EP4010441 - LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 12.07.2024 Database last updated on 22.08.2024 | |
Former | The patent has been granted Status updated on 04.08.2023 | ||
Former | Grant of patent is intended Status updated on 02.04.2023 | ||
Former | Request for examination was made Status updated on 13.05.2022 | ||
Former | The international publication has been made Status updated on 19.02.2021 | ||
Former | unknown Status updated on 10.08.2020 | Most recent event Tooltip | 02.08.2024 | Lapse of the patent in a contracting state New state(s): SI | published on 04.09.2024 [2024/36] | Applicant(s) | For all designated states Merck Patent GmbH Frankfurter Strasse 250 64293 Darmstadt / DE | [2023/36] |
Former [2022/24] | For all designated states Merck Patent GmbH Frankfurter Strasse 250 64293 Darmstadt / DE | Inventor(s) | 01 /
AIDA, Kensuke c/o Merck Performance Materials Ltd. 3330, Chihama Kakegawa-shi, Shizuoka 437--1412 / JP | 02 /
ARIMA, Kazuya c/o Merck Performance Materials Ltd. 3330, Chihama Kakegawa-shi, Shizuoka 437--1412 / JP | 03 /
SAKURAI, Issei c/o Merck Performance Materials Ltd. 3330, Chihama Kakegawa-shi, Shizuoka 437--1412 / JP | [2023/36] |
Former [2022/24] | 01 /
AIDA, Kensuke c/o Merck Performance Materials Ltd. 3330, Chihama Kakegawa-shi, Shizuoka 437--1412 / JP | ||
02 /
ARIMA, Kazuya c/o Merck Performance Materials Ltd. 3330, Chihama Kakegawa-shi, Shizuoka 437--1412 / JP | |||
03 /
SAKURAI, Issei c/o Merck Performance Materials Ltd. 3330, Chihama Kakegawa-shi, Shizuoka 437--1412 / JP | Representative(s) | Rippel, Hans Christoph Patentanwälte Isenbruck Bösl Hörschler PartG mbB Eastsite One Seckenheimer Landstrasse 4 68163 Mannheim / DE | [2023/36] | Application number, filing date | 20749911.2 | 06.08.2020 | [2022/24] | WO2020EP72072 | Priority number, date | EP20190191135 | 09.08.2019 Original published format: EP 19191135 | [2022/24] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2021028297 | Date: | 18.02.2021 | Language: | EN | [2021/07] | Type: | A1 Application with search report | No.: | EP4010441 | Date: | 15.06.2022 | Language: | EN | The application published by WIPO in one of the EPO official languages on 18.02.2021 takes the place of the publication of the European patent application. | [2022/24] | Type: | B1 Patent specification | No.: | EP4010441 | Date: | 06.09.2023 | Language: | EN | [2023/36] | Search report(s) | International search report - published on: | EP | 18.02.2021 | Classification | IPC: | C09D183/04, H01L21/31, H01B3/46 | [2022/24] | CPC: |
C09D183/04 (EP,KR);
C08K5/053 (CN);
C08G77/18 (EP,KR,US);
C08G77/04 (CN);
C08G77/16 (EP,KR);
C08J5/18 (CN);
C08J9/142 (US);
C08K5/01 (KR);
C08K5/07 (CN);
C08K5/09 (CN);
C08K5/103 (CN);
C08K5/12 (CN);
C08K5/20 (CN);
C08K5/3432 (CN);
C08K5/3445 (CN);
C08K5/3462 (CN);
C08K5/3465 (KR);
C08K5/42 (CN);
C08K5/55 (CN);
H01B3/46 (EP,KR);
H01L21/02126 (EP,KR);
H01L21/02203 (EP,KR);
H01L21/02216 (EP,KR);
H01L21/02282 (EP,KR);
H01L23/296 (CN);
C08J2203/12 (US);
C08J2383/04 (CN);
| C-Set: |
C08K5/053, C08L83/04 (CN);
C08K5/07, C08L83/04 (CN);
C08K5/09, C08L83/04 (CN);
C08K5/103, C08L83/04 (CN);
C08K5/12, C08L83/04 (CN);
C08K5/20, C08L83/04 (CN);
C08K5/3432, C08L83/04 (CN);
C08K5/3445, C08L83/04 (CN);
C08K5/3462, C08L83/04 (CN);
C08K5/42, C08L83/04 (CN); | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2022/24] | Extension states | BA | Not yet paid | ME | Not yet paid | Validation states | KH | Not yet paid | MA | Not yet paid | MD | Not yet paid | TN | Not yet paid | Title | German: | ZUSAMMENSETZUNG ZUR HERSTELLUNG EINES SILIZIUMHALTIGEN FILMS MIT NIEDRIGER DIELEKTRIZITÄTSKONSTANTE UND VERFAHREN ZUR HERSTELLUNG EINES GEHÄRTETEN FILMS SOWIE ELEKTRONISCHE VORRICHTUNG DAMIT | [2022/24] | English: | LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME | [2022/24] | French: | COMPOSITION DE FABRICATION DE FILM SILICEUX À FAIBLE CONSTANTE DIÉLECTRIQUE ET PROCÉDÉS DE PRODUCTION DE FILM DURCI ET DISPOSITIF ÉLECTRONIQUE L'UTILISANT | [2022/24] | Entry into regional phase | 07.02.2022 | National basic fee paid | 07.02.2022 | Designation fee(s) paid | 07.02.2022 | Examination fee paid | Examination procedure | 07.02.2022 | Examination requested [2022/24] | 07.02.2022 | Date on which the examining division has become responsible | 01.04.2022 | Amendment by applicant (claims and/or description) | 03.04.2023 | Communication of intention to grant the patent | 02.08.2023 | Fee for grant paid | 02.08.2023 | Fee for publishing/printing paid | 02.08.2023 | Receipt of the translation of the claim(s) | Opposition(s) | 07.06.2024 | No opposition filed within time limit [2024/33] | Fees paid | Renewal fee | 15.06.2022 | Renewal fee patent year 03 | 14.06.2023 | Renewal fee patent year 04 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | AT | 06.09.2023 | CZ | 06.09.2023 | DK | 06.09.2023 | EE | 06.09.2023 | ES | 06.09.2023 | HR | 06.09.2023 | IT | 06.09.2023 | LT | 06.09.2023 | LV | 06.09.2023 | NL | 06.09.2023 | PL | 06.09.2023 | RO | 06.09.2023 | RS | 06.09.2023 | SE | 06.09.2023 | SI | 06.09.2023 | SK | 06.09.2023 | SM | 06.09.2023 | NO | 06.12.2023 | GR | 07.12.2023 | IS | 06.01.2024 | PT | 08.01.2024 | [2024/36] |
Former [2024/33] | AT | 06.09.2023 | |
CZ | 06.09.2023 | ||
DK | 06.09.2023 | ||
EE | 06.09.2023 | ||
ES | 06.09.2023 | ||
HR | 06.09.2023 | ||
IT | 06.09.2023 | ||
LT | 06.09.2023 | ||
LV | 06.09.2023 | ||
NL | 06.09.2023 | ||
PL | 06.09.2023 | ||
RO | 06.09.2023 | ||
RS | 06.09.2023 | ||
SE | 06.09.2023 | ||
SK | 06.09.2023 | ||
SM | 06.09.2023 | ||
NO | 06.12.2023 | ||
GR | 07.12.2023 | ||
IS | 06.01.2024 | ||
PT | 08.01.2024 | ||
Former [2024/26] | AT | 06.09.2023 | |
CZ | 06.09.2023 | ||
EE | 06.09.2023 | ||
ES | 06.09.2023 | ||
HR | 06.09.2023 | ||
IT | 06.09.2023 | ||
LT | 06.09.2023 | ||
LV | 06.09.2023 | ||
NL | 06.09.2023 | ||
PL | 06.09.2023 | ||
RO | 06.09.2023 | ||
RS | 06.09.2023 | ||
SE | 06.09.2023 | ||
SK | 06.09.2023 | ||
SM | 06.09.2023 | ||
NO | 06.12.2023 | ||
GR | 07.12.2023 | ||
IS | 06.01.2024 | ||
PT | 08.01.2024 | ||
Former [2024/23] | AT | 06.09.2023 | |
CZ | 06.09.2023 | ||
EE | 06.09.2023 | ||
ES | 06.09.2023 | ||
HR | 06.09.2023 | ||
LT | 06.09.2023 | ||
LV | 06.09.2023 | ||
NL | 06.09.2023 | ||
RO | 06.09.2023 | ||
RS | 06.09.2023 | ||
SE | 06.09.2023 | ||
SK | 06.09.2023 | ||
SM | 06.09.2023 | ||
NO | 06.12.2023 | ||
GR | 07.12.2023 | ||
IS | 06.01.2024 | ||
PT | 08.01.2024 | ||
Former [2024/20] | HR | 06.09.2023 | |
LT | 06.09.2023 | ||
LV | 06.09.2023 | ||
NL | 06.09.2023 | ||
RS | 06.09.2023 | ||
SE | 06.09.2023 | ||
SM | 06.09.2023 | ||
NO | 06.12.2023 | ||
GR | 07.12.2023 | ||
IS | 06.01.2024 | ||
Former [2024/14] | HR | 06.09.2023 | |
LT | 06.09.2023 | ||
LV | 06.09.2023 | ||
NL | 06.09.2023 | ||
RS | 06.09.2023 | ||
SE | 06.09.2023 | ||
NO | 06.12.2023 | ||
GR | 07.12.2023 | ||
Former [2024/10] | HR | 06.09.2023 | |
LT | 06.09.2023 | ||
LV | 06.09.2023 | ||
RS | 06.09.2023 | ||
SE | 06.09.2023 | ||
NO | 06.12.2023 | ||
GR | 07.12.2023 | ||
Former [2024/09] | LT | 06.09.2023 | |
SE | 06.09.2023 | ||
NO | 06.12.2023 | ||
GR | 07.12.2023 | ||
Former [2024/08] | LT | 06.09.2023 | |
NO | 06.12.2023 | ||
GR | 07.12.2023 | Cited in | International search | [A]EP1197998 (SHIPLEY CO LLC [US]) [A] 1-22 * claims 6-9 ** paragraph [0028] - paragraph [0031] *; | [AD]US7205030 (MISAWA KAORI [JP], et al) [AD] 1-22 * column 2, line 40 - column 7, line 61 * * column 10, line 31 - column 11, line 44 * | Examination | US2002042020 |