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Extract from the Register of European Patents

EP About this file: EP3365911

EP3365911 - APPARATUS AND METHOD FOR LOADING A SUBSTRATE INTO A VACUUM PROCESSING MODULE, APPARATUS AND METHOD FOR TREATMENT OF A SUBSTRATE FOR A VACUUM DEPOSITION PROCESS IN A VACUUM PROCESSING MODULE, AND SYSTEM FOR VACUUM PROCESSING OF A SUBSTRATE [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  09.10.2020
Database last updated on 13.09.2024
FormerRequest for examination was made
Status updated on  27.07.2018
FormerThe international publication has been made
Status updated on  05.05.2017
Most recent event   Tooltip09.10.2020Application deemed to be withdrawnpublished on 11.11.2020  [2020/46]
Applicant(s)For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, CA 95054 / US
[2018/35]
Inventor(s)01 / WHITE, John M.
28530 Hayward Blvd.
Hayward, California 94542 / US
 [2018/35]
Representative(s)Zimmermann & Partner Patentanwälte mbB
Postfach 330 920
80069 München / DE
[2018/35]
Application number, filing date16860416.328.04.2016
[2018/35]
WO2016US29721
Priority number, dateUS201562246095P25.10.2015         Original published format: US 201562246095 P
US201562246401P26.10.2015         Original published format: US 201562246401 P
US201562252900P09.11.2015         Original published format: US 201562252900 P
[2018/35]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2017074503
Date:04.05.2017
Language:EN
[2017/18]
Type: A1 Application with search report 
No.:EP3365911
Date:29.08.2018
Language:EN
The application published by WIPO in one of the EPO official languages on 04.05.2017 takes the place of the publication of the European patent application.
[2018/35]
Search report(s)International search report - published on:KR04.05.2017
(Supplementary) European search report - dispatched on:EP20.08.2019
ClassificationIPC:H01L21/683, C23C14/56, C23C16/54
[2019/25]
CPC:
H01J37/3452 (EP,US); C23C14/042 (KR,US); C23C14/24 (US);
C23C14/3407 (US); C23C14/35 (KR,US); C23C14/352 (EP,US);
C23C14/50 (KR,US); C23C14/564 (US); C23C14/566 (EP,US);
C23C14/568 (EP,KR,US); C23C16/54 (EP,US); H01J37/32724 (US);
H01J37/32779 (US); H01J37/3405 (EP,US); H01J37/3411 (US);
H01J37/3417 (US); H01J37/342 (EP,US); H01J37/3423 (EP,US);
H01J37/345 (EP,US); H01L21/67 (US); H01L21/6838 (EP,US);
H01J2237/20278 (US); H01J2237/3321 (US) (-)
Former IPC [2018/35]H01L21/203, H01L21/67
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2018/35]
TitleGerman:VORRICHTUNG UND VERFAHREN ZUM LADEN EINES SUBSTRATS IN EIN VAKUUMVERARBEITUNGSMODUL, VORRICHTUNG UND VERFAHREN ZUR BEHANDLUNG EINES SUBSTRATS FÜR EINEN VAKUUMABSCHEIDUNGSPROZESS IN EINEM VAKUUMVERARBEITUNGSMODUL UND SYSTEM ZUR VAKUUMVERARBEITUNG EINES SUBSTRATS[2018/35]
English:APPARATUS AND METHOD FOR LOADING A SUBSTRATE INTO A VACUUM PROCESSING MODULE, APPARATUS AND METHOD FOR TREATMENT OF A SUBSTRATE FOR A VACUUM DEPOSITION PROCESS IN A VACUUM PROCESSING MODULE, AND SYSTEM FOR VACUUM PROCESSING OF A SUBSTRATE[2018/35]
French:APPAREIL ET PROCÉDÉ DE CHARGEMENT D'UN SUBSTRAT DANS UN MODULE DE TRAITEMENT SOUS VIDE, APPAREIL ET PROCÉDÉ DE TRAITEMENT D'UN SUBSTRAT POUR UN PROCESSUS DE DÉPÔT SOUS VIDE DANS UN MODULE DE TRAITEMENT SOUS VIDE, ET SYSTÈME DE TRAITEMENT SOUS VIDE D'UN SUBSTRAT[2018/35]
Entry into regional phase16.03.2018National basic fee paid 
16.03.2018Search fee paid 
16.03.2018Designation fee(s) paid 
16.03.2018Examination fee paid 
Examination procedure16.03.2018Examination requested  [2018/35]
16.03.2018Date on which the examining division has become responsible
13.11.2018Amendment by applicant (claims and/or description)
03.06.2020Application deemed to be withdrawn, date of legal effect  [2020/46]
26.06.2020Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2020/46]
Fees paidRenewal fee
16.03.2018Renewal fee patent year 03
23.04.2019Renewal fee patent year 04
Penalty fee
Additional fee for renewal fee
30.04.202005   M06   Not yet paid
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Documents cited:Search[XI]US6113698  (RAAIJMAKERS IVO [US], et al) [X] 1,2,5,10,11,15 * col. 4, l. 16-32 col. 8, l. 46-53 col. 10, l. 8-23;; figure 3 * [I] 7;
 [XI]US6585478  (WOOD ERIC R [US], et al) [X] 1,2,10,15 * col. 2, l. 3-32 col. 3, l. 24-59;; figures 2-5 *[I] 7;
 [XI]US2008025835  (LILJEROOS JUHA PAUL [FI]) [X] 1,2,5,10,11,15 * paragraphs [0027] , [0028] , [0033] , [0038] * [I] 7;
 [XI]US2009087932  (KONDOH KEISUKE [JP]) [X] 1,2,5,10,15 * paragraphs [0011] , [0 12] , [0 14] , [0 16] , [0 34] , [0 57]; figures 2,4 * [I] 7,11
International search[A]US2001000759  (DOLEY ALLAN [US], et al) [A] 1-5, 12-15* See abstract, paragraphs [0036], [0037], claim 1 and figure 2. *;
 [A]US6585478  (WOOD ERIC R [US], et al) [A] 1-5, 12-15 * See abstract, column 2, lines 2-62, claim 1 and figures 2, 3. *;
 [X]US2008025835  (LILJEROOS JUHA PAUL [FI]) [X] 1-5, 12-15 * See abstract, paragraphs [0001], [0011], [0012], [0026]-[0030], claims 1, 3 and figure 2A. *;
 [A]US2013108378  (LEE MASAHIRO [JP]) [A] 1-5, 12-15 * See abstract, paragraphs [0039], [0040], claim 4 amd figures 5-7. *;
 [A]JP2015115376  (TOKYO SEIMITSU CO LTD) [A] 1-5, 12-15 * See paragraphs [0045]-[0048], claim 1 and figure 2. *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.