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Extract from the Register of European Patents

EP About this file: EP3987574

EP3987574 - PROCESS FOR PRODUCING NITRIDE TILES EACH INTENDED TO FORM AN ELECTRONIC OR OPTOELECTRONIC DEVICE [Right-click to bookmark this link]
StatusThe patent has been granted
Status updated on  06.10.2023
Database last updated on 02.07.2024
FormerGrant of patent is intended
Status updated on  08.06.2023
FormerRequest for examination was made
Status updated on  24.05.2023
FormerGrant of patent is intended
Status updated on  26.01.2023
FormerRequest for examination was made
Status updated on  25.03.2022
FormerThe international publication has been made
Status updated on  25.12.2020
Formerunknown
Status updated on  26.06.2020
Most recent event   Tooltip24.05.2024Lapse of the patent in a contracting state
New state(s): HR, LV, NO, PL, RS, SE
published on 26.06.2024  [2024/26]
Applicant(s)For all designated states
Commissariat à l'Energie Atomique et aux Energies Alternatives
Bâtiment "Le Ponant D"
25, rue Leblanc
75015 Paris / FR
For all designated states
Centre national de la recherche scientifique
3, rue Michel Ange
75016 Paris / FR
[2022/17]
Inventor(s)01 / FEUILLET, Guy
CEA GRENOBLE 17 Rue des Martyrs
38054 GRENOBLE Cedex 9 / FR
02 / ALLOING, Blandine
C/O CNRS CRHEA Rue Bernard Grégory
06560 VALBONNE / FR
03 / BONO, Hubert
CEA GRENOBLE 17 Rue des Martyrs
38054 GRENOBLE Cedex 9 / FR
04 / DAGHER, Roy
CEA GRENOBLE 17 Rue des Martyrs
38054 GRENOBLE Cedex 9 / FR
05 / ZUNIGA PEREZ, Jesus
450 Avenue Saint Philippe, Résidence La Pinède
Bât. B
06410 BIOT / FR
06 / CHARLES, Matthew
CEA GRENOBLE 17 Rue des Martyrs
38054 GRENOBLE Cedex 9 / FR
07 / BUCKLEY, Julien
CEA GRENOBLE 17 Rue des Martyrs
38054 GRENOBLE Cedex 9 / FR
08 / ESCOFFIER, René
CEA GRENOBLE 17 Rue des Martyrs
38054 GRENOBLE Cedex 9 / FR
 [2022/17]
Representative(s)Hautier IP
20, rue de la Liberté
06000 Nice / FR
[2023/45]
Former [2022/17]Hautier, Nicolas
Cabinet Hautier 20, rue de la Liberté
06000 Nice / FR
Application number, filing date20733630.622.06.2020
[2022/17]
WO2020EP67382
Priority number, dateFR2019000675621.06.2019         Original published format: FR 1906756
[2022/17]
Filing languageFR
Procedural languageFR
PublicationType: A1 Application with search report
No.:WO2020254695
Date:24.12.2020
Language:FR
[2020/52]
Type: A1 Application with search report 
No.:EP3987574
Date:27.04.2022
Language:FR
The application published by WIPO in one of the EPO official languages on 24.12.2020 takes the place of the publication of the European patent application.
[2022/17]
Type: B1 Patent specification 
No.:EP3987574
Date:08.11.2023
Language:FR
[2023/45]
Search report(s)International search report - published on:EP24.12.2020
ClassificationIPC:H01L27/15, H01L33/00, C30B25/18
[2022/17]
CPC:
H01L27/156 (EP,CN); H01L25/167 (US); C30B25/183 (EP);
C30B29/403 (EP); H01L21/786 (US); H01L25/072 (US);
H01L27/085 (CN); H01L29/0684 (CN); H01L29/2003 (CN);
H01L29/66462 (US); H01L29/778 (CN); H01L33/007 (EP,US);
H01L33/0093 (US); H01L33/12 (CN); H01L33/24 (CN);
H01L33/32 (CN); H01L2224/29124 (US); H01L2224/29166 (US);
H01L2224/29184 (US); H01L2224/29186 (US); H01L2224/32145 (US);
H01L2224/83203 (US); H01L24/29 (US); H01L24/32 (US);
H01L24/83 (US); H01L29/7786 (US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2022/17]
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:VERFAHREN ZUR HERSTELLUNG VON NITRID-KACHELN ZUR HERSTELLUNG EINER ELEKTRONISCHEN ODER OPTOELEKTRONISCHEN VORRICHTUNG[2022/17]
English:PROCESS FOR PRODUCING NITRIDE TILES EACH INTENDED TO FORM AN ELECTRONIC OR OPTOELECTRONIC DEVICE[2022/17]
French:PROCÉDÉ DE RÉALISATION DE VIGNETTES DE NITRURE DESTINÉES CHACUNE À FORMER UN DISPOSITIF ÉLECTRONIQUE OU OPTOÉLECTRONIQUE[2022/17]
Entry into regional phase15.12.2021National basic fee paid 
15.12.2021Designation fee(s) paid 
15.12.2021Examination fee paid 
Examination procedure15.12.2021Amendment by applicant (claims and/or description)
15.12.2021Examination requested  [2022/17]
15.12.2021Date on which the examining division has become responsible
27.01.2023Communication of intention to grant the patent
22.05.2023Disapproval of the communication of intention to grant the patent by the applicant or resumption of examination proceedings by the EPO
09.06.2023Communication of intention to grant the patent
02.10.2023Fee for grant paid
02.10.2023Fee for publishing/printing paid
02.10.2023Receipt of the translation of the claim(s)
Fees paidRenewal fee
24.06.2022Renewal fee patent year 03
20.06.2023Renewal fee patent year 04
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See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT08.11.2023
ES08.11.2023
HR08.11.2023
LT08.11.2023
LV08.11.2023
NL08.11.2023
PL08.11.2023
RS08.11.2023
SE08.11.2023
BG08.02.2024
NO08.02.2024
GR09.02.2024
IS08.03.2024
PT08.03.2024
[2024/26]
Former [2024/23]AT08.11.2023
ES08.11.2023
LT08.11.2023
NL08.11.2023
BG08.02.2024
GR09.02.2024
IS08.03.2024
PT08.03.2024
Former [2024/21]LT08.11.2023
NL08.11.2023
BG08.02.2024
GR09.02.2024
IS08.03.2024
Former [2024/20]GR09.02.2024
IS08.03.2024
Cited inInternational search[A]US2010109126  (ARENA CHANTAL [US]) [A] 1-23* paragraphs [0061] - [0064] - [0074]; figures 2F,5C,5D *;
 [A]  - ZUBIA D ET AL, "Nanoheteroepitaxial growth of GaN on Si by organometallic vapor phase epitaxy", APPLIED PHYSICS LETTERS, A I P PUBLISHING LLC, US, (20000214), vol. 76, no. 7, doi:10.1063/1.125608, ISSN 0003-6951, pages 858 - 860, XP012025868 [A] 1-23 * page 858, column 1, line 27 - column 2, line 11; figure 1 *

DOI:   http://dx.doi.org/10.1063/1.125608
by applicant   - CAO, "Electrical effect of plasma damage in p-GaN Induced by Reactive Ion Etching", Appl. Phys. Lett., (19990000), vol. 75, page 2569
    - CHANG, "The Variation of Ohmic Contacts and Surface Characteristics", J. of the Electrochemical Society, (20020000), vol. 149, no. 7, pages G367 - G369
    - C. E.DREYERA. JANOTTIC. G. VAN DE WALLE, "Absolute surface energies of polar and nonpolar planes of GaN", PHYSICAL REVIEW B, (20140000), vol. 89
    - SHIELDS, "Nanopendeo coalescence overgrowth of GaN on etched nanorod array", Phys. Status Solidi C, (20110000), vol. 8, no. 7-8, pages 2334 - 2336
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.