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Extract from the Register of European Patents

EP About this file: EP3889992

EP3889992 - ELECTRON DIFFRACTION HOLOGRAPHY [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  01.12.2023
Database last updated on 19.07.2024
FormerThe patent has been granted
Status updated on  23.12.2022
FormerGrant of patent is intended
Status updated on  17.08.2022
FormerRequest for examination was made
Status updated on  08.04.2022
FormerThe application has been published
Status updated on  03.09.2021
Most recent event   Tooltip31.05.2024Lapse of the patent in a contracting state
New state(s): IT		published on 03.07.2024  [2024/27]
Applicant(s)For all designated states
FEI Company
5350 NE Dawson Creek Drive
Hillsboro, OR 97124-5793 / US
[2021/40]
Inventor(s)01 / Henstra, Alexander
FEI Company, Patent Department
P.O. Box 1745
5602 BS Eindhoven / NL
02 / Deng, Yuchen
FEI Company, Patent Department
P.O. Box 1745
5602 BS Eindhoven / NL
03 / Kohr, Holger
FEI Company, Patent Department
P.O. Box 1745
5602 BS Eindhoven / NL
 [2021/40]
Representative(s)Janssen, Francis-Paul
FEI Company
Patent Department
P.O.Box 1745
5602 BS Eindhoven / NL
[2021/40]
Application number, filing date21164757.325.03.2021
[2021/40]
Priority number, dateUS20201683512930.03.2020         Original published format: US202016835129
[2021/40]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP3889992
Date:06.10.2021
Language:EN
[2021/40]
Type: B1 Patent specification 
No.:EP3889992
Date:25.01.2023
Language:EN
[2023/04]
Search report(s)(Supplementary) European search report - dispatched on:EP31.08.2021
ClassificationIPC:H01J37/04, H01J37/26
[2021/40]
CPC:
H01J37/04 (EP,US); H01J37/147 (KR); G01N23/20058 (CN);
G01N23/207 (US); G01N15/1459 (KR); G01N21/453 (KR);
G01N33/39 (US); G03H5/00 (US); H01J37/10 (KR);
H01J37/21 (CN,KR); H01J37/26 (EP,US); H01J37/28 (KR);
H01J37/295 (CN); G01N2223/056 (CN); G01N2223/0566 (US);
G01N2223/064 (US); G01N2223/102 (CN); G03H2224/04 (US);
H01J2237/0492 (EP); H01J2237/15 (EP); H01J2237/2614 (EP,US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2022/19]
Former [2021/40]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
TitleGerman:ELEKTRONENBEUGUNGSHOLOGRAFIE[2021/40]
English:ELECTRON DIFFRACTION HOLOGRAPHY[2021/40]
French:HOLOGRAPHIE PAR DIFFRACTION ÉLECTRONIQUE[2021/40]
Examination procedure04.04.2022Examination requested  [2022/19]
04.04.2022Date on which the examining division has become responsible
18.08.2022Communication of intention to grant the patent
15.12.2022Fee for grant paid
15.12.2022Fee for publishing/printing paid
15.12.2022Receipt of the translation of the claim(s)
Divisional application(s)EP22212478.6  / EP4170693
EP23206141.6  / EP4318546
Opposition(s)26.10.2023No opposition filed within time limit [2024/01]
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT25.01.2023
DK25.01.2023
EE25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
IT25.01.2023
LT25.01.2023
LV25.01.2023
MC25.01.2023
NL25.01.2023
PL25.01.2023
RO25.01.2023
RS25.01.2023
SE25.01.2023
SI25.01.2023
SK25.01.2023
SM25.01.2023
IE25.03.2023
LU25.03.2023
BE31.03.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
[2024/27]
Former [2024/11]AT25.01.2023
DK25.01.2023
EE25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
MC25.01.2023
NL25.01.2023
PL25.01.2023
RO25.01.2023
RS25.01.2023
SE25.01.2023
SI25.01.2023
SK25.01.2023
SM25.01.2023
IE25.03.2023
LU25.03.2023
BE31.03.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2024/08]AT25.01.2023
DK25.01.2023
EE25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
MC25.01.2023
NL25.01.2023
PL25.01.2023
RO25.01.2023
RS25.01.2023
SE25.01.2023
SK25.01.2023
SM25.01.2023
IE25.03.2023
LU25.03.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2024/02]AT25.01.2023
DK25.01.2023
EE25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
MC25.01.2023
NL25.01.2023
PL25.01.2023
RO25.01.2023
RS25.01.2023
SE25.01.2023
SK25.01.2023
SM25.01.2023
LU25.03.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2023/50]AT25.01.2023
DK25.01.2023
EE25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
MC25.01.2023
NL25.01.2023
PL25.01.2023
RO25.01.2023
RS25.01.2023
SE25.01.2023
SK25.01.2023
SM25.01.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2023/49]AT25.01.2023
DK25.01.2023
EE25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
MC25.01.2023
NL25.01.2023
PL25.01.2023
RO25.01.2023
RS25.01.2023
SE25.01.2023
SM25.01.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2023/48]AT25.01.2023
DK25.01.2023
EE25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
MC25.01.2023
NL25.01.2023
PL25.01.2023
RS25.01.2023
SE25.01.2023
SM25.01.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2023/46]AT25.01.2023
DK25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
NL25.01.2023
PL25.01.2023
RS25.01.2023
SE25.01.2023
SM25.01.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2023/39]AT25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
NL25.01.2023
PL25.01.2023
RS25.01.2023
SE25.01.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2023/38]AT25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
NL25.01.2023
PL25.01.2023
RS25.01.2023
SE25.01.2023
NO25.04.2023
GR26.04.2023
PT25.05.2023
Former [2023/37]AT25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
NL25.01.2023
RS25.01.2023
SE25.01.2023
NO25.04.2023
GR26.04.2023
PT25.05.2023
Former [2023/36]AT25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
NL25.01.2023
RS25.01.2023
SE25.01.2023
NO25.04.2023
PT25.05.2023
Former [2023/35]AT25.01.2023
ES25.01.2023
HR25.01.2023
LT25.01.2023
NL25.01.2023
RS25.01.2023
NO25.04.2023
PT25.05.2023
Former [2023/34]ES25.01.2023
LT25.01.2023
NL25.01.2023
RS25.01.2023
PT25.05.2023
Former [2023/33]ES25.01.2023
LT25.01.2023
NL25.01.2023
Former [2023/31]NL25.01.2023
Documents cited:Search[A]US2008094710  (ENDOH HISAMITSU [JP]) [A] 1-20;
 [A]US2008149833  (ENDOH HISAMITSU [JP], et al) [A] 1-20;
 [A]  - "Differential microscopy by conventional electron off-axis holography", APPLIED PHYSICS LETTERS, A I P PUBLISHING LLC, US, (19961028), vol. 69, no. 18, doi:10.1063/1.117555, ISSN 0003-6951, pages 2623 - 2625, XP012016405 [A] 1-20

DOI:   http://dx.doi.org/10.1063/1.117555
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.