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Extract from the Register of European Patents

EP About this file: EP4123061

EP4123061 - METHOD FOR PRODUCING A GALLIUM OXIDE LAYER ON A SUBSTRATE [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  25.08.2023
Database last updated on 03.10.2024
FormerThe application has been published
Status updated on  23.12.2022
Most recent event   Tooltip26.07.2024New entry: Renewal fee paid 
Applicant(s)For all designated states
Siltronic AG
Einsteinstraße 172 Tower B / Blue Tower
81677 München / DE
For all designated states
Leibniz-Institut für Kristallzüchtung im Forschungsverbund Berlin e.V.
Max-Born-Str. 2
12489 Berlin / DE
[2024/08]
Former [2023/04]For all designated states
Siltronic AG
Einsteinstraße 172 Tower B / Blue Tower
81677 München / DE
Inventor(s)01 / Chou, Ta-Shun
13587 Berlin / DE
02 / Häckl, Walter
84558 Kirchweidach / DE
03 / Popp, Andreas
15732 Eichwalde / DE
 [2023/04]
Application number, filing date21187231.222.07.2021
[2023/04]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP4123061
Date:25.01.2023
Language:EN
[2023/04]
Search report(s)(Supplementary) European search report - dispatched on:EP03.12.2021
ClassificationIPC:C30B25/16, C30B29/16, C23C16/40, C23C16/455, C23C16/52
[2023/04]
CPC:
C30B29/16 (EP,KR,US); C30B25/16 (EP,KR); C30B25/165 (US);
C23C16/40 (EP,KR); C23C16/45523 (EP,KR); C23C16/52 (EP,KR)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2023/39]
Former [2023/04]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:VERFAHREN ZUR HERSTELLUNG EINER GALLIUMOXIDSCHICHT AUF EINEM SUBSTRAT[2023/04]
English:METHOD FOR PRODUCING A GALLIUM OXIDE LAYER ON A SUBSTRATE[2023/04]
French:PROCÉDÉ DE PRODUCTION D'UNE COUCHE D'OXYDE DE GALLIUM SUR UN SUBSTRAT[2023/04]
Examination procedure12.07.2023Amendment by applicant (claims and/or description)
16.08.2023Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time
21.08.2023Examination requested  [2023/39]
21.08.2023Date on which the examining division has become responsible
Request for further processing for:The application is deemed to be withdrawn due to non-payment of the examination fee
21.08.2023Request for further processing filed
21.08.2023Full payment received (date of receipt of payment)
Request granted
25.08.2023Decision despatched
The application is deemed to be withdrawn due to non-payment of designation fees
TR, SM, SK, SI, SE, RS, RO, PT, PL, NO, NL, MT, MK, MC, LV, LU, LT, IT, IS, IE, HU, HR, GR, GB, FR, FI, ES, EE, DK, DE, CZ, CY, CH, BG, BE, AT, AL
21.08.2023Request for further processing filed
21.08.2023Full payment received (date of receipt of payment)
Request granted
25.08.2023Decision despatched
Fees paidRenewal fee
26.07.2023Renewal fee patent year 03
25.07.2024Renewal fee patent year 04
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Documents cited:Search[A]EP1854904  (OPTICAL REFERENCE SYSTEMS LTD [GB]);
 [Y]US2020292299  (IYECHIKA YASUSHI [JP]);
by applicantUS6289842
 EP3242965
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.