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Extract from the Register of European Patents

EP About this file: EP4056314

EP4056314 - POLISHING PAD, METHOD FOR PRODUCING THE SAME AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  12.08.2022
Database last updated on 14.09.2024
Most recent event   Tooltip20.02.2024New entry: Renewal fee paid 
Applicant(s)For all designated states
SK enpulse Co., Ltd.
1043, Gyeonggi-daero
Pyeongtaek-si, Gyeonggi-do 17784 / KR
[2023/23]
Former [2022/37]For all designated states
SKC Solmics Co., Ltd.
Gyeonggi-daero
Pyeongtaek-si, Gyeonggi-do 17784 / KR
Inventor(s)01 / YUN, Jong Wook
03142 Seoul / KR
02 / JOENG, Eun Sun
16338 Suwon-si, Gyeonggi-do / KR
03 / YUN, Sung Hoon
03142 Seoul / KR
04 / HEO, Hye Young
16338 Suwon-si, Gyeonggi-do / KR
05 / SEO, Jang Won
03142 Seoul / KR
 [2022/37]
Representative(s)BCKIP Part mbB
Siegfriedstraße 8
80803 München / DE
[N/P]
Former [2022/37]BCKIP
Siegfriedstraße 8
80803 München / DE
Application number, filing date22161518.011.03.2022
[2022/37]
Priority number, dateKR2021003290412.03.2021         Original published format: KR 20210032904
[2022/37]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP4056314
Date:14.09.2022
Language:EN
[2022/37]
Search report(s)(Supplementary) European search report - dispatched on:EP22.07.2022
ClassificationIPC:B24B37/24
[2022/37]
CPC:
B24B37/24 (EP,CN,KR); B24B37/042 (US); B24B37/044 (KR);
B24B37/107 (CN); B24B37/22 (US); B24B37/26 (CN);
B24D11/001 (CN); B24D18/00 (KR); B24D3/04 (KR);
H01L21/304 (CN); H01L21/30625 (US); H01L21/67092 (KR) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2023/16]
Former [2022/37]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:POLIERKISSEN, VERFAHREN ZUM PRODUZIEREN DESSELBEN UND VERFAHREN ZUM HERSTELLEN VON HALBLEITERANORDNUNGEN UNTER VERWENDUNG DESSELBEN[2022/37]
English:POLISHING PAD, METHOD FOR PRODUCING THE SAME AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME[2022/37]
French:TAMPON DE POLISSAGE, SON PROCÉDÉ DE FABRICATION ET PROCÉDÉ DE FABRICATION DE DISPOSITIF À SEMI-CONDUCTEUR L'UTILISANT[2022/37]
Examination procedure11.03.2022Examination requested  [2022/37]
13.03.2023Amendment by applicant (claims and/or description)
13.03.2023Date on which the examining division has become responsible
Fees paidRenewal fee
20.02.2024Renewal fee patent year 03
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Documents cited:Search[XI]US2013303061  (JAMES DAVID B [US], et al);
 [XI]US2018311792  (QIAN BAINIAN [US], et al);
 [A]KR20190029473  (SKC CO LTD [KR]);
 [A]WO2020254916  (3M INNOVATIVE PROPERTIES CO [US])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.