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Extract from the Register of European Patents

EP About this file: EP3467875

EP3467875 - PHOTODIODE ARRAY [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  17.05.2024
Database last updated on 06.07.2024
FormerThe patent has been granted
Status updated on  09.06.2023
FormerGrant of patent is intended
Status updated on  01.02.2023
FormerExamination is in progress
Status updated on  09.07.2021
FormerRequest for examination was made
Status updated on  08.03.2019
Most recent event   Tooltip24.05.2024Lapse of the patent in a contracting state
New state(s): IT		published on 26.06.2024  [2024/26]
Applicant(s)For all designated states
SiOnyx, LLC
100 Cummings Center, Suite 243F
Beverly, MA 01915 / US
[2021/50]
Former [2019/15]For all designated states
Hamamatsu Photonics K.K.
1126-1, Ichino-cho
Higashi-ku
Hamamatsu-shi, Shizuoka 435-8558 / JP
Inventor(s)01 / Yamamura, Kazuhisa
c/o HAMAMATSU PHOTONICS K.K.
1126-1, Ichino-cho
Higashi-ku
Hamamatsu-shi
Shizuoka 435-8558 / JP
02 / Sakamoto, Akira
c/o HAMAMATSU PHOTONICS K.K.
1126-1, Ichino-cho
Higashi-ku
Hamamatsu-shi
Shizuoka 435-8558 / JP
03 / Nagano, Terumasa
c/o HAMAMATSU PHOTONICS K.K.
1126-1, Ichino-cho
Higashi-ku
Hamamatsu-shi
Shizuoka 435-8558 / JP
04 / Ishikawa, Yoshitaka
c/o HAMAMATSU PHOTONICS K.K.
1126-1, Ichino-cho
Higashi-ku
Hamamatsu-shi
Shizuoka 435-8558 / JP
05 / Kawai, Satoshi
c/o HAMAMATSU PHOTONICS K.K.
1126-1, Ichino-cho
Higashi-ku
Hamamatsu-shi
Shizuoka 435-8558 / JP
 [2019/15]
Representative(s)Haseltine Lake Kempner LLP
One Portwall Square
Portwall Lane
Bristol BS1 6BH / GB
[2023/28]
Former [2019/15]Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
Application number, filing date18206453.515.02.2010
[2019/15]
Priority number, dateJP2009004107824.02.2009         Original published format: JP 2009041078
JP2009013641905.06.2009         Original published format: JP 2009136419
[2019/15]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP3467875
Date:10.04.2019
Language:EN
[2019/15]
Type: B1 Patent specification 
No.:EP3467875
Date:12.07.2023
Language:EN
[2023/28]
Search report(s)(Supplementary) European search report - dispatched on:EP13.03.2019
ClassificationIPC:H01L27/144, H01L31/10, H01L31/0236, H01L31/107, H01L31/0232, H01L31/0352, H01L27/146, H01L31/103
[2023/08]
CPC:
H01L27/1464 (EP,CN,KR,US); H01L31/0232 (EP,CN,KR,US); H01L27/1462 (EP,CN,KR,US);
H01L27/14625 (EP,KR,US); H01L27/1463 (EP,CN,KR,US); H01L27/14649 (EP,CN,KR,US);
H01L27/14689 (EP,CN,KR,US); H01L31/0236 (CN,KR); H01L31/02363 (EP,US);
H01L31/035281 (EP,CN,KR,US); H01L31/103 (EP,CN,KR,US); H01L31/107 (EP,CN,KR,US);
H01L2224/48091 (EP,CN,US); Y02E10/50 (US) (-)
C-Set:
H01L2224/48091, H01L2924/00014 (CN,EP,US)
Former IPC [2019/15]H01L27/144, H01L31/10, H01L31/0236
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   SM,   TR [2019/15]
TitleGerman:PHOTODIODENARRAY[2019/15]
English:PHOTODIODE ARRAY[2019/15]
French:RÉSEAU DE PHOTODIODES[2019/15]
Examination proceduredeletedDate on which the examining division has become responsible
15.11.2018Examination requested  [2019/15]
07.10.2019Amendment by applicant (claims and/or description)
12.07.2021Despatch of a communication from the examining division (Time limit: M04)
09.11.2021Reply to a communication from the examining division
02.02.2023Communication of intention to grant the patent
02.06.2023Fee for grant paid
02.06.2023Fee for publishing/printing paid
02.06.2023Receipt of the translation of the claim(s)
Parent application(s)   TooltipEP10746106.3  / EP2403013
Opposition(s)15.04.2024No opposition filed within time limit [2024/25]
Fees paidRenewal fee
15.11.2018Renewal fee patent year 03
15.11.2018Renewal fee patent year 04
15.11.2018Renewal fee patent year 05
15.11.2018Renewal fee patent year 06
15.11.2018Renewal fee patent year 07
15.11.2018Renewal fee patent year 08
15.11.2018Renewal fee patent year 09
18.02.2019Renewal fee patent year 10
13.02.2020Renewal fee patent year 11
12.02.2021Renewal fee patent year 12
25.02.2022Renewal fee patent year 13
27.02.2023Renewal fee patent year 14
Opt-out from the exclusive  Tooltip
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT12.07.2023
CZ12.07.2023
DK12.07.2023
EE12.07.2023
ES12.07.2023
FI12.07.2023
HR12.07.2023
IT12.07.2023
LT12.07.2023
LV12.07.2023
NL12.07.2023
PL12.07.2023
RO12.07.2023
SE12.07.2023
SK12.07.2023
SM12.07.2023
NO12.10.2023
GR13.10.2023
IS12.11.2023
PT13.11.2023
[2024/26]
Former [2024/23]AT12.07.2023
CZ12.07.2023
DK12.07.2023
EE12.07.2023
ES12.07.2023
FI12.07.2023
HR12.07.2023
LT12.07.2023
LV12.07.2023
NL12.07.2023
PL12.07.2023
RO12.07.2023
SE12.07.2023
SK12.07.2023
SM12.07.2023
NO12.10.2023
GR13.10.2023
IS12.11.2023
PT13.11.2023
Former [2024/22]AT12.07.2023
CZ12.07.2023
DK12.07.2023
ES12.07.2023
FI12.07.2023
HR12.07.2023
LT12.07.2023
LV12.07.2023
NL12.07.2023
PL12.07.2023
RO12.07.2023
SE12.07.2023
SM12.07.2023
NO12.10.2023
GR13.10.2023
IS12.11.2023
PT13.11.2023
Former [2024/20]AT12.07.2023
ES12.07.2023
FI12.07.2023
HR12.07.2023
LT12.07.2023
LV12.07.2023
NL12.07.2023
PL12.07.2023
SE12.07.2023
SM12.07.2023
NO12.10.2023
GR13.10.2023
IS12.11.2023
PT13.11.2023
Former [2024/10]AT12.07.2023
ES12.07.2023
FI12.07.2023
HR12.07.2023
LT12.07.2023
LV12.07.2023
NL12.07.2023
PL12.07.2023
SE12.07.2023
NO12.10.2023
GR13.10.2023
IS12.11.2023
PT13.11.2023
Former [2024/09]AT12.07.2023
ES12.07.2023
FI12.07.2023
LT12.07.2023
NL12.07.2023
SE12.07.2023
NO12.10.2023
GR13.10.2023
IS12.11.2023
Former [2024/08]LT12.07.2023
NL12.07.2023
NO12.10.2023
GR13.10.2023
Former [2024/05]NL12.07.2023
Documents cited:Search[Y]US4072541  (MEULENBERG JR ANDREW, et al) [Y] 5 * abstract *;
 [Y]US4277793  (WEBB PAUL P) [Y] 1-7 * column 2, line 43 - column 3, line 33; figures 1,3 *;
 [Y]JPS6218075  (AGENCY IND SCIENCE TECHN, et al) [Y] 4 * figures 1,4(B) *;
 [Y]EP0616373  (SEIKO INSTR INC [JP]) [Y] 4 * column 4, line 42 - line 48; figure 38 * * column 38, line 41 - column 40, line 45; figure 46 *;
 [Y]US2001008144  (UEMATSU TSUYOSHI [JP], et al) [Y] 1-7 * paragraph [0110]; figures 39(a)-(f) *;
 [Y]US2005127401  (MAZUR ERIC [US], et al) [Y] 1-7 * paragraph [0054] - paragraph [0064]; figure 3 * * paragraph [0082] - paragraph [0084]; figure 11 *;
 [Y]EP1840967  (HAMAMATSU PHOTONICS KK [JP]) [Y] 1-7 * paragraph [0018] - paragraph [0035]; figures 1-7 *;
 [Y]WO2008004547  (HAMAMATSU PHOTONICS KK [JP], et al) [Y] 1-7 * the whole document *;
 [A]  - MINER G E ET AL, "HIGH VOLUME PROCESSING OF POINT CONTACT SOLAR CELLS", PHOTOVOLTAIC SPECIALISTS CONFERENCE. LAS VEGAS, SEPT. 26 - 30, 1988; [PHOTOVOLTAIC SPECIALISTS CONFERENCE], NEW YORK, IEEE, US, (19880926), vol. 1, pages 518 - 522, XP000166693 [A] 1-7 * the whole document *
by applicantJP2008153311
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.