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Extract from the Register of European Patents

EP About this file: EP3928349

EP3928349 - CVD REACTOR WITH MEANS FOR LOCALLY INFLUENCING THE SUSCEPTOR TEMPERATURE [Right-click to bookmark this link]
Former [2021/52]CVD REACTOR HAVING MEANS FOR LOCALLY INFLUENCING THE SUSCEPTOR TEMPERATURE
[2023/35]
StatusThe patent has been granted
Status updated on  16.02.2024
Database last updated on 07.10.2024
FormerGrant of patent is intended
Status updated on  07.09.2023
FormerRequest for examination was made
Status updated on  26.11.2021
FormerThe international publication has been made
Status updated on  28.08.2020
Formerunknown
Status updated on  24.02.2020
Most recent event   Tooltip19.07.2024Lapse of the patent in a contracting state
New state(s): GR, HR, RS		published on 21.08.2024  [2024/34]
Applicant(s)For all designated states
Aixtron SE
Dornkaulstrasse 2
52134 Herzogenrath / DE
[2021/52]
Inventor(s)01 / LAUFFER, Peter Sebald
Rolandstr. 12
52070 Aachen / DE
 [2024/12]
Former [2021/52]01 / LAUFFER, Peter Sebald
52070 Aachen / DE
Representative(s)Grundmann, Dirk, et al
Rieder & Partner mbB
Patentanwälte - Rechtsanwalt
Yale-Allee 26
42329 Wuppertal / DE
[2021/52]
Application number, filing date20704519.610.02.2020
[2021/52]
WO2020EP53289
Priority number, dateDE20191010443321.02.2019         Original published format: DE102019104433
[2021/52]
Filing languageDE
Procedural languageDE
PublicationType: A2 Application without search report
No.:WO2020169385
Date:27.08.2020
Language:DE
[2020/35]
Type: A2 Application without search report 
No.:EP3928349
Date:29.12.2021
Language:DE
The application published by WIPO in one of the EPO official languages on 27.08.2020 takes the place of the publication of the European patent application.
[2021/52]
Type: B1 Patent specification 
No.:EP3928349
Date:20.03.2024
Language:DE
[2024/12]
Search report(s)International search report - published on:EP18.03.2021
ClassificationIPC:H01L21/687, C23C16/458, H01L21/67, C23C16/46, // C23C16/455
[2023/35]
CPC:
H01L21/68764 (EP,KR); C23C16/4586 (EP,KR); C23C16/46 (CN,US);
C23C16/45508 (EP,KR); C23C16/4584 (EP,KR,US); C23C16/466 (EP,KR);
C23C16/52 (CN,US); H01L21/67103 (EP,KR); H01L21/67109 (EP,KR);
H01L21/68771 (EP,KR); H01L21/67248 (EP,KR) (-)
Former IPC [2021/52]H01L21/687, C23C16/46, H01L21/67, C23C16/458
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2021/52]  
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:CVD-REAKTOR MIT MITTELN ZUR LOKALEN BEEINFLUSSUNG DER SUSZEPTORTEMPERATUR[2021/52]
English:CVD REACTOR WITH MEANS FOR LOCALLY INFLUENCING THE SUSCEPTOR TEMPERATURE[2023/35]
French:BÂTI CVD AVEC MOYENS DE MODIFICATION LOCALE DE LA TEMPÉRATURE DU SUPPORT[2023/35]
Former [2021/52]CVD REACTOR HAVING MEANS FOR LOCALLY INFLUENCING THE SUSCEPTOR TEMPERATURE
Former [2021/52]RÉACTEUR DE DÉPÔT CHIMIQUE EN PHASE VAPEUR COMPRENANT DES MOYENS PERMETTANT D'INFLUER LOCALEMENT SUR LA TEMPÉRATURE DU SUSCEPTEUR
Entry into regional phase14.09.2021National basic fee paid 
14.09.2021Designation fee(s) paid 
14.09.2021Examination fee paid 
Examination procedure14.09.2021Examination requested  [2021/52]
14.09.2021Date on which the examining division has become responsible
28.03.2022Amendment by applicant (claims and/or description)
08.09.2023Communication of intention to grant the patent
08.01.2024Fee for grant paid
08.01.2024Fee for publishing/printing paid
08.01.2024Receipt of the translation of the claim(s)
Divisional application(s)EP24151152.6  / EP4328352
Fees paidRenewal fee
14.02.2022Renewal fee patent year 03
16.02.2023Renewal fee patent year 04
13.02.2024Renewal fee patent year 05
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHR20.03.2024
NO20.06.2024
RS20.06.2024
GR21.06.2024
[2024/34]
Former [2024/33]NO20.06.2024
Cited inInternational search[A]US5155336  (GRONET CHRISTIAN M [US], et al);
 [A]US6001183  (GURARY ALEXANDER I [US], et al);
 [A]DE10064942  (AIXTRON AG [DE]);
 [XA]DE102007026348  (AIXTRON AG [DE]);
 [XD]DE102009044276  (AIXTRON AG [DE]);
 [A]US2012003389  (BRIEN DANIEL [DE], et al);
 [AD]US8249436  (ADERHOLD WOLFGANG R [US], et al);
 [A]US2018002830  (YUDOVSKY JOSEPH [US], et al);
 [A]DE102017105947  (AIXTRON SE [DE])
by applicantUS5468299
 DE102005056536
 DE102009043960
 DE102009044276
 US8249436
 DE102011053498
 DE102011055061
 DE102013109155
 DE102014104218
 US2018182635
 DE102017105333
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.