blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability
Register Forum

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP4246559

EP4246559 - MANUFACTURING METHOD FOR COMPLEX AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  18.08.2023
Database last updated on 24.08.2024
FormerThe international publication has been made
Status updated on  21.05.2022
Most recent event   Tooltip11.04.2024Supplementary search reportpublished on 08.05.2024  [2024/19]
Applicant(s)For all designated states
Panasonic Intellectual Property Management Co., Ltd.
1-61, Shiromi 2-chome
Chuo-ku
Osaka-shi, Osaka 540-6207 / JP
[2023/38]
Inventor(s)01 / KONDA, Tetsushi
Osaka-shi, Osaka 540-6207 / JP
02 / KITAMURA, Kenji
Osaka-shi, Osaka 540-6207 / JP
03 / HAGIWARA, Takahito
Osaka-shi, Osaka 540-6207 / JP
04 / MATSUBAYASHI, Ryo
Osaka-shi, Osaka 540-6207 / JP
05 / UMEDA, Hidekazu
Osaka-shi, Osaka 540-6207 / JP
 [2023/38]
Representative(s)Appelt, Christian W.
Boehmert & Boehmert
Anwaltspartnerschaft mbB
Pettenkoferstrasse 22
80336 München / DE
[2023/38]
Application number, filing date21891906.610.11.2021
[2023/38]
WO2021JP41354
Priority number, dateUS202063112835P12.11.2020         Original published format: US 202063112835 P
[2023/38]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2022102660
Date:19.05.2022
Language:JA
[2022/20]
Type: A1 Application with search report 
No.:EP4246559
Date:20.09.2023
Language:EN
[2023/38]
Search report(s)International search report - published on:JP19.05.2022
(Supplementary) European search report - dispatched on:EP10.04.2024
ClassificationIPC:H01L21/52
[2023/38]
CPC:
H01L24/83 (EP,US); H01L21/52 (KR); H01L21/67098 (KR);
H01L24/02 (KR); H01L24/32 (EP,US); H01L2224/32225 (US);
H01L2224/48225 (US); H01L2224/73265 (US); H01L2224/83205 (EP);
H01L2224/8384 (EP,US); H01L23/3121 (EP,US); H01L24/48 (US);
H01L24/50 (EP); H01L24/73 (US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2023/38]
TitleGerman:HERSTELLUNGSVERFAHREN FÜR EINEN KOMPLEX UND HERSTELLUNGSVERFAHREN FÜR EIN HALBLEITERBAUELEMENT[2023/38]
English:MANUFACTURING METHOD FOR COMPLEX AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE[2023/38]
French:PROCÉDÉ DE FABRICATION D'UN COMPLEXE ET PROCÉDÉ DE FABRICATION D'UN DISPOSITIF SEMI-CONDUCTEUR[2023/38]
Entry into regional phase24.04.2023Translation filed 
24.04.2023National basic fee paid 
24.04.2023Search fee paid 
24.04.2023Designation fee(s) paid 
24.04.2023Examination fee paid 
Examination procedure24.04.2023Examination requested  [2023/38]
Fees paidRenewal fee
24.11.2023Renewal fee patent year 03
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[Y]CN104201117  (UNIV TIANJIN);
 [XYI]WO2019021637  (BANDO CHEMICAL IND [JP])
International search[AY]JP2008109009  (SONY CORP) [A] 6-8, 12 [Y] 1-5, 9-11, 13-14;
 [AY]JP2010283021  (FUJIKURA LTD) [A] 6-8, 12 [Y] 1-5, 9-11, 13-14;
 [AY]WO2019021637  (BANDO CHEMICAL IND [JP]) [A] 6-8, 12 [Y] 1-5, 9-11, 13-14;
 [A]JP2019220641  (MITSUBISHI MATERIALS CORP) [A] 1-14* paragraphs [0001], [0024]-[0052], fig. 1-2 *;
 [A]JP2020038896  (FURUKAWA ELECTRIC CO LTD) [A] 1-14 * paragraphs [0001], [0012]-[0060], fig. 1 *
by applicantJP2012009703
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.