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Extract from the Register of European Patents

EP About this file: EP4037440

EP4037440 - PLASMA GENERATION DEVICE AND PLASMA TREATMENT METHOD [Right-click to bookmark this link]
StatusExamination is in progress
Status updated on  17.05.2024
Database last updated on 02.09.2024
FormerRequest for examination was made
Status updated on  01.07.2022
FormerThe international publication has been made
Status updated on  03.04.2021
Most recent event   Tooltip13.08.2024New entry: Renewal fee paid 
Applicant(s)For all designated states
Fuji Corporation
19, Chausuyama
Yamamachi
Chiryu-shi, Aichi 472-8686 / JP
[2022/31]
Inventor(s)01 / IKEDO, Toshiyuki
c/o FUJI CORPORATION, 19 Chausuyama, Yamamachi
Chiryu-shi, Aichi 472-8686 / JP
02 / IWATA, Takuya
c/o FUJI CORPORATION, 19 Chausuyama, Yamamachi
Chiryu-shi, Aichi 472-8686 / JP
03 / SHIRAKI, Soichi
c/o FUJI CORPORATION, 19 Chausuyama, Yamamachi
Chiryu-shi, Aichi 472-8686 / JP
 [2022/31]
Representative(s)Grünecker Patent- und Rechtsanwälte PartG mbB
Leopoldstraße 4
80802 München / DE
[2022/31]
Application number, filing date19947409.927.09.2019
[2022/31]
WO2019JP38099
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2021059469
Date:01.04.2021
Language:JA
[2021/13]
Type: A1 Application with search report 
No.:EP4037440
Date:03.08.2022
Language:EN
[2022/31]
Search report(s)International search report - published on:JP01.04.2021
(Supplementary) European search report - dispatched on:EP17.10.2022
ClassificationIPC:H05H1/26, H05H1/46
[2022/37]
CPC:
H05H1/466 (EP); H05H1/341 (EP)
Former IPC [2022/31]H05H1/26
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2022/31]
TitleGerman:PLASMAERZEUGUNGSVORRICHTUNG UND PLASMABESTRAHLUNGSVERFAHREN[2022/31]
English:PLASMA GENERATION DEVICE AND PLASMA TREATMENT METHOD[2022/31]
French:DISPOSITIF DE GÉNÉRATION DE PLASMA ET PROCÉDÉ DE TRAITEMENT PAR PLASMA[2022/31]
Entry into regional phase23.03.2022Translation filed 
23.03.2022National basic fee paid 
23.03.2022Search fee paid 
23.03.2022Designation fee(s) paid 
23.03.2022Examination fee paid 
Examination procedure23.03.2022Examination requested  [2022/31]
08.05.2023Amendment by applicant (claims and/or description)
08.05.2023Date on which the examining division has become responsible
17.05.2024Despatch of a communication from the examining division (Time limit: M04)
Fees paidRenewal fee
23.03.2022Renewal fee patent year 03
26.08.2022Renewal fee patent year 04
24.08.2023Renewal fee patent year 05
13.08.2024Renewal fee patent year 06
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]US3830428  (DYOS G) [A] 2-5 * figures 1-3 ** column 2, line 62 - column 4, line 48 *;
 [A]JPS56126981U  (HITACHI SEIKO, LTD.) [A] 1,6 * figures 1,2 * * page 1, line 1 - page 9, line 10 *;
 [A]JPS57165370U  (HITACHI SEIKO, LTD.) [A] 1,6 * figures 2, 3 * * page 1, line 1 - page 12, line 1 *;
 [A]US5220150  (PFENDER EMIL [US], et al) [A] 2-5 * figures 1,2 * * column 2, line 38 - column 4, line 57 *;
 [X]JPH05174994  (ORIGIN ELECTRIC) [X] 1,6 * figures 1-4 * * page 2 - page 4 *;
 [XI]JPH08294779  (KOIKE SANSO KOGYO KK) [X] 2-4 * figures 1-2 * * paragraph [0001] - paragraph [0050] * [I] 5;
 [X]EP1893004  (THERMAL DYNAMICS CORP [US]) [X] 1,6 * figures 1-13 * * paragraph [0014] - paragraph [0032] *;
 [X]JP2010212182  (JAPAN RADIO CO LTD) [X] 1,6 * paragraph [0001] - paragraph [0072] * * figures 1-6 *;
 [A]WO2019180839  (FUJI CORP [JP]) [A] 1,6 * figures 1,3,5 *
International search[Y]JPS56126981U  (HITACHI SEIKO, LTD.) [Y] 1, 6 * , page 8, lines 1-4 (Family: none) *;
 [Y]JPS57165370U  (HITACHI SEIKO, LTD.) [Y] 2-5* , page 7, lines 13-15, page 7, line 18 to page 8, line 4, fig. 2 (Family: none) *;
 [XA]JPH05174994  (ORIGIN ELECTRIC) [X] 1-4 * , examples, fig. 1-2 (Family: none) * [A] 5-6;
 [Y]WO2019180839  (FUJI CORP [JP]) [Y] 1-6 * , paragraphs [0021], [0024], fig. 2-3 (Family: none) *
by applicantWO2015141768
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.