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EP3518268
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EP About this file: EP3518268
| EP3518268 - CHARGED-PARTICLE SOURCE AND METHOD FOR CLEANING A CHARGED-PARTICLE SOURCE USING BACK-SPUTTERING [Right-click to bookmark this link] | Status | The patent has been granted Status updated on 22.08.2024 Database last updated on 02.09.2024 | |
| Former | Grant of patent is intended Status updated on 01.08.2024 | ||
| Former | Examination is in progress Status updated on 30.10.2020 | ||
| Former | Request for examination was made Status updated on 31.01.2020 | ||
| Former | The application has been published Status updated on 28.06.2019 | Most recent event Tooltip | 22.08.2024 | (Expected) grant | published on 25.09.2024 [2024/39] | Applicant(s) | For all designated states IMS Nanofabrication GmbH Wolfholzgasse 20-24 2345 Brunn am Gebirge / AT | [2024/11] |
| Former [2019/31] | For all designated states IMS Nanofabrication GmbH Schreygasse 3 1020 Wien / AT | Inventor(s) | 01 /
Platzgummer, Elmar Strudlhofgasse 17 1090 Wien / AT | 02 /
Capriotti, Mattia Leystraße 127 1200 Vienna / AT | 03 /
Spengler, Christoph Diefenbachgasse 38-7 1150 Wien / AT | [2019/31] | Representative(s) | Patentanwaltskanzlei Matschnig & Forsthuber OG Biberstraße 22 Postfach 36 1010 Wien / AT | [2019/31] | Application number, filing date | 19154110.1 | 29.01.2019 | [2019/31] | Priority number, date | EP20180154140 | 30.01.2018 Original published format: EP 18154140 | [2019/31] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP3518268 | Date: | 31.07.2019 | Language: | EN | [2019/31] | Type: | B1 Patent specification | No.: | EP3518268 | Date: | 25.09.2024 | Language: | EN | [2024/39] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 03.07.2019 | Classification | IPC: | H01J37/063, H01J37/317, H01J37/06, H01J37/08 | [2024/32] | CPC: |
H01J37/08 (EP);
H01J37/073 (KR);
H01J1/304 (KR);
H01J37/06 (EP);
H01J37/063 (EP);
H01J37/3174 (EP,KR);
H01J37/3177 (EP);
H01J2237/022 (EP);
H01J2237/06308 (EP);
H01J2237/06316 (EP)
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| Former IPC [2019/31] | H01J37/06, H01J37/08 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2020/10] |
| Former [2019/31] | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR | Title | German: | LADUNGSTRÄGERQUELLE UND VERFAHREN ZUR REINIGUNG EINER LADUNGSTRÄGERQUELLE MITTELS RÜCKSPUTTERING | [2019/31] | English: | CHARGED-PARTICLE SOURCE AND METHOD FOR CLEANING A CHARGED-PARTICLE SOURCE USING BACK-SPUTTERING | [2019/31] | French: | SOURCE DE PARTICULES CHARGÉES ET PROCÉDÉ DE NETTOYAGE D'UNE SOURCE DE PARTICULES CHARGÉES À L'AIDE DE RÉTROPULVÉRISATION | [2019/31] | Examination procedure | 29.01.2020 | Examination requested [2020/10] | 29.01.2020 | Date on which the examining division has become responsible | 28.10.2020 | Despatch of a communication from the examining division (Time limit: M04) | 14.01.2021 | Reply to a communication from the examining division | 21.09.2023 | Despatch of a communication from the examining division (Time limit: M06) | 18.03.2024 | Reply to a communication from the examining division | 02.08.2024 | Communication of intention to grant the patent | 20.08.2024 | Fee for grant paid | 20.08.2024 | Fee for publishing/printing paid | 20.08.2024 | Receipt of the translation of the claim(s) | Fees paid | Renewal fee | 07.01.2021 | Renewal fee patent year 03 | 26.01.2022 | Renewal fee patent year 04 | 18.01.2023 | Renewal fee patent year 05 | 31.01.2024 | Renewal fee patent year 06 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US2005001178 (PARKER N WILLIAM [US], et al); | [A]JP2007172862 (HITACHI HIGH TECH CORP); | [A]EP2312609 (INTEGRATED CIRCUIT TESTING [DE]); | [A]US8736170 (LIU KUN [US], et al) | by applicant | US6768125 | EP2187427 | EP2363875 | US8222621 | US8378320 | US9053906 | US9653263 | US9799487 |