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Extract from the Register of European Patents

EP About this file: EP3924778

EP3924778 - LARGE AREA HIGH RESOLUTION FEATURE REDUCTION LITHOGRAPHY TECHNIQUE [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  19.11.2021
Database last updated on 11.09.2024
FormerThe international publication has been made
Status updated on  22.08.2020
Most recent event   Tooltip23.08.2024New entry: Application deemed to be withdrawn: despatch of communication + time limit 
Applicant(s)For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, California 95054 / US
[2021/51]
Inventor(s)01 / CHADHA, Arvinder
c/o Applied Materials, Inc. Law Dept., M/S 1269
3050 Bowers Avenue
Santa Clara, California 95054 / US
[N/P]
Former [2021/51]01 / CHADHA, Arvinder
Santa Clara, California 95054 / US
Representative(s)Zimmermann & Partner Patentanwälte mbB
Postfach 330 920
80069 München / DE
[2021/51]
Application number, filing date20755271.224.01.2020
[2021/51]
WO2020US14906
Priority number, dateUS20191627686015.02.2019         Original published format: US201916276860
[2021/51]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2020167446
Date:20.08.2020
Language:EN
[2020/34]
Type: A1 Application with search report 
No.:EP3924778
Date:22.12.2021
Language:EN
The application published by WIPO in one of the EPO official languages on 20.08.2020 takes the place of the publication of the European patent application.
[2021/51]
Search report(s)International search report - published on:KR20.08.2020
(Supplementary) European search report - dispatched on:EP02.11.2022
ClassificationIPC:G03F1/22, G03F1/52, G03F1/38, G02B5/18, G02B27/42, G03F7/20
[2022/48]
CPC:
G03F7/70408 (EP,US); G03F7/70316 (US); G02B5/1866 (EP);
G03F7/213 (US); G03F7/70275 (US); G03F7/7035 (EP);
G02B27/425 (EP); G03F7/70325 (US) (-)
Former IPC [2021/51]G03F1/22, G03F1/52, G03F1/38
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2021/51]
TitleGerman:GROSSFLÄCHIGES HOCHAUFLÖSENDES LITHOGRAFISCHES VERFAHREN ZUR REDUKTION VON MERKMALEN[2021/51]
English:LARGE AREA HIGH RESOLUTION FEATURE REDUCTION LITHOGRAPHY TECHNIQUE[2021/51]
French:TECHNIQUE DE LITHOGRAPHIE PAR RÉDUCTION DE CARACTÉRISTIQUES HAUTE RÉSOLUTION DE GRANDE SURFACE[2021/51]
Entry into regional phase03.08.2021National basic fee paid 
03.08.2021Search fee paid 
03.08.2021Designation fee(s) paid 
03.08.2021Examination fee paid 
Examination procedure03.08.2021Examination requested  [2021/51]
10.05.2023Amendment by applicant (claims and/or description)
22.08.2024Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time
Fees paidRenewal fee
20.01.2022Renewal fee patent year 03
19.01.2023Renewal fee patent year 04
Penalty fee
Additional fee for renewal fee
31.01.202405   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[Y]JPH05217839  (NIKON CORP) [Y] 3-5 * paragraphs [0027] - [0044]; figures 1,2 * * paragraphs [0052] - [0060]; figure 3 *;
 [Y]US5703675  (HIRUKAWA SHIGERU [JP], et al) [Y] 3-5 * column 13, line 19 - column 14, line 57; figure 1 *;
 [XAYI]EP1852894  (NIKON CORP [JP]) [X] 1-3,5,6,8,10 * paragraphs [0071] - [0101]; figures 1, 3 * * paragraphs [0117] - [0120]; figure 4 * * paragraphs [0162] - [0169] * * paragraph [0210] * * paragraphs [0234] - [0235] * [A] 11-15 [Y] 4 [I] 7;
 [A]US2008258050  (MAKINOUCHI SUSUMU [JP], et al) [A] 11* paragraphs [0022] - [0054]; figures 1,2 *;
 [XAY]  - "New grating fabrication technology for optoelectronic devices:Cascaded self-induced holography", APPLIED PHYSICS LETTERS, AMERICAN INSTITUTE OF PHYSICS, 2 HUNTINGTON QUADRANGLE, MELVILLE, NY 11747, (19951120), vol. 67, no. 21, doi:10.1063/1.114868, ISSN 0003-6951, pages 3072 - 3074, XP012014083 [X] 1,2,6-8,10 * the whole document * [A] 9,11-15 [Y] 3-5

DOI:   http://dx.doi.org/10.1063/1.114868
International search[A]US5413884  (KOCH THOMAS L [US], et al)[A] 1-15;
 [A]JPH11337713  (FUJITSU LTD) [A] 1-15;
 [A]US2006126053  (HINSBERG WILLIAM D III [US], et al) [A] 1-15;
 [A]US2007274633  (RAUB ALEX [US], et al) [A] 1-15;
 [A]US2008186579  (SOLAK HARUN H [CH]) [A] 1-15
by applicantEP1852894
    - C. H. LINZ. H. ZHUY. H. LO, "New grating fabrication technology for optoelectronic devices: Cascaded self-induced holography", Appl. Phys. Lett., (19951120), vol. 67, no. 21, pages 3072 - 3074
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.