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EP3346336
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EP About this file: EP3346336
| EP3346336 - PHOTOMASK AND METHOD FOR PROVIDING QUALITY ASSURANCE FOR A PHOTOMASK [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 26.01.2024 Database last updated on 14.06.2024 | |
| Former | Grant of patent is intended Status updated on 08.05.2023 | ||
| Former | Examination is in progress Status updated on 22.10.2021 | ||
| Former | Request for examination was made Status updated on 25.01.2019 | ||
| Former | The application has been published Status updated on 08.06.2018 | Most recent event Tooltip | 26.01.2024 | Application deemed to be withdrawn | published on 28.02.2024 [2024/09] | Applicant(s) | For all designated states Bundesrepublik Deutschland, vertreten durch das Bundesministerium für Wirtschaft und Energie dieses vertreten durch den Präsidenten der Physikalisch-Technischen Bundesanstalt Bundesalle 100 38116 Braunschweig / DE | [N/P] |
| Former [2018/28] | For all designated states Bundesrepublik Deutschland, vertr. durch das Bundesministerium f. Wirtschaft und Technologie Dieses vertr. durch den Präsidenten der Physikalisch-Technischen Bundesanstalt Bundesallee 100 38116 Braunschweig / DE | Inventor(s) | 01 /
SOLTWISCH, Victor Gerhart-Hauptmann-Strasse 8 12437 Nuthetal / DE | 02 /
PFLÜGER, Mika Feurigstrasse 17 10827 Berlin / DE | [2018/28] | Representative(s) | Gramm, Lins & Partner Patent- und Rechtsanwälte PartGmbB Frankfurter Straße 3 C 38122 Braunschweig / DE | [N/P] |
| Former [2018/28] | Lins, Martina Gramm, Lins & Partner Patent- und Rechtsanwälte PartGmbB Theodor-Heuss-Strasse 1 38122 Braunschweig / DE | Application number, filing date | 17207075.7 | 13.12.2017 | [2018/28] | Priority number, date | DE201710100273 | 09.01.2017 Original published format: DE102017100273 | [2018/28] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP3346336 | Date: | 11.07.2018 | Language: | DE | [2018/28] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 09.05.2018 | Classification | IPC: | G03F7/20, G02B27/44, G01B11/24, G03F1/38, G03F1/44, G02B5/18, G03F9/00, H01L21/266 | [2018/28] | CPC: |
G02B27/44 (EP);
G03F1/44 (EP);
G03F7/70683 (EP);
G03F9/7019 (EP);
G02B5/1861 (EP)
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2019/09] |
| Former [2018/28] | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR | Extension states | BA | Not yet paid | ME | Not yet paid | Validation states | MA | Not yet paid | MD | Not yet paid | TN | Not yet paid | Title | German: | VERFAHREN ZUR QUALITÄTSSICHERUNG EINER BELICHTUNGSMASKE UND BELICHTUNGSMASKE | [2018/28] | English: | PHOTOMASK AND METHOD FOR PROVIDING QUALITY ASSURANCE FOR A PHOTOMASK | [2018/28] | French: | PROCÉDÉ PERMETTANT D'ASSURER LA QUALITÉ D'UN MASQUE D'EXPOSITION ET MASQUE D'EXPOSITION | [2018/28] | Examination procedure | 11.01.2019 | Amendment by applicant (claims and/or description) | 11.01.2019 | Examination requested [2019/09] | 11.01.2019 | Date on which the examining division has become responsible | 25.10.2021 | Despatch of a communication from the examining division (Time limit: M04) | 22.11.2021 | Reply to a communication from the examining division | 09.05.2023 | Communication of intention to grant the patent | 20.09.2023 | Application deemed to be withdrawn, date of legal effect [2024/09] | 11.10.2023 | Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time [2024/09] | Fees paid | Renewal fee | 13.12.2019 | Renewal fee patent year 03 | 28.12.2020 | Renewal fee patent year 04 | 27.12.2021 | Renewal fee patent year 05 | 23.12.2022 | Renewal fee patent year 06 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XI]WO2010025950 (ASML NETHERLANDS BV [NL], et al) [X] 1,3,5,7-10 * paragraph [0004] - paragraph [0059] * * figures 1,4,6 * [I] 2,4,6,11; | [A]US2013215404 (DEN BOEF ARIE JEFFREY [NL]) [A] 1,9* the whole document * |