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Extract from the Register of European Patents

EP About this file: EP3419273

EP3419273 - PROFILE ADJUSTMENT METHOD [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  19.01.2024
Database last updated on 03.09.2024
FormerThe patent has been granted
Status updated on  10.02.2023
FormerGrant of patent is intended
Status updated on  03.11.2022
FormerExamination is in progress
Status updated on  26.02.2021
FormerRequest for examination was made
Status updated on  15.02.2019
FormerThe application has been published
Status updated on  23.11.2018
Most recent event   Tooltip24.05.2024Lapse of the patent in a contracting state
New state(s): IT		published on 26.06.2024  [2024/26]
Applicant(s)For all designated states
Seiko Epson Corporation
1-6, Shinjuku 4-chome
Shinjuku-ku
Tokyo 160-8801 / JP
[2018/52]
Inventor(s)01 / YAMASHITA, Mitsuhiro
c/o Seiko Epson Corporation
3-5 Owa 3-chome
Suwa-shi, Nagano 392-8502 / JP
02 / FUKASAWA, Kenji
c/o Seiko Epson Corporation
3-5 Owa 3-chome
Suwa-shi, Nagano 392-8502 / JP
 [2018/52]
Representative(s)Lewis Silkin LLP
Arbor
255 Blackfriars Road
London SE1 9AX / GB
[N/P]
Former [2018/52]Miller Sturt Kenyon
9 John Street
London WC1N 2ES / GB
Application number, filing date18178687.220.06.2018
[2018/52]
Priority number, dateJP2017012224222.06.2017         Original published format: JP 2017122242
[2018/52]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP3419273
Date:26.12.2018
Language:EN
[2018/52]
Type: B1 Patent specification 
No.:EP3419273
Date:15.03.2023
Language:EN
[2023/11]
Search report(s)(Supplementary) European search report - dispatched on:EP10.10.2018
ClassificationIPC:H04N1/00, H04N1/60
[2018/52]
CPC:
H04N1/6025 (EP,US); G06F3/1203 (CN); G06F3/1242 (CN);
H04N1/00023 (EP,US); H04N1/00087 (EP,US); H04N1/60 (EP,US);
H04N1/6019 (EP,US); H04N1/6036 (EP,US); H04N1/6016 (EP,US);
H04N1/6033 (EP,US); H04N1/6055 (EP,US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2019/12]
Former [2018/52]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
TitleGerman:PROFILANPASSUNGSVERFAHREN[2018/52]
English:PROFILE ADJUSTMENT METHOD[2018/52]
French:PROCÉDÉ DE RÉGLAGE DE PROFIL[2018/52]
Examination procedure07.02.2019Amendment by applicant (claims and/or description)
07.02.2019Examination requested  [2019/12]
07.02.2019Date on which the examining division has become responsible
25.02.2021Despatch of a communication from the examining division (Time limit: M04)
22.06.2021Reply to a communication from the examining division
04.11.2022Communication of intention to grant the patent
30.01.2023Fee for grant paid
30.01.2023Fee for publishing/printing paid
30.01.2023Receipt of the translation of the claim(s)
Opposition(s)18.12.2023No opposition filed within time limit [2024/08]
Fees paidRenewal fee
02.03.2020Renewal fee patent year 03
03.06.2021Renewal fee patent year 04
07.06.2022Renewal fee patent year 05
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT15.03.2023
CZ15.03.2023
DK15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
IT15.03.2023
LT15.03.2023
LV15.03.2023
MC15.03.2023
NL15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SI15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
IE20.06.2023
LU20.06.2023
BE30.06.2023
CH30.06.2023
FR30.06.2023
IS15.07.2023
PT17.07.2023
[2024/26]
Former [2024/24]AT15.03.2023
CZ15.03.2023
DK15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
MC15.03.2023
NL15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SI15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
IE20.06.2023
LU20.06.2023
BE30.06.2023
CH30.06.2023
FR30.06.2023
IS15.07.2023
PT17.07.2023
Former [2024/21]AT15.03.2023
CZ15.03.2023
DK15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
MC15.03.2023
NL15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SI15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
IE20.06.2023
LU20.06.2023
IS15.07.2023
PT17.07.2023
Former [2024/15]AT15.03.2023
CZ15.03.2023
DK15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
MC15.03.2023
NL15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SI15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
LU20.06.2023
IS15.07.2023
PT17.07.2023
Former [2024/10]AT15.03.2023
CZ15.03.2023
DK15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
MC15.03.2023
NL15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SI15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
IS15.07.2023
PT17.07.2023
Former [2024/09]AT15.03.2023
CZ15.03.2023
DK15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
MC15.03.2023
NL15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
IS15.07.2023
PT17.07.2023
Former [2023/50]AT15.03.2023
CZ15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
NL15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
IS15.07.2023
PT17.07.2023
Former [2023/49]AT15.03.2023
CZ15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
NL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
PT17.07.2023
Former [2023/48]AT15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
NL15.03.2023
RS15.03.2023
SE15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
PT17.07.2023
Former [2023/46]ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
NL15.03.2023
RS15.03.2023
SE15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
PT17.07.2023
Former [2023/38]FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
NL15.03.2023
RS15.03.2023
SE15.03.2023
NO15.06.2023
GR16.06.2023
Former [2023/37]FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
RS15.03.2023
SE15.03.2023
NO15.06.2023
GR16.06.2023
Former [2023/36]FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
RS15.03.2023
SE15.03.2023
NO15.06.2023
Former [2023/35]HR15.03.2023
LT15.03.2023
RS15.03.2023
NO15.06.2023
Former [2023/34]LT15.03.2023
RS15.03.2023
Former [2023/33]LT15.03.2023
Documents cited:Search[Y]EP1199883  (SAGAWA PRINTING CO LTD [JP], et al) [Y] 1-12 * abstract * * figure 1 * * claims 1-2,4 * * paragraphs [0011] - [0015] * * paragraphs [0040] , [0041] , [0048] *;
 [YD]JP2006174371  (CANON KK) [YD] 1-12 * abstract * * claims 1-6 ** paragraphs [0005] - [0006] *;
 [Y]US2006170995  (ARIGA NORIMASA [JP]) [Y] 8 * the whole document * * paragraphs [0007] , [0035] , [0038] *;
 [I]US2010110457  (KANEKO CHIAKI [JP]) [I] 1-12 * abstract * * figures 4-5 * * paragraphs [0043] - [0058] * * claims 1,4 *;
 [IY]US2016241745  (OHBA SHIN [JP]) [I] 1,7,11,12 * abstract * * figures 3,5 * * paragraphs [0010] - [0025] * * paragraph [0068] * * paragraphs [0072] - [0073] - [0081] - [0082] * [Y] 2-6,8-10
Examination   - Anonymous, "Image technology colour management - Architecture, profile format, and data structure", International Color Consortium - Specification ICC.1:2010. ICC, (20101231), URL: http://www.color.org/specification/ICC1v43_2010-12.pdf, (20200309), XP055674931
by applicantJP2006174371
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.