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Extract from the Register of European Patents

EP About this file: EP3537474

EP3537474 - PHOTORESIST STRIPPER [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  07.06.2024
Database last updated on 13.09.2024
FormerThe patent has been granted
Status updated on  30.06.2023
FormerGrant of patent is intended
Status updated on  08.03.2023
FormerExamination is in progress
Status updated on  12.11.2021
FormerRequest for examination was made
Status updated on  09.08.2019
Most recent event   Tooltip02.08.2024Lapse of the patent in a contracting state
New state(s): SI		published on 04.09.2024  [2024/36]
Applicant(s)For all designated states
Versum Materials US, LLC
8555 S. River Parkway
Tempe, AZ 85284 / US
[2019/37]
Inventor(s)01 / CAO, Yuanmei
13869 Ninebark Ct.
Carmel, IN 46033 / US
02 / PHENIS, Michael T.
16 Lick Creek Drive
Markleville, IN 46056 / US
03 / DALTON, Richard Peters
14902 Warner Trail
Westfield, IN 46074 / US
 [2023/30]
Former [2019/37]01 / CAO, Yuanmei
8555 South River Parkway
Tempe, AZ 85284-2601 / US
02 / PHENIS, Michael T.
8555 South River Parkway
Tempe, AZ 85284-2601 / US
03 / DALTON PETERS, Richard
8555 South River Parkway
Tempe, AZ 85284-2601 / US
Representative(s)Sommer, Andrea
Andrea Sommer
Patentanwälte Partnerschaft mbB
Uhlandstraße 2
80336 München / DE
[N/P]
Former [2019/37]Sommer, Andrea
Andrea Sommer
Patentanwälte PartG mbB
Uhlandstraße 2
80336 München / DE
Application number, filing date19161776.009.03.2019
[2019/37]
Priority number, dateUS20191628680827.02.2019         Original published format: US201916286808
[2020/10]
Former [2019/37]US201862639962P07.03.2018
US20191628680827.02.2019
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP3537474
Date:11.09.2019
Language:EN
[2019/37]
Type: B1 Patent specification 
No.:EP3537474
Date:02.08.2023
Language:EN
[2023/31]
Search report(s)(Supplementary) European search report - dispatched on:EP05.07.2019
ClassificationIPC:H01L21/311, G03F7/42
[2019/37]
CPC:
H01L21/31133 (EP,IL,US); G03F7/42 (IL); G03F7/425 (EP,IL,KR,US);
G03F7/426 (CN); C11D1/72 (KR); C11D3/0073 (KR);
C11D3/30 (KR); C11D3/43 (KR); C11D7/263 (IL,US);
C11D7/3209 (IL,US); C11D7/3218 (IL,US); C11D7/5022 (IL,US);
G03F7/423 (KR); C11D2111/22 (KR,US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2020/16]
Former [2019/37]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
TitleGerman:PHOTOLACKENTFERNER[2019/37]
English:PHOTORESIST STRIPPER[2019/37]
French:DÉCAPANT POUR RÉSINE PHOTOSENSIBLE[2023/12]
Former [2019/37]DÉCAPANT PHOTOSENSIBLE
Examination procedure09.03.2019Examination requested  [2019/37]
09.03.2019Loss of particular rights, legal effect: Priority
22.08.2019Despatch of communication of loss of particular rights: Priority 0001
06.03.2020Amendment by applicant (claims and/or description)
11.11.2021Despatch of a communication from the examining division (Time limit: M04)
13.12.2021Reply to a communication from the examining division
09.03.2023Communication of intention to grant the patent
21.06.2023Fee for grant paid
21.06.2023Fee for publishing/printing paid
21.06.2023Receipt of the translation of the claim(s)
Opposition(s)03.05.2024No opposition filed within time limit [2024/28]
Fees paidRenewal fee
12.03.2021Renewal fee patent year 03
14.01.2022Renewal fee patent year 04
12.01.2023Renewal fee patent year 05
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT02.08.2023
CZ02.08.2023
DK02.08.2023
EE02.08.2023
ES02.08.2023
FI02.08.2023
HR02.08.2023
IT02.08.2023
LT02.08.2023
LV02.08.2023
NL02.08.2023
PL02.08.2023
RO02.08.2023
RS02.08.2023
SE02.08.2023
SI02.08.2023
SK02.08.2023
SM02.08.2023
NO02.11.2023
GR03.11.2023
IS02.12.2023
PT04.12.2023
[2024/36]
Former [2024/26]AT02.08.2023
CZ02.08.2023
DK02.08.2023
EE02.08.2023
ES02.08.2023
FI02.08.2023
HR02.08.2023
IT02.08.2023
LT02.08.2023
LV02.08.2023
NL02.08.2023
PL02.08.2023
RO02.08.2023
RS02.08.2023
SE02.08.2023
SK02.08.2023
SM02.08.2023
NO02.11.2023
GR03.11.2023
IS02.12.2023
PT04.12.2023
Former [2024/23]AT02.08.2023
CZ02.08.2023
DK02.08.2023
EE02.08.2023
ES02.08.2023
FI02.08.2023
HR02.08.2023
LT02.08.2023
LV02.08.2023
NL02.08.2023
PL02.08.2023
RO02.08.2023
RS02.08.2023
SE02.08.2023
SK02.08.2023
SM02.08.2023
NO02.11.2023
GR03.11.2023
IS02.12.2023
PT04.12.2023
Former [2024/22]AT02.08.2023
CZ02.08.2023
DK02.08.2023
FI02.08.2023
HR02.08.2023
LT02.08.2023
LV02.08.2023
NL02.08.2023
PL02.08.2023
RO02.08.2023
RS02.08.2023
SE02.08.2023
SM02.08.2023
NO02.11.2023
GR03.11.2023
IS02.12.2023
PT04.12.2023
Former [2024/20]AT02.08.2023
FI02.08.2023
HR02.08.2023
LT02.08.2023
LV02.08.2023
NL02.08.2023
PL02.08.2023
RS02.08.2023
SE02.08.2023
SM02.08.2023
NO02.11.2023
GR03.11.2023
IS02.12.2023
PT04.12.2023
Former [2024/10]AT02.08.2023
FI02.08.2023
HR02.08.2023
LT02.08.2023
LV02.08.2023
NL02.08.2023
PL02.08.2023
RS02.08.2023
SE02.08.2023
NO02.11.2023
GR03.11.2023
IS02.12.2023
PT04.12.2023
Former [2024/09]AT02.08.2023
FI02.08.2023
LT02.08.2023
NL02.08.2023
SE02.08.2023
NO02.11.2023
GR03.11.2023
IS02.12.2023
Former [2024/08]LT02.08.2023
NL02.08.2023
NO02.11.2023
GR03.11.2023
Documents cited:Search[X]EP0723205  (MITSUBISHI GAS CHEMICAL CO [JP]);
 [I]EP1031884  (MITSUBISHI GAS CHEMICAL CO [JP]);
 [I]EP1619557  (AIR PROD & CHEM [US]);
 [A]US2009036344  (POLLARD KIMBERLY DONA [US], et al);
 [XI]WO2014089908  (ANJI MICROELECTRONICS TECHNOLOGY SHANGHAI CO LTD [CN])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.