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Extract from the Register of European Patents

EP About this file: EP3655570

EP3655570 - TRANSFORMING A VALVE METAL LAYER INTO A TEMPLATE COMPRISING A PLURALITY OF SPACED (NANO)CHANNELS AND FORMING SPACED STRUCTURES THEREIN [Right-click to bookmark this link]
StatusExamination is in progress
Status updated on  19.03.2021
Database last updated on 16.09.2024
FormerRequest for examination was made
Status updated on  24.04.2020
FormerThe international publication has been made
Status updated on  26.01.2019
Formerunknown
Status updated on  13.07.2018
Most recent event   Tooltip24.07.2024New entry: Renewal fee paid 
Applicant(s)For all designated states
IMEC VZW
Kapeldreef 75
3001 Leuven / BE
For all designated states
Katholieke Universiteit Leuven
K.U. Leuven R&D
Waaistraat 6
Box 5105
3000 Leuven / BE
[2020/22]
Inventor(s)01 / ZANKOWSKI, Stanislaw Piotr
c/o IMEC VZW
Patent Department
Kapeldreef 75
3001 Heverlee / BE
02 / VEREECKEN, Philippe M.
c/o IMEC VZW
Patent Department
Kapeldreef 75
3001 Leuven / BE
 [2020/22]
Representative(s)Winger
Mouterij 16 bus 101
3190 Boortmeerbeek / BE
[N/P]
Former [2020/22]DenK iP
Leuvensesteenweg 203
3190 Boortmeerbeek / BE
Application number, filing date18735609.210.07.2018
[2020/22]
WO2018EP68683
Priority number, dateEP2017018178218.07.2017         Original published format: EP 17181782
[2020/22]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2019016036
Date:24.01.2019
Language:EN
[2019/04]
Type: A1 Application with search report 
No.:EP3655570
Date:27.05.2020
Language:EN
The application published by WIPO in one of the EPO official languages on 24.01.2019 takes the place of the publication of the European patent application.
[2020/22]
Search report(s)International search report - published on:EP24.01.2019
ClassificationIPC:C25D11/04, C25D11/10, C25D11/12, C23F1/00, C25D1/00, C25D3/12
[2020/22]
CPC:
C25D1/006 (EP,KR,US); C25D11/045 (EP,KR,US); C23F1/00 (EP);
C23F1/20 (US); C23F1/28 (EP,KR,US); C25D1/08 (KR,US);
C25D11/022 (KR,US); C25D11/024 (US); C25D11/10 (EP,KR,US);
C25D11/12 (EP,KR,US); C25D11/18 (US); C25D11/24 (KR,US);
C25D11/34 (EP,KR,US); C25D3/12 (EP,KR,US); C25D9/02 (US);
C25D9/06 (EP,KR,US); H01B1/02 (US); H01B5/002 (US);
H01M4/0404 (US); H01M4/0407 (US); H01M4/0442 (US);
H01M4/045 (US); H01M4/0452 (US); H01M4/0471 (US);
H01M4/661 (EP,KR,US); H01M4/72 (EP,KR); H01M4/80 (EP,KR,US);
H01M8/0232 (EP,KR,US); H01M8/0247 (EP,KR,US); B82Y30/00 (EP,KR,US);
B82Y40/00 (EP,KR,US); C23C2222/20 (EP,KR); H01M4/86 (EP);
H01M4/8605 (KR); Y02E60/10 (EP,KR); Y02E60/50 (EP,KR);
Y02P70/50 (EP,KR) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2020/22]
TitleGerman:UMWANDLUNG EINER VENTILMETALLSCHICHT IN EINE SCHABLONE MIT MEHREREN BEABSTANDETEN (NANO)KANÄLEN UND BILDUNG VON BEABSTANDETEN STRUKTUREN DARIN[2020/22]
English:TRANSFORMING A VALVE METAL LAYER INTO A TEMPLATE COMPRISING A PLURALITY OF SPACED (NANO)CHANNELS AND FORMING SPACED STRUCTURES THEREIN[2020/22]
French:TRANSFORMATION D'UNE COUCHE DE MÉTAL POUR VALVE EN UNE MATRICE COMPRENANT UNE PLURALITÉ DE (NANO)CANAUX ESPACÉS ET FORMATION DE STRUCTURES ESPACÉES DANS CELLE-CI[2020/22]
Entry into regional phase04.02.2020National basic fee paid 
04.02.2020Designation fee(s) paid 
04.02.2020Examination fee paid 
Examination procedure04.02.2020Examination requested  [2020/22]
04.02.2020Date on which the examining division has become responsible
04.09.2020Amendment by applicant (claims and/or description)
22.03.2021Despatch of a communication from the examining division (Time limit: M04)
16.07.2021Reply to a communication from the examining division
21.03.2023Despatch of a communication from the examining division (Time limit: M04)
25.07.2023Reply to a communication from the examining division
Fees paidRenewal fee
22.07.2020Renewal fee patent year 03
20.07.2021Renewal fee patent year 04
21.07.2022Renewal fee patent year 05
20.07.2023Renewal fee patent year 06
23.07.2024Renewal fee patent year 07
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Cited inInternational search[XI]US2009297913  (ZHANG GUIGEN [US], et al);
 [XI]EP2562851  (UERGEN MUSTAFA K [TR], et al);
 [XI]EP2980014  (IMEC VZW [BE], et al);
 [XI]EP3026764  (FUJIFILM CORP [JP])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.