F7/162 (US); G03F7/168 (US);
G03F7/2037 (US); G03F7/322 (US); G03F7/38 (US);
H01L21/027 (EP,US); H01L21/0274 (US); H01L21/3081 (US);
H01L21/3086 (US); H01L21/31116 (US); H01L21/31144 (US);
G03F7/0397 (EP,US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2017/24]
Extension statesBANot yet paid
MENot yet paid
Validation statesMANot yet paid
TitleGerman:UNTERSCHICHTFILMBILDENDE ZUSAMMENSETZUNG FÜR LITHOGRAFIE, UNTERSCHICHTFILM FÜR LITHOGRAFIE UND VERFAHREN ZUR STRUKTURFORMUNG[2017/24]
English:UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMING METHOD[2017/24]
French:COMPOSITION POUR FORMATION DE FILM SOUS-COUCHE POUR LITHOGRAPHIE, FILM SOUS-COUCHE POUR LITHOGRAPHIE, ET PROCÉDÉ DE FORMATION DE MOTIF[2017/24]
Entry into regional phase25.01.2017Translation filed 
02.02.2017National basic fee paid 
02.02.2017Search fee paid 
02.02.2017Designation fee(s) paid 
02.02.2017Examination fee paid 
Examination procedure25.01.2017Date on which the examining division has become responsible
02.02.2017Examination requested  [2017/24]
24.08.2018Amendment by applicant (claims and/or description)
08.06.2020Despatch of a communication from the examining division (Time limit: M04)
15.09.2020Reply to a communication from the examining division
07.12.2020Communication of intention to grant the patent
11.03.2021Fee for grant paid
11.03.2021Fee for publishing/printing paid
11.03.2021Receipt of the translation of the claim(s)
Opposition(s)24.01.2022No opposition filed within time limit [2022/13]
Fees paidRenewal fee
25.07.2017Renewal fee patent year 03
23.07.2018Renewal fee patent year 04
26.07.2019Renewal fee patent year 05
14.07.2020Renewal fee patent year 06
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU31.07.2015
AL21.04.2021
AT21.04.2021
CY21.04.2021
CZ21.04.2021
DK21.04.2021
EE21.04.2021
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[2024/41]
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Documents cited:Search[X]EP1566377  (MITSUBISHI GAS CHEMICAL CO [JP]) [X] 1 * paragraphs [0044] - [0046]; examples A,B; claims 1-9 *;
 [X]JP2006193607  (MITSUBISHI GAS CHEMICAL CO) [X] 1 * paragraphs [0008] - [0016]; examples 1-3; claim 1 *;
 [X]US2009017316  (KATO YOSHIHIRO [JP], et al) [X] 1 * paragraphs [0011] , [0012] , [0017] - [0031]; claims 1-4 *;
 [X]EP2219076  (MITSUBISHI GAS CHEMICAL CO [JP]) [X] 1-12* paragraphs [0076] , [0118] , [0140] - [0144]; examples 1-15; claims 1-17 *;
 [E]EP3267256  (MITSUBISHI GAS CHEMICAL CO [JP]) [E] 1-12 * paragraph [0062] - paragraph [0080]; claims 1-13 *;
 [E]EP3282319  (MITSUBISHI GAS CHEMICAL CO [JP]) [E] 1-12 * paragraphs [0075] - [0084] - [0129] , [0134]; examples 1-4; claims 1-12 *
International search[A]JP2006193607  (MITSUBISHI GAS CHEMICAL CO) [A] 1-12 * , entire text & KR 10-2006-0082822 A & CN 1803916 A & TW 1391446 B *;
 [XY]WO2009072465  (MITSUBISHI GAS CHEMICAL CO [JP], et al) [X] 1-2, 5, 8-12 * , example 20; paragraphs [0133] to [0134], [0179] & US 2010/0316950 A1 example 20; paragraphs [0139] to [0140], [0186] & JP 5370158 B & EP 2219076 A1 & KR 10-2010-0095563 A & CN 101889247 A & KR 10-2010-0107441 A & TW 200936623 A & CN 103145543 A * [Y] 12;
 [A]JP2010189470  (HITACHI CHEMICAL CO LTD) [A] 1-12* , entire text (Family: none) *;
 [A]JP2012212051  (TOYO INK SC HOLDINGS CO LTD) [A] 1-12 * , entire text (Family: none) *;
 [XY]WO2013036027  (DONGJIN SEMICHEM CO LTD [KR], et al) [X] 1-11 * , paragraphs [34], [148] to [151]; tables 1, 2; example 1; formulae 1, 1d & US 2014/0227887 A1 paragraphs [0015], [0041] to [0044]; tables 1, 2; example 1; formulae 1, 1d & KR 10-2013-0026761 A & CN 103781816 A & TW 201319756 A * [Y] 12
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.