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Extract from the Register of European Patents

EP About this file: EP4163869

EP4163869 - SEM IMAGE ALIGNMENT [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  16.02.2024
Database last updated on 12.07.2024
FormerThe application has been published
Status updated on  10.03.2023
Most recent event   Tooltip16.02.2024Application deemed to be withdrawnpublished on 20.03.2024  [2024/12]
Applicant(s)For all designated states
ASML Netherlands B.V.
P.O. Box 324
5500 AH Veldhoven / NL
[2023/15]
Inventor(s)01 / KOOIMAN, Marleen
5500 AH Veldhoven / NL
 [2023/15]
Representative(s)ASML Netherlands B.V.
Corporate Intellectual Property
P.O. Box 324
5500 AH Veldhoven / NL
[2023/15]
Application number, filing date21202040.811.10.2021
[2023/15]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP4163869
Date:12.04.2023
Language:EN
[2023/15]
Search report(s)(Supplementary) European search report - dispatched on:EP15.07.2022
ClassificationIPC:G06T7/00, G06T7/37
[2023/15]
CPC:
G06T7/0004 (EP); G06T7/37 (EP); G06T2207/10061 (EP);
G06T2207/20056 (EP); G06T2207/30148 (EP)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2023/15]
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:AUSRICHTUNG EINES SEM-BILDES[2023/15]
English:SEM IMAGE ALIGNMENT[2023/15]
French:ALIGNEMENT D'IMAGE SEM[2023/15]
Examination procedure13.10.2023Application deemed to be withdrawn, date of legal effect  [2024/12]
07.11.2023Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time  [2024/12]
Fees paidPenalty fee
Additional fee for renewal fee
31.10.202303   M06   Not yet paid
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Documents cited:Search[XAI]EP3789826  (ASML NETHERLANDS BV [NL]) [X] 1,2,5,10,11,14,15 * paragraphs [0002] , [0005] , [0041] - [0046] * [A] 3,6-9,12[I] 4;
 [XAI]  - TAO FEI ET AL, "Wafer Image Registration Based on Hough Transform", APPLIED MECHANICS AND MATERIALS, (20130701), vol. 333-335, doi:10.4028/www.scientific.net/AMM.333-335.1038, pages 1038 - 1042, XP055939201 [X] 1,7,8,10 * abstract * * figures 1,3-7 * * page 1039 - page 1041 * * Table 1 * [A] 2-6,9,11,12 [I] 14,15

DOI:   http://dx.doi.org/10.4028/www.scientific.net/AMM.333-335.1038
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