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Extract from the Register of European Patents

EP About this file: EP4185783

EP4185783 - SPUTTER DEPOSITION SYSTEM [Right-click to bookmark this link]
StatusThe patent has been granted
Status updated on  27.04.2024
Database last updated on 14.09.2024
FormerGrant of patent is intended
Status updated on  21.12.2023
FormerExamination is in progress
Status updated on  19.05.2023
FormerRequest for examination was made
Status updated on  28.04.2023
FormerThe international publication has been made
Status updated on  28.01.2022
Formerunknown
Status updated on  16.08.2021
Most recent event   Tooltip27.04.2024(Expected) grantpublished on 29.05.2024  [2024/22]
27.04.2024Change - divisional application(s)published on 29.05.2024  [2024/22]
Applicant(s)For all designated states
FOx Biosystems NV
Bioville
Agoralaan Abis
3590 Diepenbeek / BE
[2024/22]
Former [2023/22]For all designated states
FOx Biosystems NV
Bioville
Agoralaan Abis
3590 Diepenbeek / BE
Inventor(s)01 / DELPORT, Filip
3590 Diepenbeek / BE
02 / FEJTOVA, Hana
9800 Deinze / BE
03 / FEJT, Tomas
102 00 Prague 10 / CZ
04 / ROSKOVSKY, Rudolf
142 00 Prague Kamyk / CZ
 [2023/22]
Representative(s)Arnold & Siedsma
Bezuidenhoutseweg 57
2594 AC The Hague / NL
[2023/22]
Application number, filing date21751525.323.07.2021
[2023/22]
WO2021EP70734
Priority number, dateEP2020018773724.07.2020         Original published format: EP 20187737
[2023/22]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2022018282
Date:27.01.2022
Language:EN
[2022/04]
Type: A1 Application with search report 
No.:EP4185783
Date:31.05.2023
Language:EN
The application published by WIPO in one of the EPO official languages on 27.01.2022 takes the place of the publication of the European patent application.
[2023/22]
Type: B1 Patent specification 
No.:EP4185783
Date:29.05.2024
Language:EN
[2024/22]
Search report(s)International search report - published on:EP27.01.2022
ClassificationIPC:C23C14/50, C23C14/04
[2023/52]
CPC:
C23C14/505 (EP,US); C23C14/34 (US); C23C14/044 (EP)
Former IPC [2023/22]F16C19/22, C23C14/50
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2023/22]  
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:SPUTTERABSCHEIDUNGSSYSTEM[2023/52]
English:SPUTTER DEPOSITION SYSTEM[2023/22]
French:SYSTÈME DE DÉPÔT PAR PULVÉRISATION[2023/22]
Former [2023/22]SPUTTER-BESCHICHTUNGSSYSTEM
Entry into regional phase20.02.2023National basic fee paid 
20.02.2023Designation fee(s) paid 
20.02.2023Examination fee paid 
Examination procedure24.05.2022Request for preliminary examination filed
International Preliminary Examining Authority: EP
20.02.2023Amendment by applicant (claims and/or description)
20.02.2023Examination requested  [2023/22]
20.02.2023Date on which the examining division has become responsible
22.05.2023Despatch of a communication from the examining division (Time limit: M04)
21.09.2023Reply to a communication from the examining division
22.12.2023Communication of intention to grant the patent
19.04.2024Fee for grant paid
19.04.2024Fee for publishing/printing paid
19.04.2024Receipt of the translation of the claim(s)
Divisional application(s)EP24171254.6  / EP4400626
Fees paidRenewal fee
20.02.2023Renewal fee patent year 03
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search[XA]JPH10219447  (FUJITSU LTD);
 [IA]US2002062791  (GINOVKER ANDREY [CA], et al);
 [IA]US2005126497  (KIDD JERRY D [US], et al);
 [A]US2010104749  (ZHAO YIPING [US], et al);
 [IA]CN103361616B  ;
 [A]CN110129753  (LASER FUSION RES CT CHINA ACADEMY ENGINEERING PHYSICS)
ExaminationDE3933911
 CN108505011
by applicantWO2007106732
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.