blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability
Register Forum

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Release notes
European Patent Register Assistant
European Patent Register Resource Book
European Patent Register – pocket guide
FAQ - European Patent Register
FAQ - Register Alert
Federated Register (Flyer)
Global Dossier (Flyer)
Register events
Deep link coverage
Federated Register content
The Patent Information Tour
Fair use charter

Extract from the Register of European Patents

EP About this file: EP3540761

EP3540761 - POLISHING COMPOSITION AND METHOD FOR POLISHING SILICON WAFER [Right-click to bookmark this link]
Former [2019/38]POLISHING COMPOSITION AND SILICON WAFER POLISHING METHOD
[2021/31]
StatusNo opposition filed within time limit
Status updated on  11.11.2022
Database last updated on 03.09.2024
FormerThe patent has been granted
Status updated on  03.12.2021
FormerGrant of patent is intended
Status updated on  25.07.2021
FormerExamination is in progress
Status updated on  31.07.2020
FormerRequest for examination was made
Status updated on  16.08.2019
FormerThe international publication has been made
Status updated on  18.05.2018
Most recent event   Tooltip14.06.2024Lapse of the patent in a contracting state
New state(s): TR		published on 17.07.2024  [2024/29]
Applicant(s)For all designated states
Fujimi Incorporated
1-1 Chiryo 2-chome
Nishibiwajima-cho
Kiyosu-shi, Aichi 452-8502 / JP
[2019/38]
Inventor(s)01 / AKIZUKI Reiko
c/o FUJIMI INCORPORATED
1-1 Chiryo 2-chome
Nishibiwajima-cho
Kiyosu-shi Aichi 452-8502 / JP
02 / TSUCHIYA Kohsuke
c/o FUJIMI INCORPORATED
1-1 Chiryo 2-chome
Nishibiwajima-cho
Kiyosu-shi Aichi 452-8502 / JP
03 / TANIGUCHI Megumi
c/o FUJIMI INCORPORATED
1-1 Chiryo 2-chome
Nishibiwajima-cho
Kiyosu-shi Aichi 452-8502 / JP
 [2019/38]
Representative(s)Grünecker Patent- und Rechtsanwälte PartG mbB
Leopoldstraße 4
80802 München / DE
[2019/38]
Application number, filing date17869067.306.11.2017
[2019/38]
WO2017JP39983
Priority number, dateJP2016021900409.11.2016         Original published format: JP 2016219004
[2019/38]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2018088371
Date:17.05.2018
Language:JA
[2018/20]
Type: A1 Application with search report 
No.:EP3540761
Date:18.09.2019
Language:EN
[2019/38]
Type: B1 Patent specification 
No.:EP3540761
Date:05.01.2022
Language:EN
[2022/01]
Search report(s)International search report - published on:JP17.05.2018
(Supplementary) European search report - dispatched on:EP18.09.2019
ClassificationIPC:H01L21/304, B24B37/00, C09G1/02, C09K3/14
[2019/38]
CPC:
C09G1/02 (EP,KR); C09K3/14 (EP); C09K3/1409 (EP,KR);
C09K3/1463 (EP); H01L21/304 (EP,KR); H01L21/31051 (KR)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2019/38]
Extension statesBANot yet paid
MENot yet paid
Validation statesMANot yet paid
MDNot yet paid
TitleGerman:POLIERZUSAMMENSETZUNG UND POLIERVERFAHREN FÜR SILICIUMWAFER[2019/38]
English:POLISHING COMPOSITION AND METHOD FOR POLISHING SILICON WAFER[2021/31]
French:COMPOSITION DE POLISSAGE ET PROCÉDÉ DE POLISSAGE DE TRANCHE DE SILICIUM[2019/38]
Former [2019/38]POLISHING COMPOSITION AND SILICON WAFER POLISHING METHOD
Entry into regional phase06.05.2019Translation filed 
06.05.2019National basic fee paid 
06.05.2019Search fee paid 
06.05.2019Designation fee(s) paid 
06.05.2019Examination fee paid 
Examination procedure06.05.2019Examination requested  [2019/38]
21.01.2020Amendment by applicant (claims and/or description)
31.07.2020Despatch of a communication from the examining division (Time limit: M06)
28.10.2020Reply to a communication from the examining division
26.07.2021Communication of intention to grant the patent
28.09.2021Fee for grant paid
28.09.2021Fee for publishing/printing paid
28.09.2021Receipt of the translation of the claim(s)
Opposition(s)06.10.2022No opposition filed within time limit [2022/50]
Fees paidRenewal fee
26.11.2019Renewal fee patent year 03
28.09.2020Renewal fee patent year 04
25.11.2021Renewal fee patent year 05
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU06.11.2017
AL05.01.2022
AT05.01.2022
CY05.01.2022
CZ05.01.2022
DK05.01.2022
EE05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
IT05.01.2022
LT05.01.2022
LV05.01.2022
MC05.01.2022
MK05.01.2022
NL05.01.2022
PL05.01.2022
RO05.01.2022
RS05.01.2022
SE05.01.2022
SI05.01.2022
SK05.01.2022
SM05.01.2022
TR05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
IS05.05.2022
PT05.05.2022
[2024/29]
Former [2024/27]HU06.11.2017
AL05.01.2022
AT05.01.2022
CY05.01.2022
CZ05.01.2022
DK05.01.2022
EE05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
IT05.01.2022
LT05.01.2022
LV05.01.2022
MC05.01.2022
MK05.01.2022
NL05.01.2022
PL05.01.2022
RO05.01.2022
RS05.01.2022
SE05.01.2022
SI05.01.2022
SK05.01.2022
SM05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
IS05.05.2022
PT05.05.2022
Former [2024/21]HU06.11.2017
AL05.01.2022
AT05.01.2022
CY05.01.2022
CZ05.01.2022
DK05.01.2022
EE05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
IT05.01.2022
LT05.01.2022
LV05.01.2022
MC05.01.2022
NL05.01.2022
PL05.01.2022
RO05.01.2022
RS05.01.2022
SE05.01.2022
SI05.01.2022
SK05.01.2022
SM05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
IS05.05.2022
PT05.05.2022
Former [2024/18]HU06.11.2017
AL05.01.2022
AT05.01.2022
CZ05.01.2022
DK05.01.2022
EE05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
IT05.01.2022
LT05.01.2022
LV05.01.2022
MC05.01.2022
NL05.01.2022
PL05.01.2022
RO05.01.2022
RS05.01.2022
SE05.01.2022
SI05.01.2022
SK05.01.2022
SM05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
IS05.05.2022
PT05.05.2022
Former [2023/35]AL05.01.2022
AT05.01.2022
CZ05.01.2022
DK05.01.2022
EE05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
IT05.01.2022
LT05.01.2022
LV05.01.2022
MC05.01.2022
NL05.01.2022
PL05.01.2022
RO05.01.2022
RS05.01.2022
SE05.01.2022
SI05.01.2022
SK05.01.2022
SM05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
IS05.05.2022
PT05.05.2022
Former [2023/31]AL05.01.2022
AT05.01.2022
CZ05.01.2022
DK05.01.2022
EE05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
LT05.01.2022
LV05.01.2022
MC05.01.2022
NL05.01.2022
PL05.01.2022
RO05.01.2022
RS05.01.2022
SE05.01.2022
SI05.01.2022
SK05.01.2022
SM05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
IS05.05.2022
PT05.05.2022
Former [2023/10]AL05.01.2022
AT05.01.2022
CZ05.01.2022
DK05.01.2022
EE05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
LT05.01.2022
LV05.01.2022
NL05.01.2022
PL05.01.2022
RO05.01.2022
RS05.01.2022
SE05.01.2022
SI05.01.2022
SK05.01.2022
SM05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
IS05.05.2022
PT05.05.2022
Former [2023/01]AL05.01.2022
AT05.01.2022
CZ05.01.2022
DK05.01.2022
EE05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
LT05.01.2022
LV05.01.2022
NL05.01.2022
PL05.01.2022
RO05.01.2022
RS05.01.2022
SE05.01.2022
SK05.01.2022
SM05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
IS05.05.2022
PT05.05.2022
Former [2022/49]AT05.01.2022
CZ05.01.2022
DK05.01.2022
EE05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
LT05.01.2022
LV05.01.2022
NL05.01.2022
PL05.01.2022
RO05.01.2022
RS05.01.2022
SE05.01.2022
SK05.01.2022
SM05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
IS05.05.2022
PT05.05.2022
Former [2022/48]AT05.01.2022
CZ05.01.2022
DK05.01.2022
EE05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
LT05.01.2022
LV05.01.2022
NL05.01.2022
PL05.01.2022
RO05.01.2022
RS05.01.2022
SE05.01.2022
SM05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
IS05.05.2022
PT05.05.2022
Former [2022/47]AT05.01.2022
DK05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
LT05.01.2022
LV05.01.2022
NL05.01.2022
PL05.01.2022
RO05.01.2022
RS05.01.2022
SE05.01.2022
SM05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
IS05.05.2022
PT05.05.2022
Former [2022/46]AT05.01.2022
DK05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
LT05.01.2022
LV05.01.2022
NL05.01.2022
PL05.01.2022
RS05.01.2022
SE05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
IS05.05.2022
PT05.05.2022
Former [2022/42]AT05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
LT05.01.2022
LV05.01.2022
NL05.01.2022
PL05.01.2022
RS05.01.2022
SE05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
IS05.05.2022
PT05.05.2022
Former [2022/39]AT05.01.2022
ES05.01.2022
FI05.01.2022
HR05.01.2022
LT05.01.2022
LV05.01.2022
NL05.01.2022
PL05.01.2022
RS05.01.2022
SE05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
PT05.05.2022
Former [2022/36]AT05.01.2022
ES05.01.2022
HR05.01.2022
LT05.01.2022
LV05.01.2022
NL05.01.2022
PL05.01.2022
RS05.01.2022
SE05.01.2022
BG05.04.2022
NO05.04.2022
GR06.04.2022
PT05.05.2022
Former [2022/35]ES05.01.2022
HR05.01.2022
LT05.01.2022
NL05.01.2022
RS05.01.2022
SE05.01.2022
BG05.04.2022
NO05.04.2022
PT05.05.2022
Former [2022/34]ES05.01.2022
LT05.01.2022
NL05.01.2022
NO05.04.2022
PT05.05.2022
Former [2022/33]LT05.01.2022
NL05.01.2022
NO05.04.2022
Former [2022/30]NL05.01.2022
Documents cited:Search[A]US2014302752  (TSUCHIYA KOHSUKE [JP], et al) [A] 1-4* the whole document *;
 [A]US2016194538  (MIZOGUCHI KEISUKE [JP], et al) [A] 1-4 * the whole document *
International search[A]WO2016060113  (KAO CORP [JP]) [A] 1-4 * , paragraphs [0016]-[0039] & CN 107075345 A & TW 201619348 A *;
 [A]WO2016132676  (FUJIMI INC [JP]) [A] 1-4 * , paragraphs [0011]-[0021] & TW 201702347 A *;
 [A]WO2016158324  (FUJIMI INC [JP]) [A] 1-4* , paragraphs [0070]-[0088] & TW 201700707 A *
by applicantJP2001011433
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.