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Extract from the Register of European Patents

EP About this file: EP3965142

EP3965142 - ELECTRICAL DEVICE AND SEMICONDUCTOR APPARATUS INCLUDING THE SAME [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  02.04.2022
Database last updated on 20.05.2024
FormerThe application has been published
Status updated on  04.02.2022
Most recent event   Tooltip26.02.2024New entry: Renewal fee paid 
Applicant(s)For all designated states
Samsung Electronics Co., Ltd.
129, Samsung-ro
Yeongtong-gu
Gyeonggi-do
Suwon-si 16677 / KR
[2022/10]
Inventor(s)01 / SONG, Jeonggyu
16678, Gyeonggi-do / KR
02 / KIM, Younsoo
16678, Gyeonggi-do / KR
03 / LEE, Jooho
16678, Gyeonggi-do / KR
04 / HAN, Narae
16678, Gyeonggi-do / KR
 [2022/10]
Representative(s)Elkington and Fife LLP
Prospect House
8 Pembroke Road
Sevenoaks, Kent TN13 1XR / GB
[2022/10]
Application number, filing date21161520.809.03.2021
[2022/10]
Priority number, dateKR2020011168702.09.2020         Original published format: KR 20200111687
[2022/10]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP3965142
Date:09.03.2022
Language:EN
[2022/10]
Search report(s)(Supplementary) European search report - dispatched on:EP08.09.2021
ClassificationIPC:H01L21/02, H01L27/108, H01L49/02
[2022/10]
CPC:
H01L28/40 (EP,CN,KR); H01L28/56 (US); H01L21/02148 (EP);
H01L21/02175 (KR); H01L21/022 (KR); H01L28/60 (US);
H10B12/03 (EP); H10B12/30 (CN,KR); H10B12/315 (EP,US);
H10B12/34 (US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2022/18]
Former [2022/10]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:ELEKTRISCHE VORRICHTUNG UND HALBLEITERBAUELEMENT DAMIT[2022/10]
English:ELECTRICAL DEVICE AND SEMICONDUCTOR APPARATUS INCLUDING THE SAME[2022/10]
French:DISPOSITIF ÉLECTRIQUE ET APPAREIL À SEMI-CONDUCTEUR LE COMPRENANT[2022/10]
Examination procedure29.03.2022Examination requested  [2022/18]
29.03.2022Date on which the examining division has become responsible
19.08.2022Amendment by applicant (claims and/or description)
Fees paidRenewal fee
27.02.2023Renewal fee patent year 03
26.02.2024Renewal fee patent year 04
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[XA]EP0076456  (TAIYO YUDEN KK [JP]) [X] 1-7,9,11,13-15 * page 1 - page 110; figures 1, 2; tables 1-18 * [A] 8,10,12;
 [A]US2008054400  (LEE WOO-SUNG [KR], et al) [A] 1-15 * the whole document *;
 [A]CN110098052  (UNIV HUBEI, et al) [A] 1-15 * paragraph [0005] - paragraph [0057]; figures 1,2 *;
 [A]  - HSIANG H I ET AL, "Sintering behavior and dielectric properties of BaTiO"3 ceramics with glass addition for internal capacitor of LTCC", JOURNAL OF ALLOYS AND COMPOUNDS, ELSEVIER SEQUOIA, LAUSANNE, CH, vol. 459, no. 1-2, doi:10.1016/J.JALLCOM.2007.04.218, ISSN 0925-8388, (20080714), pages 307 - 310, (20080520), XP022673438 [A] 1-15 * abstract *

DOI:   http://dx.doi.org/10.1016/j.jallcom.2007.04.218
 [A]  - SYAMAPRASAD U ET AL, "MULTILAYER CAPACITOR CERAMICS IN THE PMN-PT-BT SYSTEM: EFFECT OF MGO AND 4PBO.B2O3 ADDITIONS", JOURNAL OF MATERIALS SCIENCE: MATERIALS IN ELECTRONICS, CHAPMAN AND HALL, LONDON, GB, (19970601), vol. 8, no. 3, doi:10.1023/A:1018554431950, ISSN 0957-4522, pages 199 - 205, XP000723849 [A] 1-15 * the whole document *

DOI:   http://dx.doi.org/10.1023/A:1018554431950
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.