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EP3457428
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EP About this file: EP3457428
| EP3457428 - SYNC CONTROLLER FOR HIGH IMPULSE MAGNETRON SPUTTERING, SUBSTRATE PROCESSING SYSTEM AND SYNCING METHOD [Right-click to bookmark this link] | |||
| Former [2019/12] | SYNC CONTROLLER FOR HIGH IMPULSE MAGNETRON SPUTTERING | ||
| [2021/29] | Status | The application is deemed to be withdrawn Status updated on 08.04.2022 Database last updated on 27.07.2024 | |
| Former | Grant of patent is intended Status updated on 21.07.2021 | ||
| Former | Examination is in progress Status updated on 06.11.2020 | ||
| Former | Request for examination was made Status updated on 20.09.2019 | ||
| Former | The application has been published Status updated on 15.02.2019 | Most recent event Tooltip | 08.04.2022 | Application deemed to be withdrawn | published on 11.05.2022 [2022/19] | Applicant(s) | For all designated states Applied Materials, Inc. 3050 Bowers Avenue Santa Clara, CA 95054 / US | [2019/12] | Inventor(s) | 01 /
Babayan, Viachslav 455 Firloch Avenue No. 2 Sunnyvale, CA California 94086 / US | 02 /
Hua, Zhong Qiang 18026 King Court Saratoga, CA California 95070 / US | 03 /
Wu, Menglu 1570 Vista Club Circle, Apt. 204 Santa Clara, CA California 95054 / US | 04 /
Allen, Adolph Miller 4958 Stoneridge Ct. Oakland, CA California 94605 / US | 05 /
Citla, Bhargav 4081 Elisa Cmn Fremont, CA California 94536 / US | [2019/12] | Representative(s) | Zimmermann & Partner Patentanwälte mbB Postfach 330 920 80069 München / DE | [2019/12] | Application number, filing date | 18195501.4 | 19.09.2018 | [2019/12] | Priority number, date | US201762560515P | 19.09.2017 Original published format: US 201762560515 P | US201816043117 | 23.07.2018 Original published format: US201816043117 | [2019/12] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP3457428 | Date: | 20.03.2019 | Language: | EN | [2019/12] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 12.02.2019 | Classification | IPC: | H01J37/34, C23C14/34 | [2019/12] | CPC: |
H01J37/3467 (EP,KR,US);
C23C14/3485 (EP,CN,KR,US);
C23C14/35 (EP,CN,US);
C23C14/3407 (KR);
C23C14/345 (EP,CN,US);
C23C14/54 (CN,KR);
H01J37/3414 (KR)
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| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2019/43] |
| Former [2019/12] | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR | Extension states | BA | Not yet paid | ME | Not yet paid | Validation states | KH | Not yet paid | MA | Not yet paid | MD | Not yet paid | TN | Not yet paid | Title | German: | SYNC-STEUERGERÄT UND SYNC-VERFAHREN FÜR HOCHLEISTUNGSMAGNETRON-SPUTTERING UND SUBSTRAT-BEARBEITUNGSSYSTEM | [2021/29] | English: | SYNC CONTROLLER FOR HIGH IMPULSE MAGNETRON SPUTTERING, SUBSTRATE PROCESSING SYSTEM AND SYNCING METHOD | [2021/29] | French: | CONTRÔLEUR DE SYNCHRONISATION POUR PULVÉRISATION À MAGNÉTRON PAR IMPULSIONS ÉLEVÉES ET MÈTHODE DE SYNCHRONISATION ET SYSTÈME DE TRAITEMENT DE SUBSTRAT | [2021/29] |
| Former [2019/12] | SYNC-STEUERGERÄT FÜR HOCHLEISTUNGSMAGNETRON-SPUTTERING | ||
| Former [2019/12] | SYNC CONTROLLER FOR HIGH IMPULSE MAGNETRON SPUTTERING | ||
| Former [2019/12] | CONTRÔLEUR DE SYNCHRONISATION POUR PULVÉRISATION À MAGNÉTRON PAR IMPULSIONS ÉLEVÉES | Examination procedure | 11.09.2019 | Amendment by applicant (claims and/or description) | 11.09.2019 | Examination requested [2019/43] | 11.09.2019 | Date on which the examining division has become responsible | 10.11.2020 | Despatch of a communication from the examining division (Time limit: M04) | 19.01.2021 | Reply to a communication from the examining division | 22.07.2021 | Communication of intention to grant the patent | 02.12.2021 | Application deemed to be withdrawn, date of legal effect [2022/19] | 23.12.2021 | Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time [2022/19] | Fees paid | Renewal fee | 17.09.2020 | Renewal fee patent year 03 | Penalty fee | Additional fee for renewal fee | 30.09.2021 | 04 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XI]US2008135401 (KADLEC STANISLAV [CZ], et al) [X] 1,8,9 * page 4, paragraph 42 - page 5, paragraph 49; figures 3,9-12 * [I] 2-7,10-13; | [X]WO2009122378 (OC OERLIKON BALZERS AG [LI], et al) [X] 1,8,9 * page 9, paragraph 60 - page 10, paragraph 68; figure 3 *; | [A]US2016340774 (SARAKINOS KONSTANTINOS [SE], et al) [A] 1-13 * paragraph [0096] - paragraph [0097] * * paragraph [0069] - paragraph [0075]; figures 1-3 ** paragraph [0189] * |