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Extract from the Register of European Patents

EP About this file: EP3900018

EP3900018 - PROCESS FOR PRODUCING A SEMICONDUCTOR COMPONENT BASED ON A III-N COMPOUND [Right-click to bookmark this link]
StatusGrant of patent is intended
Status updated on  07.08.2024
Database last updated on 31.08.2024
FormerRequest for examination was made
Status updated on  24.09.2021
FormerThe international publication has been made
Status updated on  02.07.2020
Formerunknown
Status updated on  18.02.2020
Most recent event   Tooltip07.08.2024New entry: Communication of intention to grant a patent 
Applicant(s)For all designated states
Commissariat à l'Energie Atomique et aux Energies Alternatives
Bâtiment "Le Ponant D"
25, rue Leblanc
75015 Paris / FR
[2021/43]
Inventor(s)01 / ROTTNER, Jean
c/o CEA GRENOBLE 17 Rue des Martyrs
38054 GRENOBLE CEDEX 9 / FR
02 / HAAS, Helge
c/o CEA GRENOBLE 17 Rue des Martyrs
38054 GRENOBLE CEDEX 9 / FR
 [2021/43]
Representative(s)Cabinet Beaumont
4, Place Robert Schuman
B.P. 1529
38025 Grenoble Cedex 1 / FR
[2021/43]
Application number, filing date19848875.118.12.2019
[2021/43]
WO2019FR53174
Priority number, dateFR2018007366820.12.2018         Original published format: FR 1873668
[2021/43]
Filing languageFR
Procedural languageFR
PublicationType: A1 Application with search report
No.:WO2020128339
Date:25.06.2020
Language:FR
[2020/26]
Type: A1 Application with search report 
No.:EP3900018
Date:27.10.2021
Language:FR
The application published by WIPO in one of the EPO official languages on 25.06.2020 takes the place of the publication of the European patent application.
[2021/43]
Search report(s)International search report - published on:EP25.06.2020
ClassificationIPC:H01L21/02, H01L21/28, H01L29/78, H01L33/38, H01L29/20, H01L21/285, H01L29/66, H01L33/40
[2021/43]
CPC:
H01L21/0206 (EP,KR,US); H01L29/66666 (EP,KR); H01L33/32 (US);
H01L21/28587 (EP,KR); H01L29/2003 (EP,KR,US); H01L29/66522 (EP);
H01L29/7827 (EP,KR); H01L33/0075 (US); H01L33/0095 (US);
H01L33/38 (EP,KR); H01L33/405 (EP,KR) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2021/43]
TitleGerman:VERFAHREN ZUR HERSTELLUNG EINES HALBLEITERBAUELEMENTS AUF DER BASIS EINER III-N-VERBINDUNG[2021/43]
English:PROCESS FOR PRODUCING A SEMICONDUCTOR COMPONENT BASED ON A III-N COMPOUND[2021/43]
French:PROCEDE DE FABRICATION D'UN COMPOSANT SEMICONDUCTEUR A BASE D'UN COMPOSE III-N[2021/43]
Entry into regional phase21.06.2021National basic fee paid 
21.06.2021Designation fee(s) paid 
21.06.2021Examination fee paid 
Examination procedure21.06.2021Examination requested  [2021/43]
21.06.2021Date on which the examining division has become responsible
23.11.2021Amendment by applicant (claims and/or description)
08.08.2024Communication of intention to grant the patent
Fees paidRenewal fee
30.11.2021Renewal fee patent year 03
21.12.2022Renewal fee patent year 04
28.12.2023Renewal fee patent year 05
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Cited inInternational search[A]US2013161705  (DISNEY DON [US], et al);
 [A]EP2642533  (STANLEY ELECTRIC CO LTD [JP]);
 [XAI]US2016322538  (EINFELDT SVEN [DE], et al)
by applicantFR20180073668
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.