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Extract from the Register of European Patents

EP About this file: EP3975263

EP3975263 - METHODS FOR FORMING SEMICONDUCTOR DEVICES USING SACRIFICIAL CAPPING AND INSULATION LAYERS [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  24.02.2023
Database last updated on 14.09.2024
FormerThe application has been published
Status updated on  25.02.2022
Most recent event   Tooltip24.02.2023Application deemed to be withdrawnpublished on 29.03.2023  [2023/13]
Applicant(s)For all designated states
NXP USA, Inc.
6501 William Cannon Drive West
Austin TX 78735 / US
[2022/13]
Inventor(s)01 / Huang, Jenn Hwa
5656 AG Eindhoven / NL
02 / Yue, Yuanzheng
5656 AG Eindhoven / NL
03 / Green, Bruce McRae
5656 AG Eindhoven / NL
04 / Moore, Karen Elizabeth
Eindhoven, 5656 AG / GB
05 / Teplik, James Allen
5656 AG Eindhoven / NL
 [2022/13]
Representative(s)Miles, John Richard
NXP SEMICONDUCTORS
Intellectual Property Group
Abbey House
25 Clarendon Road
Redhill, Surrey RH1 1QZ / GB
[2022/13]
Application number, filing date21196348.313.09.2021
[2022/13]
Priority number, dateUS20201703668129.09.2020         Original published format: US202017036681
[2022/13]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP3975263
Date:30.03.2022
Language:EN
[2022/13]
Search report(s)(Supplementary) European search report - dispatched on:EP24.02.2022
ClassificationIPC:H01L29/778, H01L21/338, H01L21/265, // H01L29/08, H01L29/20
[2022/13]
CPC:
H01L29/7786 (EP,US); H01L29/66462 (EP,US); H01L21/26553 (EP,US);
H01L21/28575 (EP); H01L29/0843 (EP,US); H01L29/2003 (EP,US)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2022/13]
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:VERFAHREN ZUR HERSTELLUNG VON HALBLEITERBAUELEMENTEN UNTER VERWENDUNG VON OPFERABDECKUNGS- UND ISOLATIONSSCHICHTEN[2022/13]
English:METHODS FOR FORMING SEMICONDUCTOR DEVICES USING SACRIFICIAL CAPPING AND INSULATION LAYERS[2022/13]
French:PROCÉDÉS DE FORMATION DE DISPOSITIFS À SEMI-CONDUCTEURS À L'AIDE DE COUCHES DE RECOUVREMENT ET D'ISOLATION SACRIFICIELLES[2022/13]
Examination procedure01.10.2022Application deemed to be withdrawn, date of legal effect  [2023/13]
11.11.2022Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time  [2023/13]
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Documents cited:Search[XYI]US2019157440  (GREEN BRUCE MCRAE [US], et al) [X] 1,2,5,7-9,13 * figure 12 and associated text * [Y] 10-12 [I] 3,4,6,14,15;
 [Y]JP2020088270  (TOYODA GOSEI KK) [Y] 10-12 * paragraphs [0020] , [0 26] , [0 27]; figures 4-6 ** abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.